EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`References cited herein:
`
`o U.S. Patent No. 7,808,184 C“ 184 Patent”)
`
`- U.S. Pat. No. 6,413,382 (“Wang”)
`
`0 A. A. Kudryavtsev, et al, Ionization relaxation in a plasma produced by a pulsed inert-gas
`discharge, Sov. Phys. Tech. Phys. 28(1), January 1983 (“Kudryavtsev”)
`
`0 Thornton, J.A., Magnetron sputtering: basic physics and application to cylindrical
`magnetrons, J. Vac. Sci. Technol. 15(2) 1978 (“Thornton”)
`
`Dischar e in a
`-Current Low-Pressure uasi-Station
`0 D.V. Mozgrin, et al, Hi
`Magnetic Field: Experimental Research, Plasma Physics Reports, Vol. 21, No. 5, 1995
`(“Mozgrin”)
`
`0 Leipold et al., High-electron density, atmospheric pressure air glow discharges, Power
`Modulator Symposium, 2002 and 2002 High-Voltage Workshop. Conference Record of
`the Twenty-Fifth International, June 2002 (“Leipold”)
`
`0 Gudrnundsson et al., Evolution of the electron energy distribution and plasma parameters
`in a pulsed magnetron discharge, Applied Physics Letters, 78(22) May 2001
`(“Gudmundsson”)
`
`Claims 1-7, 9-17,
`and 19_20
`
`1. A method of
`generating a
`strongly-ionized
`plasma, the
`method
`comprising:
`
`a) supplying feed
`gas proximate to
`an anode and a
`
`ActiVeUS l227656l0V.l
`
`.
`.
`Wang 111 view of Kudryavtsev
`
`The combination of Wang and Kudryavtsev discloses a method of
`generating a strongly-ionized plasma.
`
`Wang at 7: 17-31 (“The background power level PB is chosen to exceed the
`minimum power necessary to support a plasma...
`[T]he application of the
`high peak power Pp quickly causes the already existing plasma to spread
`and increases the density of the plasma.”).
`
`Wang at 7: 19-22 (“Preferably, the peak power Pp is at least 10 times the
`background power PB, more preferably at least 100 times, and most
`preferably 1000 times to achieve the greatest effect of the invention.”).
`
`Wang at 4:29-31 (“. . .increases the sputtering rate but also at sufficiently
`high density ionizes a substantial fiaction of the sputtered particles into
`positively charged metal ions.”).
`
`at 7:31-39 “...hi hl
`ionized sutterin
`The combination ofWg and Kudryavtsev dscloses supplying feed gas
`proximate to an anode and a cathode assembly.
`
`TSMC-1023
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`TSMC v. Zond, Inc.
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`Page 1 of 14
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`TSMC-1023
`TSMC v. Zond, Inc.
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`

`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Claims 1-7, 9-17,
`and 19_20
`
`.
`.
`Wang 111 view of Kudryavtsev
`
`cathode assembly; Wang at 3:66-4:1 (“A grounded shield 24 protects the chamber walls from
`and
`sputter deposition and also acts as a grounded anode for the cathode of the
`negatively biased target 14.”)
`
`Wang at claim 27 “reactor [has an] anode with respect to a cathode of said
`target.”
`
`Wang at 4:5-8 (“A sputter working gas such as argon is supplied from a gas
`source 32.... [and] flows into the processing region 22”).
`
`Wang at 4:20-21 (“a reactive gas, for example nitrogen is supplied to the
`processing space 22. . .”).
`
`Wang at Fig. 1:
`
`S
`
`J
`
`N
`
`.
`
`C
`
`.
`
`:5
`
`\ ‘gm., ,. ..:..'
`
`
`.
`1
`‘
`‘
`»w~
`
`:
`
`CONTROL
`
`H G.
`
`The combination of Wang and Kudryavtsev discloses generating a Voltage
`pulse between the anode and the cathode assembly.
`
`Wang at Fig. 7:
`
`b) generating a
`Voltage pulse
`between the
`
`anode and the
`cathode assembly,
`
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`

`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Claims 1-7, 9-17,
`and 19_20
`
`Wang in view of Kudryavtsev
`
`FIG. 7
`
`Wang at 7:61-62 (“The pulsed DC power supply 80 produces a train of
`negative voltage pulses.”).
`
`Wang at Fig. 1.
`
`Wang at Fig. 6:
`
`Wang at 3:66-4:1 (“A grounded shield 24
`the cathode of the ne '
`'
`_
`
`acts as a grounded anode for
`.
`
`The combination of Wang and Kudryavtsev discloses the voltage pulse
`having at least one of a controlled amplitude and a controlled rise time that
`increases an ionization rate so that a rapid increase in electron density
`and a formation of a strongly-ionized plasma occurs.
`
`Wang at 7:28-30 (“. .. the application of the high peak power Pp instead
`quickly causes the already existing plasma to spread and increases the
`density of the plasma.”).
`
`ower Pp is at least 10 times the
`
`the voltage pulse
`having at least
`one of a
`controlled
`amplitude and a
`controlled rise
`time that
`increases an
`ionization rate so
`
`that a raid
`
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`

`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`.
`.
`Wang 111 view of Kudryavtsev
`
`background power PB ... and most preferably 1000 times. . .. A background
`power P3 of one kW will typically be sufficient. . ..”).
`
`Claims 1-7, 9-17,
`and 19_20
`
`increase in
`electron density
`and a formation of
`
`a strongly-ionized Kudryavtsev at 32, right col, 111] 5-6 (“The discharge occurred inside a
`plasma occurs
`cylindrical tube. . .. The gas was preionized by applying a dc current. . .. A
`voltage pulse
`was applied to the tube.”).
`
`Kudryavtsev at 31, right col, 1] 6 (“an explosive increase in ne [plasma
`density]. The subsequent increase in n, then reaches its maximum value,
`equal to the rate of excitation [equation omitted], which is several orders of
`magnitude greater than the ionization rate during the initial stage.”)
`
`Kudryavtsev at Abstract (“electron density increases explosively in time due
`to accumulation of atoms in the lowest excited states”)
`
`Kudryavtsev at 34, right col, 1] 4 (“the effects studied in this work are
`characteristic of ionization whenever a field is suddenly applied to a weakly
`ionized gas, they must be allowed for when studying emission mechanisms
`in pulsed gas lasers, gas breakdown, laser sparks, etc.”)
`
`Like Kudryavtsev’s voltage pulse, application of Wang’s voltage pulse
`(which produces the peak power Pp) to the weakly-ionized plasma rapidly
`increases the plasma density and the density of free electrons.
`
`If one of ordinary skill, did not experience Kudryavtsev’s “explosive
`increase” in plasma density in Wang, it would have been obvious to adjust
`the operating parameters, e.g., increase the pulse length and/or pressure, so
`as to trigger Kudryavtsev’s fast stage of ionization.
`
`One of ordinary skill would have been motivated to use Kudryavtsev’s fast
`stage of ionization in Wang so as to increase plasma density and thereby
`increase the sputtering rate. Also, Kudryavtsev’s fast stage would reduce
`the time required to reach a given plasma density in Wang, thus reducing
`the time required for a sputtering process. Further, use of Kudryavtsev’s
`fast stage in Wang would have been a combination of old elements that
`yielded predictable results. Finally, because Wang’s pulse, or the pulse
`used in the combination of Wang and Kudryavtsev, produced Kudryavtsev’s
`fast stage of ionization, the rise time and amplitude of the pulse result in
`increasing the ionization rate of excited atoms and creation of a multi-step
`ionization process.
`
`Also, Kudryavtsev states, “[s]ince the effects studied in this work are
`characteristic of ionization whenever a field is suddenly applied to a weakly
`ionized as, the must be allowed for when stud in ; emission mechanisms
`
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`

`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Claims 1-7, 9-17,
`and 19_20
`
`.
`.
`Wang 111 view of Kudryavtsev
`
`in pulsed gas lasers, gas breakdown, laser sparks, etc.” Kudryavtsev at 34,
`right col, 1] 4 (emphasis added). Because Wang applies voltage pulses that
`“suddenly generate an electric field,” one of ordinary skill reading Wang
`would have been motivated to consider Kudryavtsev and to use
`Kudryavtsev’s fast stage in Wang.
`
`Finally, Wang’s voltage pulse has both a controlled amplitude and rise time
`as required by claim 1. Wang specifies that the background power PB can
`be 1 kV and that the peak power Pp can be 1,000 times greater than the
`background power, i.e., 1 MW. Wang at 7: 19-25 (“Preferably, the peak
`power Pp is at least 10 times the background power PB
`and most
`preferably 1000 times. . .. A background power PB of one kW will typically
`be sufficient. . ..”). One of ordinary skill would have understood that
`Wang’s voltage amplitude was controlled to produce Wang’s specified peak
`power level Pp.
`
`The rise time of Wang’s voltage pulse is also controlled. Wang at 5:23-26
`(“The illustrated pulse form is idealized. Its exact shape depends on the
`design of the pulsed DC power supply 80, and significant rise times and fall
`times are exected.”
`
`The combination of Wang and Kudryavtsev discloses without forming an
`arc between the anode and the cathode assembly.
`
`without forming
`an arc between
`the anode and the
`
`cathode assembly. Wang at Fig. 6
`
`Wang at 7:3-6 (“Plasma ignition, particularly in plasma sputter reactors, has
`a tendency to generate particles during the initial arcing, which may
`dislodge large particles fiom the target or chamber.”)
`
`Wang at 7:47-49 (“The initial plasma ignition needs be performed only once
`and at much lower power levels so that particulates produced by arcing are
`much reduced.”).
`
`Wang at 7: 13-28 (“Accordingly, it is advantageous to use a target power
`waveform illustrated in FIG. 6.... As a result, once the plasma has been
`i nited at the be’
`'
`of s utterin rior to the illustrated waveform. . ..” .
`
`The combination of Wang and Kudryavtsev discloses applying a magnetic
`field proximate to the cathode assembly.
`
`2. The method of
`claim 1 fiirther
`comprising
`applying a
`magnetic field
`proximate to the Wang at Fig. 1.
`cathode assembly.
`
`See evidence cited for claim 1.
`
`Wan ; at 4:23-25 “A small rotatable ma netron 40 is dis osed in the back
`
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`

`
`Claims 1-7, 9-17,
`and 19-20
`
`3. The method of
`
`claim 2 fi1rther
`
`comprising
`moving the
`magnetic field.
`
`4. The method of
`
`claim 1 fi1rther
`
`comprising
`generating an
`electron Hall
`
`current fiom an
`
`electric field
`
`generated by the
`voltage pulse and
`fiom the magnetic
`field, the electron
`Hall current
`
`raising the
`temperature of the
`electrons in the
`
`weakly-ionized
`plasma to a
`temperature that
`enhances the
`
`increase in
`
`electron density
`and the formation
`
`of the strongly-
`ionized plasma.
`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Wang in view of Kudryavtsev
`
`of the tar et 14 to create a ma netic field near the face of the tar et 14.” .
`
`The combination of Wang and Kudryavtsev discloses moving the magnetic
`field.
`
`See evidence cited for claim 2.
`
`Wang at 4:23-24 (“A small rotatable magnetron 40 is disposed in the back
`
`Hall current fiom an electric field generated by the voltage pulse and fiom
`the magnetic field, the electron Hall current raising the temperature of the
`electrons in the weakly-ionized plasma to a temperature that enhances the
`increase in electron density and the formation of the strongly-ionized
`plasma.
`
`See evidence cited for claim 1.
`
`‘ 184 Patent at 3:21-23 (“The magnetic field 132 can also induce an electron
`Hall current 135 that is formed by the crossed electric and magnetic fields.”)
`
`‘ 184 Patent at 7: 14-17 (“Weakly-ionized plasmas are generally plasmas
`having plasma densities that are less than about 1012 — 1013 cm'3 ....”)
`
`‘ 184 Patent at 10:2-5 (“. . .increasing electron temperature caused by EXB
`Hall currents.”)
`
`‘ 184 Patent at 11:5-10 (“An electron EXB Hall current 135 is generated
`when the voltage pulse 252 applied between the target 118 and the anode
`124 generates primary electrons and secondary electrons that move in a
`substantially circular motion proximate to the target 118 according to
`crossed electric and magnetic fields.”).
`
`‘ 184 Patent at 20:5-7 (“The magnetic field 526 increases the density of
`electrons and therefore, increases the plasma density in the region 527.”).
`
`Wang at 4:35-37 (“[T]he magnetron 40 is small and unbalanced with a outer
`magnet 46 of one magnetic polarity surrounding an inner magnet 48 of the
`other polarity.”).
`
`Wang at Fig. 1.
`
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`

`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Claims 1-7, 9-17,
`and 19_20
`
`Wang in view of Kudryavtsev
`Muggnclit. field J. Llmlric field
`
`I I
`‘>\ ‘iI&§§
`
`-7112} {:46
`52?‘
`\\\\'\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\v
`
`Annotated Fig. 1 of ’184 Patent
`
`Annotated Fig. 9 of ’184 Patent
`
`Wang’s rotating magnetron induces an electron Hall current within a region
`that rotates with the magnetron.
`
`Background.‘
`Thornton at 173, left col, 111. (“When an electric field EL is applied
`perpendicular to a magnetic field of sufficient strength to affect the
`electrons but not the ions
`an electron Hall current
`will flow in the E x
`
`B direction.” .
`
`The combination of Wang and Kudryavtsev discloses the voltage pulse
`comprise[s] a multi-stage voltage pulse.
`
`See evidence cited for claim 1.
`
`‘ 184 Patent at Fig. 4.
`
`‘ 184 Patent at 7:22-23 (“The multi-stage voltage pulse 252 is a single
`voltage pulse having multiple stages as illustrated by the dotted line 253.”).
`
`‘ 184 Patent at 7: 19-21 (“One skilled in the art will appreciate that there are
`numerous variations of the exact shape of the multi-stage pulse according to
`the present invention”)
`
`Wang at 7:61-62 (“The pulsed DC power supply 80 produces a train of
`negative voltage pulses.”).
`
`5. The method of
`claim 1 wherein
`the voltage pulse
`comprise a multi-
`stage voltage
`pulse.
`
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`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Clain;sn:i_Z’9:(1}7’
`
`Wang in view of Kudryavtsev
`
`One of ordinary skill would have understood that Wang’s voltage pulse is a
`multi-stage pulse which produces a pulse Pp of constant power for the
`duration of the pulse rw. For example, during the first stage of the voltage
`pulse, the voltage has a high amplitude. During that first stage, the current
`flow through Wang’s plasma is relatively low because the plasma has a
`lower density associated with the background power PB. A high amplitude
`voltage is used to produce the peak power, Pp, while the current flow is low
`(i.e., power is the product of voltage and current; if power is constant and
`current is lower, the voltage will be higher).
`
`During a second stage of the voltage pulse, the voltage applied to the target
`is decreasing. As Wang’s peak power Pp is applied for an increasing length
`of time, the plasma density will rise, thus decreasing the resistance and
`increasing the current flow through the plasma. As the current increases,
`the voltage applied to the target decreases to maintain the constant high
`peak power, Pp.
`
`During a third stage of the voltage pulse, the plasma density stabilizes in
`Wang’s chamber. This produces a substantially constant current flowing
`through the plasma. This results in a corresponding substantially constant
`voltage for the remaining duration of the high peak power pulse, Pp.
`
`The voltage pulse shown in Mozgrin’s Fig. 3b has these same three phases,
`i.e., a high voltage during region 2a, a decreasing voltage in region 2b, and a
`constant voltage in region 3. For the reasons explained above, one of
`ordinary skill would have understood Wang’s voltage pulse to be shaped
`like the pulse shown in Mozgrin’s Fig. 3b.
`
`6. The method of
`
`claim 1 further
`comprising
`applying a voltage
`between the
`
`anode and the
`
`between the anode and the cathode assembly that sustains the strongly-
`ionized plasma.
`
`See evidence cited for claim 1.
`
`cathode assembly Wang at 7:61-62 (“pulsed DC power supply 80 produces a train of negative
`that sustains the
`voltage pulses.”).
`strongly-ionized
`
`7. The method of
`claim 1 wherein a
`lifetime of the
`
`The combination of Wang and Kudryavtsev discloses a lifetime of the
`strongly-ionized plasma is greater than 200 usec.
`
`l -ionized
`
`See evidence cited for claim 1.
`
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`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Wang in view of Kudryavtsev
`
`Its upper limit is dictated mostly by the
`Wang at 5:45-47 (“at least 50 us
`pulse repetition period rp, but it is anticipated that for most applications it
`will be less than 1 ms.”).
`
`One of ordinary skill would have understood that Wang’s peak power pulse
`Pp could have lasted up to 1 ms, i.e., much longer than the claimed 200
`sec.
`
`The combination of Wang and Kudryavtsev discloses an amplitude of the
`voltage pulse is sufficient to generate ionizational instabilities that enhance
`the ionization rate so as to cause a rapid increase in electron density and the
`formation of the strongly-ionized plasma.
`
`See evidence cited for claim 1.
`
`Clain;sn:i_Z’9:(1}7’
`
`plasma is greater
`than 200 usec.
`
`9. The method of
`claim 1 wherein
`an amplitude of
`the voltage pulse
`is sufficient to
`
`generate
`ionizational
`
`instabilities that
`
`The ‘I84 Patent does not teach that it is the ionization instabilities
`
`themselves that enhance the ionization rate. However, if that occurs in the
`enhance the
`‘ 184 Patent, it will occur in Wang as well, because both systems apply
`ionization rate so
`as to cause a rapid pulses under similar conditions. Moreover, because instabilities in plasmas
`increase in
`were well known by those of ordinary skill long before the ‘I84 Patent was
`electron density
`filed, it would have been obvious to use such instabilities in Wang.
`and the formation
`
`of the strongly-
`ionized plasma.
`
`Background
`Thornton at 173, right col, 112 (“Such drifts are inherently unstable, since
`any departure from charge neutrality in the form of charge bunching and
`separation (over distances of the order of the Debye length) create electric
`fields which cause second-order E x B drifts that can exacerbate the
`
`perturbation. These instabilities are often referred to as gradient-drift and
`neutral-drag instabilities.”).
`
`Thornton at 173, right col, 114 (“Plasma oscillations and instabilities are
`believed to la an imortant role in the o eration of ma netrons. . .” .
`
`10. The method of The combination of Wang and Kudryavtsev discloses at least some of the
`claim 1 wherein at
`ionizational instabilities comprise diocotron instabilities.
`least some of the
`
`See evidence cited for claim 1.
`
`‘ 184 Patent at 9:20-26 (“A high-power stage 283 includes voltage
`oscillations 284 that have peak-to-peak amplitudes that are on the order of
`about 50V. These "saw tooth" voltage oscillations 284 may be caused by the
`electron density forming a soliton (sic) waveform or having another non-
`linear mechanism, such as diocotron instability discussed above, that
`increases the electron density as indicated by the increasing discharge
`current 286.”
`
`ionizational
`
`instabilities
`
`comprise
`diocotron
`instabilities.
`
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`

`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Claims 1-7, 9-17,
`and 19_20
`
`.
`.
`Wang 111 view of Kudryavtsev
`
`‘ 184 Patent at 14:41-44 (“Voltage oscillations 354 in the high-power stage
`350 are sustained for about 100 usec. The voltage oscillations can are (sic)
`caused by the ionizational instabilities in the plasma as described herein,
`such as diocotron oscillations.”)
`
`The claim merely adds a reference to the well-known principle of
`“diocotron instability” to the otherwise obvious independent claim.
`Therefore, this claim is obvious for the same reasons as claim 9.
`
`Background:
`
`Thornton at 173, right col, 112 (“Drifts driven by the two density gradients
`
`1 1. A method of
`
`generating a
`strongly-ionized
`plasma, the
`method
`
`comrisin:
`
`a) supplying feed
`gas proximate to
`an anode and a
`
`generating a strongly-ionized plasma.
`
`See evidence cited in claim 1 preamble.
`
`The combination of Wang and Kudryavtsev discloses supplying feed gas
`proximate to an anode and a cathode assembly.
`
`cathode assembly; See evidence cited in claim 1(a).
`and
`
`b) generating a
`voltage pulse
`between the
`anode and the
`cathode assembly,
`the voltage pulse
`having at least
`one of a
`
`controlled
`amplitude and a
`controlled rise
`time that shifts an
`electron energy
`distribution in the
`
`The combination of Wang and Kudryavtsev discloses generating a voltage
`pulse between the anode and the cathode assembly, the voltage pulse having
`at least one of a controlled amplitude and a controlled rise time that shifts an
`electron energy distribution in the plasma to higher energies that increase an
`ionization rate so as to result in a rapid increase in electron density and a
`formation of a strongly-ionized plasma without forming an arc between the
`anode and the cathode assembly.
`
`See evidence cited in claim l(b).
`
`One of ordinary skill would have readily understood that the electron energy
`distribution shifts to higher energies in Wang, because Wang applies
`voltage pulses in a magnetron sputtering chamber.
`
`plasma to higher
`energies that
`increase an
`ionization rate so
`
`Background.‘
`Leipold at Abstract (“Application of a high voltage pulse causes a shift in
`the electron energy distribution function to higher energies. This causes a
`temor
`increase of the ionization rate and conseuentl an increase of
`
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`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Claims 1-7, 9-17,
`and 19_20
`
`.
`.
`Wang 111 view of Kudryavtsev
`
`the electron density.”)
`
`as to result in a
`rapid increase in
`Gudmundsson at Title (“[e]volution of the electron energy distribution
`electron density
`and a formation of a pulsed magnetron discharge.”).
`a strongly-ionized
`plasma without
`forming an arc
`between the
`anode and the
`
`Gudmundsson at 3427, right col, 1] 2 (“For the measurements presented
`here, the average power was 300 W, pulse width 100 us, and repetition
`frequency 50 Hz. The peak voltage was roughly 800 V. . ..”).
`
`in
`
`cathode assembly. Gudmundsson at 3428, left col, 1] 2 (“Figure l [of Gudmundsson] shows the
`evolution of the electron energy distribution fi1IlClIlOIl with time from
`initiating the pulse.”).
`
`Gudmundsson at 3429, right col, 1] l (“The average electron energy peaks at
`3.5 eV roughly 100 us after initiating the pulse. This peak in the average
`energy coincides with the presence of the high energy group of electrons
`apparent in the electron energy distribution.”)
`
`Gudmundsson at Figs. 1 and 2:
`006
`
`ODS
`
`004
`
`
`
`\'urnmli/mlFED?
`
`
`
`.\Iurn1nli7HlEEDF
`
`?
`
`5
`
`I
`3
`5 ]E'Vl
`
`2
`
`5
`
`‘
`3
`5 [e\' |
`
`5
`
`6
`
`I
`
`2‘
`
`FIG. 1. Normalized EEDF measured (at during pulses 60. 80. and 100 ps
`after initiating the pulse; (bl around the electron density rnaxinmin 105. 110.
`and 130 ,us after initiating the pulse: and (cl 250. 350. and -150 ps after
`initiating the pulse. Pulse length. 100 ,us: average power. 300 W: and pres-
`sure 2 n1Ton‘.
`
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`

`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Claims 1-7, 9-17,
`and 19_20
`
`Wang in view of Kudryavtsev
`
`100
`
`200
`
`300
`
`400
`
`500
`
`L>
`T:‘ed
`'5..
`c
`3.
`
`0
`
`100
`
`200
`
`300
`
`400
`
`500
`
`1 yrs]
`lb! average electron energy, and Icl
`la) Electron density,
`2,
`FIG,
`¢ flnaung potential 1'},
`- plasma potential Ypl, and ' potential difiermce
`¢I"1,f Fat a-: a function ofmne from inmanm of the pulse Targei cunrm
`pulse length. 100 us: average power. 500 W: and pressure. I mTorr
`
`Gudmundsson’s teaching that applying a voltage pulse that raises the
`density of a plasma also “shifts an electron energy distribution in the plasma
`to higher energies” is part of the background knowledge that one of ordinary
`skill would have in mind while readin; Wan.
`
`See evidence cited for claim 1 1.
`
`12. The method of The combination of Wang and Kudryavtsev discloses applying a magnetic
`claim 11 further
`field proximate to the cathode assembly.
`comprising
`applying a
`magnetic field
`proximate to the
`cathode assembl
`
`See evidence cited for claim 2.
`
`.
`
`13. The method of The combination of Wang and Kudryavtsev discloses moving the magnetic
`claim 12 further
`field.
`
`ActiveUS l227656l0v.l
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`TSMC-1023 I Page 12 of 14
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`TSMC-1023 / Page 12 of 14
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`

`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`Wang in view of Kudryavtsev
`
`See evidence cited for claim 12.
`
`See evidence cited for claim 3.
`
`Clain;sn:i_Z’9:(1}7’
`
`moving the
`magnetic field.
`
`14. The method of The combination of Wang and Kudryavtsev discloses generating an electron
`claim 12 further
`Hall current from an electric field generated by the voltage pulse and fiom
`comprising
`the magnetic field, the electron Hall current raising the temperature of the
`generating an
`electrons in the weakly-ionized plasma to a temperature that enhances the
`electron Hall
`increase in electron density and the formation of the strongly-ionized
`current from an
`plasma.
`electric field
`
`See evidence cited for claim 12
`
`generated by the
`voltage pulse and
`fiom the magnetic See evidence cited for claim 4.
`field, the electron
`Hall current
`
`raising the
`temperature of the
`electrons in the
`
`weakly-ionized
`plasma to a
`temperature that
`enhances the
`
`increase in
`
`electron density
`and the formation
`
`of the strongly-
`ionized lasma.
`
`15. The method of The combination of Wang and Kudryavtsev discloses the voltage pulse
`claim 11 wherein
`comprise[s] a multi-stage voltage pulse.
`the voltage pulse
`comprise a multi-
`stage voltage
`ulse.
`
`See evidence cited for claim 1 1.
`
`See Claim 5.
`
`16. The method of The combination of Wang and Kudryavtsev discloses applying a voltage
`claim 11 further
`between the anode and the cathode assembly that sustains the strongly-
`comprising
`ionized plasma.
`applying a voltage
`between the
`
`See evidence cited for claim 1 1.
`
`anode and the
`
`cathode assembly
`that sustains the
`
`strongly-ionized
`lasma.
`
`See evidence cited for claim 6.
`
`17. The method of The combination of Wan ; and Ku avtsev discloses a lifetime of the
`
`ActiveUS l22765610v.1
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`TSMC-1023 I Page 13 of 14
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`TSMC-1023 / Page 13 of 14
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`

`
`EXHIBIT G.05
`
`U.S. Patent No. 7,808,184
`
`.
`.
`Wang 111 view of Kudryavtsev
`
`strongly-ionized plasma is greater than 200 usec.
`
`See evidence cited for claim 1 1.
`
`See evidence cited for claim 7.
`
`Claims 1-7, 9-17,
`and 19_20
`
`claim 11 wherein
`a lifetime of the
`
`strongly-ionized
`plasma is greater
`than 200 sec.
`
`19. The method of The combination of Wang and Kudryavtsev discloses an amplitude of the
`claim 11 wherein
`voltage pulse is sufficient to generate ionizational instabilities that enhance
`an amplitude of
`the ionization rate resulting in a rapid increase in electron density and the
`the voltage pulse
`formation of the strongly-ionized plasma.
`is sufficient to
`
`generate
`ionizational
`
`See evidence cited for claim 1 1.
`
`instabilities that
`
`See evidence cited for claim 9.
`
`enhance the
`
`ionization rate
`
`resulting in a
`rapid increase in
`electron density
`and the formation
`
`of the strongly-
`ionized lasma.
`
`20. The method of The combination of Wang and Kudryavtsev discloses the ionizational
`claim 11 wherein
`instabilities comprise at least some diocotron instabilities.
`the ionizational
`
`instabilities
`
`See evidence cited for claim 1 1.
`
`comprise at least
`some diocotron
`
`instabilities.
`
`See evidence cited for claim 10.
`
`ActiveUS l227656l0v.l
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`l4
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`TSMC-1023 I Page 14 of 14
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