Filed on behalf of The Petitioners
`By: David L. Cavanaugh, Reg. No. 36,476
`
`Yung-Hoon Ha, Reg. No. 56,368
`
`Wilmer Cutler Pickering Hale and Dorr LLP
`
`1875 Pennsylvania Ave., NW
`
`Washington, DC 20006
`Tel: (202) 663-6000
`Email: David.Cavanaugh@wilmerhale.com
`Yung-Hoon.Ha@wilmerhale.com
`
`
`
`UNITED STATES PATENT AND TRADEMARK OFFICE
`
`____________________________________________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`
`____________________________________________
`
`The Gillette Company, Fujitsu Semiconductor Limited, and Fujitsu Semiconductor
`America, Inc.
`
`Petitioners,
`
`
`v.
`
`Zond, Inc.
`Patent Owner of U.S. Patent No. 6,896,773
`Trial No. IPR2014-007261
`
`
`
`PETITIONERS’ DEMONSTRATIVE EXHIBITS FOR ORAL ARGUMENT
`
`
`1 Case IPR2014-01481 has been joined with the instant proceeding.
`
`
`
`
`

`

`UNITED STATES PATENT AND TRADEMARK OFFICE
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`
`The ’773 Patent:
`The Gillette Company, Fujitsu Semiconductor Limited, and Fujitsu
`Semiconductor America, Inc.
`
`v.
`
`Zond, LLC.
`
`IPR2014-580 (joined with IPR2014-1479) and
`
`IPR2014-726 (joined with IPR2014-1481)
`
`June 16, 2015
`
`1
`
`

`

`Overview
`
`• Overview of the ’773 Patent
`
`• Grounds Instituted by the Board
`
`• Overview of Prior Art
`
`• Issues Raised by Patent Owner
`
`• Conclusion
`
`2
`
`

`

`The ’773 Patent
`The ’773 Patent
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`GILLEITE 1m1
`
`(10) Patent No.3
`
`(45) Date of Patent:
`
`US 6,896,773 B2
`*May 24, 2005
`
`
`
`(54} HIGH DEPOSITION RATE SPUTTERING
`
`
`
`
`.
`- Ill
`III
`III
`
`.
`.
`
`5W
`“x.
`
`50?
`
`1D
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`
`US Patent 6,896,773, IPR2014-580, Ex. 1001
`US Patent 6,896,773, IPR2014-580, EX. 1001
`
`
`3
`
`

`

`The ’773 Patent
`Relates to a
`“sputtering source"
`
`Feed gas (256) provided between
`cathode assembly (216) and
`anode (238)
`
`Pulsed power supply (234)
`generates weakly-ionized
`plasma (262)
`
`Pulsed power supply (234)
`applies voltage pulse between
`cathode assembly (216) and
`anode (238) generates
`strongly-ionized plasma (268)
`
`’773 Patent, Figs. 5B, 5C and 5D, IPR2014-00580, Ex. 1001 (with annotations)
`
`4
`
`

`

`The ’773 Patent
`Non-linear increase in sputtering yield
`
`• Voltage pulse applied to
`cause sputtering yield to
`be non-linearly related to
`a temperature of the
`sputtering target
`
`’773 Patent, 19:5-18, IPR2014-00580, Ex. 1001
`
`’773 Patent, 18:67-19:1, IPR2014-00580, Ex. 1001
`
`’773 Patent, Fig. 8, IPR2014-00580, Ex. 1001
`
`5
`
`

`

`The ’773 Patent
`Representative Independent Claims 1 & 34
`
`Claim 1
`
`Claim 34
`
`’773 Patent, IPR2014-00580, Ex. 1001
`
`6
`
`

`

`Board’s Decisions on Institution
`
`• The Board found that there is a reasonable likelihood that
`Petitioner would prevail based on the following grounds:
`
`Errata on Decision on Institution, IPR2014-580, Paper No. 19
`
`Decision on Institution, IPR2014-726, Paper No. 8
`
`7
`
`

`

`Patent Owner Does Not Challenge Construction
`Adopted by the Board
`
`There is no dispute as to the constructions adopted by the Board
`
`• “weakly-ionized plasma”
`
`• “strongly-ionized plasma”
`
`• “means for ionizing a feed gas to generate
`a weakly-ionized gas”
`
`• “means for increasing the density of the
`weakly-ionized plasma”
`
`8
`
`

`

`Applied Prior Art: Mozgrin
`
`Feed gas provided between
`cathode and anode
`
`Voltage pulse generates
`an electric field between
`the anode and cathode
`to generate plasma
`
`Mozgrin, p. 402, IPR2014-00580, Ex. 1002
`
`Mozgrin, Fig. 1, IPR2014-00580, Ex. 1002 (with annotations)
`
`9
`
`

`

`Applied Prior Art: Mozgrin
`
`Power supply applies voltage between
`cathode and anode to generate
`weakly-ionized plasma by voltage
`
`Power supply applies voltage pulse
`between cathode and anode to
`generate strongly-ionized plasma
`
`Mozgrin, Fig. 3(b) IPR2014-00580, Ex. 1002
`
`Mozgrin, Fig. 2 IPR2014-00580, Ex. 1002;
`see also Mozgrin, p. 401, IPR2014-00580, Ex. 1002;
`Mozgrin, p. 409, IPR2014-00580, Ex. 1002
`
`10
`
`

`

`Applied Prior Art: Fortov
`
`Voltage pulse applied to
`cause sputtering yield to be
`non-linearly related to a
`temperature of the
`sputtering target
`
`Fortov, p. 16, IPR2014-00580, Ex. 1004
`
`Fortov, p. 9, IPR2014-00580, Ex. 1004
`
`11
`
`

`

`The ’773 Patent and Mozgrin
`
`Pulsed power supply applies voltage pulse between
`cathode and anode to generate strongly-ionized plasma
`
`’773 Patent
`
`Mozgrin
`
`’773 Patent, Figs. 5B, 5C and 5D, IPR2014-00580,
`Ex. 1001 (with annotations)
`
`Mozgrin, Fig. 1, IPR2014-00580,
`Ex. 1002 (with annotations)
`
`12
`
`

`

`The ’773 Patent and Fortov
`
`’773 Patent
`
`Fortov
`
`’773 Patent, Fig. 8, 18:67-19:1 and 19:5-18, IPR2014-00580, Ex. 1001
`
`Fortov, pp. 9 and 16, IPR2014-00580, Ex. 1004
`
`13
`
`

`

`Issues Raised by Patent Owner Related to
`Independent Claims
`
`• Whether Mozgrin teaches a “feed gas” (claims 1, 21, 34 and 40)
`
`• Whether Mozgrin teaches “a feed gas proximate to the anode
`and the cathode assembly” (claims 1 and 34)
`
`• Whether Mozgrin or Fortov individually teach “an amplitude and
`a rise time of the voltage pulse being chosen to increase a density
`of ions in the strongly ionized plasma enough to generate sufficient
`thermal energy in the sputtering target to cause a sputtering yield to
`be non-linearly related to a temperature of the sputtering target” or
`corresponding limitations in the other independent claims (claims
`1, 21, 34, and 40)
`
`14
`
`

`

`The ’773 Patent
`Representative Independent Claims 1 & 34
`
`Claim 1
`
`Claim 34
`
`’773 Patent, IPR2014-00580, Ex. 1001
`
`15
`
`

`

`Issues Raised by Patent Owner Related to
`Independent Claims
`
`• Whether Mozgrin teaches a “feed gas” (claims 1, 21, 34 and 40)
`
`• Whether Mozgrin teaches “a feed gas proximate to the anode
`and the cathode assembly” (claims 1 and 34)
`
`• Whether Mozgrin or Fortov individually teach “an amplitude and
`a rise time of the voltage pulse being chosen to increase a density
`of ions in the strongly ionized plasma enough to generate sufficient
`thermal energy in the sputtering target to cause a sputtering yield to
`be non-linearly related to a temperature of the sputtering target” or
`corresponding limitations in the other independent claims (claims
`1, 21, 34, and 40)
`
`16
`
`

`

`Mozgrin Teaches a “Feed Gas”
`
`Mozgrin at p. 402, IPR2014-00580, Ex. 1002
`
`Mozgrin, Table 1, IPR2014-00580, Ex. 1002
`
`17
`
`

`

`Mozgrin Teaches a “Feed Gas”
`Independent Claims 1, 21, 34, and 40
`
`• Patent Owner argues that “feed gas” requires continuous flow of gas:
`
`• Board previously rejected such a narrow reading of “feed gas”:
`
`Patent Owner’s Response at p. 39, IPR2014-00580
`
`Petitioner’s Reply at p. 3, IPR2014-00580
`
`18
`
`

`

`Mozgrin Teaches a “Feed Gas”
`Independent Claims 1, 21, 34, and 40
`
`• One skilled in the art would have understood Mozgrin to teach
`providing a constant flow of gas
`
`Q. Just point me to where in the Mozgrin reference he’s talking about
`using a constant flow of gas.
`
`A. … I think he teaches it because … he’s applying these pulses over
`many periods. He’s getting these very high deposition rates. And
`you know, just the body of the work suggests to me that this is a
`constant flow of gas going on. He mentions about the pressure.
`So … in order for the pressure to stay constant, you’d have to
`keep applying this flow of gas and pumping it out.
`
`DeVito Dep. at 84:13-85:1, IPR2014-00580, Ex. 2010
`
`19
`
`

`

`Mozgrin Teaches a “Feed Gas”
`Independent Claims 1, 21, 34, and 40
`
`• Patent Owner refers to Mozgrin’s Thesis (Ex. 1015), which
`explicitly details use of a “needle valve,” as allegedly
`teaching a static gas
`
`Patent Owner Response at pp. 39 and 56, IPR2014-00580
`
`• Needle valves provide a continuous flow of gas
`
`Ehrenberg, p. 81, IPR2014-580, Ex. 1026
`
`20
`
`

`

`Controlling the Flow of a Feed Gas was Well-Known
`
`Q. Controlling the flow of a feed gas to a magnetron chamber
`was well known before the alleged ’773 invention; correct?
`
`A. Yes.
`
`* * * *
`
`Q. Using a flow controller --?
`
`A. Yeah.
`
`-- to supply a continuous feed gas to a magnetron
`Q.
`chamber was known before the alleged ’773 invention;
`right?
`
`A. Yes.
`
`Hartsough Dep. at 31:16-32:14, Ex. 1025
`(interposing objections omitted)
`
`21
`
`

`

`Issues Raised by Patent Owner Related to
`Independent Claims
`
`• Whether Mozgrin teaches a “feed gas” (claims 1, 21, 34 and 40)
`
`• Whether Mozgrin teaches “a feed gas proximate to the anode
`and the cathode assembly” (claims 1 and 34)
`
`• Whether Mozgrin or Fortov individually teach “an amplitude and
`a rise time of the voltage pulse being chosen to increase a density
`of ions in the strongly ionized plasma enough to generate sufficient
`thermal energy in the sputtering target to cause a sputtering yield to
`be non-linearly related to a temperature of the sputtering target” or
`corresponding limitations in the other independent claims (claims
`1, 21, 34, and 40)
`
`22
`
`

`

`Mozgrin Teaches “Proximate”
`Independent Claims 1 and 34
`
`• Mozgrin’s shaped electrodes 10 times smaller than what Patent
`Owner’s expert considers “proximate”
`
`A.
`
`In region 245, that entire region is
`proximate to both the anode and the
`cathode assembly.
`Hartsough Dep. 120:4-8, IPR2014-00580, Ex. 1025
`
`10mm
`
`100mm
`
`Mozgrin, Fig. 1, IPR2014-00580, Ex. 1002 (with annotations)
`
`’773 Patent, Figure 5A, IPR2014-00578, Ex. 1001
`
`Mozgrin, p. 401, IPR2014-580, Ex. 1002
`
`’773 Patent, 10:22-24, IPR2014-00580, Ex. 1001
`
`23
`
`

`

`Mozgrin Teaches “Proximate”
`Independent Claims 1 and 34
`
`• Mozgrin’s planar electrode had the feed gas adjacent
`to the cathode
`
`Mozgrin, p. 400-401, IPR2014-00580, Ex. 1002
`
`Mozgrin, p. 401, IPR2014-580, Ex. 1002
`
`Q. Is any point within the region 245
`proximate to both the anode and cathode?”
`
`A.
`
`In region 245, that entire region is
`proximate to both the anode and the
`cathode assembly.
`Hartsough Dep. 120:4-8, IPR2014-00580, Ex. 1025
`
`Mozgrin, Fig. 1, IPR2014-00580, Ex. 1002 (with annotations)
`
`’773 Patent, Figure 5A, IPR2014-00578, Ex. 1001
`
`24
`
`

`

`Mozgrin Teaches “Proximate”
`Independent Claims 1 and 34
`
`Q. Mozgrin does not teach how far the cathode is separated
`from the anode in the planar magnetron structure, correct?
`
`A. It does not, in a text, call out in similar fashion a
`numeric value. It has illustration in Figure 1(a) that
`shows the gap to be less than the diameter by a
`significant degree which comports with a worker of
`skill’s understanding of generally how these devices
`would be built. But, as I said, does not call out
`numerically, again.
`
`Bravman Dep. at 27:9-21, Ex. 2013
`(interposing objection omitted)
`
`25
`
`

`

`Issues Raised by Patent Owner Related to
`Independent Claims
`
`• Whether Mozgrin teaches a “feed gas” (claims 1, 21, 34 and 40)
`
`• Whether Mozgrin teaches “a feed gas proximate to the anode
`and the cathode assembly” (claims 1 and 34)
`
`• Whether Mozgrin or Fortov individually teach “an amplitude and
`a rise time of the voltage pulse being chosen to increase a density
`of ions in the strongly ionized plasma enough to generate sufficient
`thermal energy in the sputtering target to cause a sputtering yield to
`be non-linearly related to a temperature of the sputtering target” or
`corresponding limitations in the other independent claims (claims
`1, 21, 34, and 40)
`
`26
`
`

`

`“amplitude and a rise time… to be non-linearly related
`to a temperature of sputtering target” Well Known
`Independent Claims 1, 21, 34, and 40
`
`• Mozgrin teaches applying a voltage pulse having an amplitude
`and rise time to generate a strongly-ionized plasma
`
`Q. And Mozgrin delivers a voltage pulse
`to that weakly-ionized plasma; correct?
`
`A. Yes. … It has an amplitude … Has a
`rise time. …
`
`Q. And looking at Mozgrin, it would be a
`rapid increase form the weakly-ionized
`plasma; right?
`
`A. Yes.
`
`Q. Now, this voltage pulse in Mozgrin will
`cause a rapid increase in the density of
`the weakly-ionized plasma; correct?
`
`Q. So this is a strongly-ionized plasma
`generated in the sputtering regime of
`Mozgrin; correct?
`
`A.
`
`It says that the plasma density grows.
`…
`
`Hartsough Dep. 77:20-78:16, IPR2014-00580, Ex. 1025
`(interposing questions and objections omitted)
`
`A.
`
`It’s in the regime 2, where – where
`sputtering occurs.
`Hartsough Dep. 79:3-6 and 80:13-18, IPR2014-00580, Ex. 1025
`(interposing objections omitted)
`
`27
`
`

`

`“amplitude and a rise time… to be non-linearly related
`to a temperature of sputtering target” Well Known
`Independent Claims 1, 21, 34, and 40
`
`• Copper targets described in both Mozgrin and Fortov would
`behave according to the non-linear relationship with temperature
`of the sputtering target
`
`Q. Now, Fortov describes using a copper
`target; right?
`
`A. Yes.
`
`Q. Mozgrin describes using a copper
`target; right?
`
`A. Yes.
`
`Q. So for copper target, being described
`here, we can expect the nonlinear
`relationship to begin somewhere
`around .7 TM, the melting point of
`copper?
`
`A. Yeah.
`
`Hartsough Dep. 69:7-13, IPR2014-00580, Ex. 1025
`(interposing objection omitted)
`
`Hartsough Dep. 75:10-13, IPR2014-00580, Ex. 1025
`(interposing objection omitted)
`
`28
`
`

`

`Mozgrin and Fortov: Person of Skill Would Have Been
`Motivated to Increase Sputtering Yield
`Independent Claims 1, 21, 34, and 40
`
`• Dr. Hartsough admitted that one skilled in the art would have
`been motivated to increase sputtering yield in a sputtering
`application
`
`Q. So a person of ordinary skill would have been
`motivated to increase the sputtering yield in a
`sputtering application; correct?
`
`A. Yes.
`
`Hartsough Dep. 53:13-17, IPR2014-00580, Ex. 1025
`(interposing objection omitted)
`
`29
`
`

`

`Mozgrin and Fortov: Both Teach Sputtering
`Independent Claims 1, 21, 34, and 40
`
`• Patent Owner argues Mozgrin has no sputtering in “region 3” so
`one skilled in the art would not have combined with Fortov
`
`• Mozgrin does teach sputtering in regime 2
`
`Q. So this is a strongly-ionized
`plasma generated in the
`sputtering regime of
`Mozgrin; correct?
`
`A. It’s in the regime 2, where –
`where sputtering occurs.
`
`Hartsough Dep. 80:13-18, IPR2014-00580, Ex. 1025
`(interposing objection omitted)
`
`Mozgrin, p. 401, IPR2014-580, Ex. 1002
`
`Bravman Dec. ¶59, IPR2014-00580, Ex. 1028
`
`30
`
`

`

`Mozgrin and Kudryavtsev:
`Mozgrin Expressly Cites Kudryavtsev
`
`Mozgrin at p. 401, IPR2014-580, Ex. 1002,
`see also, Bravman Dec. ¶ 71, Ex. 1028
`
`31
`
`

`

`Mozgrin and Lantsman:
`Person of Ordinary Skill Would Be Able to Combine
`Lantsman’s Gas Flow Controller with Mozgrin
`
`Q. So it’s not your position that a person of ordinary skill would not be
`able to combine a constant DC supply with a pulsed DC supply; right?
`
`A. . . . It wouldn’t be – it – it wouldn’t be beyond the skill of a
`person of – of ordinary skill in the art.
`
`Hartsough Dep. at 152:9-18, Ex. 1029 (interposing objection omitted),
`see also, Bravman Dec. ¶ 71, Ex. 1028
`
`Q. Are there any benefits to continuously supplying feed gas to a
`magnetron chamber and sputtering?
`
`A. Yes.
`
`Hartsough Dep. at 32:17-20, Ex. 1025
`
`32
`
`

`

`Issues Raised by Patent Owner Related to
`Dependent Claims
`
`• Issues already addressed by independent claims equally
`applicable to the following dependent claims
`
`‒ Whether one skilled in the art would have combined Mozgrin with
`Lantsman because Mozgrin does not teach a “feed gas”
`(claims 3, 4, 24, 25, 28, and 35)
`
`‒ Whether one skilled in the art would have combined Kudryavtsev because
`in Mozgrin, “sputtering does not occur in region 3” (claim 23)
`
`33
`
`

`

`Additional Issues Raised by Patent Owner Related to
`Dependent Claims
`
`• Additional issues related to following dependent claims
`
`‒ Whether Mozgrin Thesis is prior art (claim 2)
`
`‒ Whether Kawamata does not substantially increase the average
`temperature of the sputtering target (claims 5 and 36)
`
`‒ Whether Mozgrin teaches a single power supply (claim 18)
`
`‒ Whether Mozgrin’s annular plasma discharge is uniform (claim 13)
`
`‒ Whether claim 10 requires a third electrode
`
`‒ Whether “evaporation” is taught by the prior art (claim 29)
`
`‒ Whether Mozgrin teaches “increase an ionization rate” and whether
`Mozgrin teaches choosing experimental variables for a particular
`intended purpose (claims 11 and 14)
`
`34
`
`

`

`Mozgrin Thesis is Prior Art
`Dependent Claim 2
`
`US Patent 6,896,773, Ex. 1001
`
`Ex. 1014
`
`35
`
`

`

`Kawamata Teaches Holding the Temperature of the
`Target Substantially Constant
`Dependent Claims 5 and 36
`
`• Patent Owner’s own expert agrees Kawamata teaches using cooling water to
`maintain the temperature of the sputtering target
`
`• “Cooling water (8) for holding the temperature of the magnetron cathode (5)
`constant flows against a lower face of the magnetron cathode (5)”
`Kawamata at Abstract, Ex. 1009
`
`• “The MgF2 granules 3 were heated by the plasma with their temperature
`maintained by a balance between plasma heating and cooling by cooling water 8
`flowing on the lower face of the magnetron cathode 5 and thus sputtered.”
`Kawamata at 7:36-40, Ex. 1009
`
`Q.
`
`[Kawamata] says, “cooling water aid for holding the temperature of the magnetron
`cathode constant.”
`
`A. Okay.
`
`Q. So we can agree that Kawamata maintains the cathode temperature constant; right?
`
`A.
`
`It – it says, for holding constant. Okay.
`
`Hartsough Dep. at 143:17-24, Ex. 1025
`(interposing objection omitted)
`
`36
`
`

`

`Mozgrin Teaches a Single Power Supply
`Dependent Claim 18
`
`Mozgrin, p. 401 and Fig. 2, IPR2014-580, Ex. 1002
`
`Q. And the way that Mozgrin chose to deliver the energy is through one
`interconnected circuit where you couldn’t simply remove the high-
`voltage supply unit and have it operate the same; right?
`
`A. Yes.
`
`Hartsough ’773 Dep. at 170:23-171:3, Ex. 1025
`(interposing objection omitted)
`
`37
`
`

`

`Mozgrin’s Plasma Discharge is Uniform Adjacent to the Cathode
`Dependent Claim 13
`
`Q. Yeah, it talks about applying
`a magnetic field to more
`uniformly distribute the plasma,
`but so does Mozgrin; right?
`
`A.
`
`It talks about the – in figures,
`you know, 7A, B, C, it talks
`about how – and D – how the
`magnetic field is affected by
`the circulating currents to –
`to spread more uniformly.
`
`Q. And those same effects would
`occur in Mozgrin; correct?
`
`A. They would tend to occur.
`
`Hartsough ‘773 Dep. at 163:21-164:7, Ex. 1025
`(interposing objection omitted)
`
`Mozgrin, p. 401 and Fig. 6(a)(1) , IPR2014-580, Ex. 1002,
`Bravman Decl. ¶ 80
`
`38
`
`

`

`Claim 10 Does Not Require a Third Electrode
`
`• Zond argues “the ionization source [that generates a weakly-
`ionized plasma]” requires a component other than the cathode
`assembly or the anode recited in claim 1
`
`• ’773 teaches embodiment where the ionization source can be
`either the anode, cathode assembly or a third electrode
`
`’773 Patent at 8:19-23, Ex. 1001
`
`39
`
`

`

`Mozgrin and Fortov Teach Evaporation of the Target Surface
`Dependent Claim 29
`
`Fortov, p. 16 of 23, IPR2014-580, Ex. 1004
`
`A. Well, I mean, one of skill in the art who had these references in front of him
`would have said, look … Mozgrin is trying to do higher sputter yield with this
`technique. Fortov has a recipe for getting to a certain temperature, increase
`sputtering yield. I’m pretty sure that I can modify these powers and rise times
`to get to this temperature. Let me put these together and make it happen.
`
`DeVito Dep, 64:19 – 65:2, IPR2014-580, Ex. 2010
`(interposing objection omitted)
`
`40
`
`

`

`Mozgrin Chose Experimental Variables to Increase
`Ionization Rate
`Dependent Claims 11 and 14
`
`• Patent Owner’s expert admits high plasma density indicates an increased
`ionization rate
`
`• Mozgrin teaches choosing experimental conditions that lead to increased
`plasma density
`
`Q.
`
`A.
`
`. . . When the voltage -- when the increased
`voltage is applied to the weakly-ionized
`plasma, if you have a quick increase in the
`plasma density, does that indicate a quick
`increase in the rate of ionization?
`
`It indicates an increase -- an -- it indicates a
`different rate of ionization between the two
`states. So increase -- increase from the rate of
`ionization in the low-density state, the rate
`would increase.
`
`Hartsough ’184 Dep, 88:21 – 89:6, IPR2014-580, Ex. 1031
`(interposing objection omitted)
`
`Mozgrin, p. 400, IPR2014-580, Ex. 1002
`
`41
`
`

`

`Conclusion
`
`• All disputed claims of the ’773 patent are invalid in view of the
`following combination of cited references
`
`Errata on Decision on Institution, IPR2014-580, Paper No. 19
`
`Decision on Institution, IPR2014-726, Paper No. 8
`
`42
`
`

`

`BACK UP SLIDES
`BACK UP SLIDES
`
`43
`43
`
`

`

`Mozgrin Discloses Controlling Voltage
`
`Q. And the controlled variable in Morzgrin’s control system would be
`voltage because that’s what he’s applying; right?
`
`A. It - - it’s a little difficult to determine what he means - - what - -
`when - - how a controlled variable would be, but it could be.
`
`Hartsough ’773 Dep. at 83:19-25, Ex. 1025
`see also Petitioner’s Reply at p. 7, IPR2014-00580
`(interposing objection omitted)
`
`44
`
`

`

`
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`
`
`Dated: June 11, 2015
`
`Trial No. IPR2014-00726
`Petitioners’ Demonstrative Exhibits for Oral Argument
`
`
`Respectfully Submitted,
`
`/David L. Cavanaugh/
`
`David L. Cavanaugh
`Registration No. 36,476
`WILMER CUTLER PICKERING
`HALE AND DORR LLP
`1875 Pennsylvania Avenue, N.W.
`Washington, D.C. 20006
`david.cavanaugh@wilmerhale.com
`Tel.: 202-663-6000
`Fax: 202-663-6363
`
`
`
`
`
`
`
`

`

`Trial No. IPR2014-00726
`Petitioners’ Demonstrative Exhibits for Oral Argument
`
`
`CERTIFICATE OF SERVICE
`
`I hereby certify that on June 11, 2015, I caused a true and correct copy of the
`
`foregoing materials:
`
` Petitioners’ Demonstrative Exhibits for Oral Argument
`
`to be served via e-mail, as previously agreed by the parties, on the following
`
`attorneys of record:
`
`
`
`Dr. Gregory J. Gonsalves
`2216 Beacon Lane
`Falls Church, VA 22043
`(571) 419-7252
`gonsalves@gonsalveslawfirm.com
`
`Bruce Barker
`Chao Hadidi Start & Barker LLP
`176 East Mail Street, Suite 6
`Westborough, MA 01581
`bbarker@chsblaw.com
`
`
`
`
`
` /Yung-Hoon Ha/
` Yung-Hoon Ha
` Registration No. 56,368
`
`
`
`
`
`
`
`