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`EXHIBIT 2013
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`UNITED STATES PATENT AND TRADEMARK OFFICE
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`---------------------------------------------------------------X
`THE GILLETTE COMPANY, et al.,
`
` Patent No. 6,896,773
` Petitioners, IPR 2014-00580
` IPR 2014-00726
` -against-
`ZOND, LLC,
`
` PATENT OWNER.
`---------------------------------------------------------------X
`
` VIDEOTAPED DEPOSITION OF
` JOHN BRAVMAN, Ph.D.
` Lewisburg, Pennsylvania
` Wednesday, April 22, 2015
`
`Reported by:
`Rebecca Schaumloffel, RPR, CLR
`Job No: 92740
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` April 22, 2015
` 8:07 a.m.
`
` Videotaped deposition of JOHN
`BRAVMAN, Ph.D., held at the BEST WESTERN PLUS
`COUNTRY CUPBOARD INN, 7701 West Branch
`Highway, Lewisburg, Pennsylvania, before
`Rebecca Schaumloffel, a Registered
`Professional Reporter, Certified Livenote
`Reporter and Notary Public of the States of
`New York, New Jersey, and Pennsylvania.
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`A P P E A R A N C E S:
`
` WILMERHALE
` Attorneys for the Petitioner
` 7 World Trade Center
` 250 Greenwich Street
` New York, New York 10007
` BY: COSMIN MAIER, ESQ.
` YUNG-HOON HA, Ph.D., ESQ.
`
` GONSALVES LAW FIRM
` Attorneys for the Patent Owner, Zond
` 2216 Beacon Lane
` Falls Church, Virginia 22043
` BY: GREGORY GONSALVES, ESQ.
`
` ALSO PRESENT:
`
` Larry Moskowitz, Legal Videographer
`
` * * *
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` J. BRAVMAN
` THE VIDEOGRAPHER: Good morning,
`we are now on the record. This is the
`start of tape labeled number one of
`the videotaped deposition of John
`Bravman Ph.D., in the matter The
`Gillette Company versus Zond, Inc.
` This deposition is being held at
`the Best Western, 7701 West Branch
`Highway, Lewisburg, Pennsylvania on
`April 22, 2015, at approximately
`8:08 a.m. My name is Larry Moskowitz
`from TSG Reporting Inc., and I am the
`legal video specialist. The Court
`Reporter is Rebecca Schaumloffel,
`also, in association with TSG
`Reporting.
` Will counsel please introduce
`themselves for the record.
` MR. GONSALVES: My name is
`Dr. Gregory Gonsalves representing the
`patent owners, Zond.
` MR. MAIER: Cosmin Maier of
`WilmerHale on behalf of petitioner,
`Gillette Company; and with me is my
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` J. BRAVMAN
` colleague, Sam Ha.
`J O H N B R A V M A N, called as a
`witness, having been first duly sworn by a
`Notary Public of the State of New York, was
`examined and testified as follows:
`EXAMINATION BY
`MR. GONSALVES:
` Q. Dr. Bravman, have you been
`deposed before in this IPR proceedings with
`Zond?
` A. Yes.
` Q. How many times?
` A. Twice.
` Q. Have you been deposed in any
`other IPR or CBM proceedings with the Patent
`Office?
` A. What is CBM?
` Q. CBM stands for -- well, why don't
`we break the question into two parts to make
`it simple.
` Have you been deposed in relation
`to any other IPRs pending at the Patent
`Office other than the ones involving Zond?
` A. No.
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` J. BRAVMAN
` Q. Okay. Have you been deposed in
`any CBM which is called the Covered business
`method proceeding at the Patent Office?
` A. No.
` Q. Have you served as an expert in
`district litigations involving a patent?
` A. Yes.
` Q. About approximately how many
`times have you served as an expert in
`District Court proceedings?
` A. So I don't know the exact number.
`My ITC has a fairly extensive list. I have
`probably been retained in the order of 50
`times. This is, today, my 33rd deposition.
`I have been to trial probably in District
`Court approximately five or six times and
`probably five or six times been to trial in
`the ITC.
` Q. So at this point you are very
`familiar with the deposition proceedings but
`I will just go over a couple of ground rules,
`if that's okay with you?
` A. Certainly.
` Q. So the proceeding is, I will ask
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` J. BRAVMAN
`you questions and if you don't understand the
`question, please let me know, and I will
`rephrase it.
` Is that okay?
` A. Yes.
` Q. If you do understand -- strike
`the question. Let me start over.
` If you do understand a question,
`I will take that to mean that you did
`understand it.
` Is that fair?
` A. Yes.
` Q. Dr. Bravman, I am going to hand
`you what was previously marked in this
`proceeding as exhibit Gillette 1008 and here
`is one for you.
` A. Thank you.
` Q. Do you recognize this exhibit?
` A. Yes.
` Q. What is it?
` A. It's U.S. Patent 6,190,512 to
`Lantsman, L-A-N-T-S-M-A-N.
` Q. So if it's okay with you, we will
`refer to this exhibit, Gillette 1008, as
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` J. BRAVMAN
`Lantsman?
` A. Yes.
` Q. Does Lantsman teach a power
`supply which reduces oscillations generated
`upon ignition of a plasma within a processing
`chamber?
` MR. MAIER: Objection to form.
` A. That's close to the exact wording
`of the first sentence in the abstract.
` Q. So you would agree that Lantsman
`teaches what I just identified in my previous
`question?
` A. I haven't rendered an opinion
`about that aspect of Lantsman, but that's
`certainly what it purports to teach.
` Q. What does it mean "reduces
`oscillations"?
` A. When you ignite a plasma and
`that's the context that it is stating there,
`the plasma itself may oscillate with regard
`to several different parameters. In this
`matter, for instance, we have seen over and
`undershoot damped oscillations of, say, the
`voltage applied across the anode and the
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` J. BRAVMAN
`cathode as the impedence of the plasma
`changes.
` Q. And in your answer you referred
`to undershoot damage?
` A. I must have misspoke or -- not
`damage. Undershoot or overshoots with regard
`to various physical attributes, for instance,
`the voltage measured across the anode cathode
`assembly.
` Q. Can you define what you mean by
`undershoot?
` MR. MAIER: Objection to form.
` A. So with regard to voltage, for
`instance, as we have seen in other aspects of
`this broader matter, there is the desired or
`target voltage pulse applied to the -- across
`the anode and cathode but then we see that
`the measured voltage can exceed or be under
`that target and, typically, as a function of
`time, you see a series of variations that may
`be periodic or aperiodic but are generally
`referred to as oscillations in that
`particular parameter.
` Q. Does Lantsman disclose a
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` J. BRAVMAN
`secondary power supply that pre-ignites the
`plasma?
` A. That's one of its disclosures,
`yes.
` Q. And does this secondary power
`supply drive the cathode to a process
`initiation voltage?
` MR. MAIER: Object to form.
` A. I don't want to answer from
`memory. I think it is that particular one.
`Let me just check.
` Q. If you want, I will give you a
`hint to look at the first page.
` A. In the abstract?
` Q. Yes. I noticed you were flipping
`through the entire document. I figured I
`would just help you, save you --
` A. The last sentence in the abstract
`speaks to your question.
` Q. So would you agree with the
`characterization that the secondary power
`supply in Lantsman drives the cathode to a
`process initiation voltage?
` A. That's what it claims, yes.
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` J. BRAVMAN
` Q. Now, does Lantsman disclose --
`let me start over. Strike the question.
` Does Lantsman also disclose a
`primary power supply that electrically drives
`the cathode to generate plasma current?
` A. Yes. I mean, the power supplies
`are meant to drive the cathode relative to
`the anode.
` Q. Now, Lantsman does not teach a
`pulsed power supply; is that right?
` A. It does not -- it does not
`describe the power supplies as capable of
`pulsing, that's right.
` Q. And Lantsman does not teach any
`type of electrical pulse, right?
` MR. MAIER: Object to form.
` A. It teaches on and off which could
`be a pulse. For instance, in -- in Figures 2
`and 3, it is clearly turning on a voltage and
`turning it off. But in the sense that the
`other -- much of the other patents we have
`been looking at in this matter talk about
`pulsing to various degrees, no, it is not
`describing that. Figure 6 makes it clear
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` J. BRAVMAN
`that the cathode DC negative voltage is
`turned on and then it is turned off.
` Q. Lantsman does not teach a
`strongly ionized plasma, correct?
` MR. MAIER: Object to form.
` A. Strongly ionized plasma, as we
`have seen, is a relative term, and when
`plasmas are used for etching or sputtering,
`which is a subject of Lantsman, it is -- the
`plasma is often in what's called a strongly
`ionized plasma but Lantsman does not draw the
`distinction between weakly ionized and
`strongly ionized.
` Q. Well, in your opinion, would you
`consider the device that's disclosed and is
`described in Lantsman to generate a strongly
`ionized plasma?
` A. Again, because, at least, in
`these proceedings what is strong and weak are
`relative terms, there is nothing to compare
`qualitatively in Lantsman's description, but
`it is also true that what a worker of skill
`would understand by strongly ionized is the
`type of plasma that's typically used but
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` J. BRAVMAN
`Lantsman does not call that out.
` Q. Okay, I understood your answer to
`indicate that Lantsman doesn't mention the
`phrase "strongly ionized plasma."
` Is that a correct
`characterization of your testimony?
` A. Yes.
` Q. Okay. Now, although Lantsman
`doesn't explicitly mention "strongly ionized
`plasma," in your opinion, does the device
`that's disclosed in Lantsman generate a
`strongly ionized plasma?
` A. Well, if I look, for instance, at
`column 2, line 48 and forward, it says,
`quote, "This secondary power supply
`pre-ignites the plasma so that when the
`primary power supply is applied, the systems
`smoothly transitions to final plasma
`development and deposition. This design
`thereby avoids oscillations when the primary
`power supply is engaged and disengaged."
` So in that description there, he
`is describing, at least, something analogous
`to the weakly and strongly ionized plasma
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` J. BRAVMAN
`states that we have read about in other
`places. But whether you can properly
`consider that pre-ignition and then the
`ignition weak or strong, it just doesn't say.
`I don't have an opinion today whether or not
`it constitutes a strongly ionized plasma.
` Q. Is one of Lantsman's power
`supplies a DC power supply that is identified
`by the reference number 10?
` A. Yes.
` Q. And is the other power supply in
`Lantsman a secondary DC power supply that is
`identified by the reference number 32?
` A. Yes.
` Q. Just excuse me a second. I am
`going to grab another reference.
` A. Sure.
` Q. Dr. Bravman, I am going to hand
`you a reference which is previously marked as
`exhibit Gillette 1009.
` A. Thank you.
` Q. Do you recognize this exhibit?
` A. Yes.
` Q. What is it?
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` J. BRAVMAN
` A. It's U.S. Patent 5,958,155 to
`Kawamata, K-A-W-A-M-A-T-A, et al.
` Q. So if it is okay with you, when I
`ask questions, I will refer to exhibit
`Gillette 1009 as Kawamata; is that correct?
` A. Yes.
` Q. Does Kawamata teach a process for
`producing a thin film?
` A. Yes.
` Q. And does Kawamata also teach a
`sputtering at a high speed?
` A. Yes. Although high is a relative
`term, but, yes.
` Q. Well, that leads me into my next
`question. What would one of ordinary skill
`in the art understand the term "sputtering at
`a high speed" to mean?
` MR. MAIER: Object to form.
` A. If a worker of skill read this,
`he or she would understand that the author
`was making a claim that at least within some
`bounded range of parameters such as the
`material to be deposited, the methodology
`used, that the deposition rate would be high
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` J. BRAVMAN
`as understood by workers of skill in that day
`given that different chambers or systems
`using that particular technique had some
`established record of acceptable deposition
`rates. All that to say, there is not a
`numerical cutoff to what constitutes high.
` Q. Does Kawamata teach producing a
`thin fluoride film that's free of light
`absorption?
` A. The material described in
`Kawamata is exactly fluoride, MgF2.
` Q. What is the phrase "free of light
`absorption" mean to you?
` MR. MAIER: Object to form.
` A. I would have to review it, again.
`I didn't focus on that aspect of it. Free of
`light absorption generally means that the
`defect -- that the material in question is
`not fundamentally absorbed or highly
`absorptive of light and that second article,
`it doesn't have defects within it that would
`diminish its theoretical transmissivity. It
`is in -- Kawamata discusses optically
`important materials. So that's a
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` J. BRAVMAN
`consideration in those classes of materials.
` Q. Does Kawamata teach sputtering
`surface of the film source material so at
`least a portion of that material is ejected
`in molecular form?
` MR. MAIER: Object to form.
` A. Yes.
` Q. And what does it mean to eject
`material in molecular form?
` A. So the material in the discussion
`in the patent principally is MgF2. So that
`is a molecule -- it is a stoichiometry of the
`material is one atom of magnesium Mg and two
`atoms of Fluorine. So MgF2. And that would
`be considered a molecule, MgF2. The
`distinction would be made between atomic
`sputtering where individual atoms would be
`ejected. So when it speaks of molecular
`sputtering or ejection, the sputtering
`process ejects physically from the source
`surface or near surface region a molecule of
`desirously, I am sure, MgF2.
` Q. Kawamata makes no mention of
`applying a voltage pulse, right?
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` A. No, that's correct.
` Q. Kawamata makes no mention of
`generating strongly ionized plasma, correct?
` MR. MAIER: Object to form.
` A. Again, strongly ionized is, in
`these proceedings, is a relative term. It
`does talk about specifically and successfully
`ejecting material from sputtering and
`elsewhere in this matter that's often
`associated with strongly ionized plasma. But
`the phrase "strongly ionized plasma" does not
`-- is not found within the patent.
` Q. In your opinion, does the device
`that's described in Kawamata generate
`strongly ionized plasma?
` A. I haven't offered an opinion
`about that because, again, that's a matter of
`definitions. It would be my opinion that
`Kawamata is describing a successful
`application of sputtering technology to this
`particular material. But I have not offered
`an opinion about whether that would be called
`or that would happen through the application
`of high density plasma or not.
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` Q. Does Kawamata teach applying
`power continuously?
` A. It talks about radio frequency
`sputtering so at the right time scale, it is
`not continuous. It is turning on and off
`millions of times per second. But it's not
`giving recipes that talk about -- it is not
`getting recipes that would allow me to answer
`your question in the affirmative.
` Q. Just bear with me. I will grab
`another exhibit.
` A. Sure.
` Q. Dr. Bravman, I am going to hand
`you an exhibit that was previously marked as
`Gillette 1004.
` A. Thank you.
` MR. MAIER: Thanks.
` Q. Do you recognize this exhibit?
` A. Yes.
` Q. What is it?
` A. It's an excerpt from a work
`called "Encyclopedia of Low Temperature
`Plasma" from the third volume. It is a
`translation from Russian.
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` J. BRAVMAN
` Q. Was the exhibit identified by
`Gillette 1004, was it edited by a person
`named Fortov, F-O-R-T-O-V?
` A. Yes.
` Q. So if it is okay with you, we
`will refer to exhibit Gillette 1004 as
`Fortov?
` A. Yes.
` Q. Does Fortov describe the
`relationship between the sputtering yield and
`the temperature of the target?
` A. Yes.
` Q. Fortov does not describe how to
`achieve a nonlinear relationship between the
`sputtering yield and the target temperature;
`is that right?
` MR. MAIER: Objection to form.
` A. Sorry, could you read back the
`question?
` (Record read.)
` MR. MAIER: Objection to form.
` A. Well, as I hear the question, it
`does, because it indicates and shows data for
`sputtering yield as a function of temperature
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`so that directs a worker of skill to first
`understand and then actually achieve
`nonlinear or enhanced sputtering yields by
`elevating the temperature of a target at
`least in the region where ejected matter is
`originating.
` Q. Does Fortov disclose a device
`that performs sputtering?
` A. No, this reference is more
`fundamental scientific work that is
`discussing sputtering yield as a function of
`many variables.
` Q. Does Fortov teach choosing an
`amplitude and rise time of a voltage pulse to
`cause a sputtering yield to be nonlinearly
`related to a temperature of a sputtering
`target?
` MR. MAIER: Objection to form;
` calls for a legal conclusion.
` A. From a technical viewpoint, no.
`Again, it is talking about various aspects of
`sputtering yield including temperature
`dependents.
` Q. Dr. Bravman, I am going to hand
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`to you an exhibit that was previously
`identified as Gillette Exhibit 1002.
` A. Thank you.
` Q. Dr. Bravman, do you recognize the
`exhibit that's identified as Gillette
`Exhibit 1002?
` A. Yes.
` Q. What is it?
` A. It is a translation of a paper by
`Mozgrin and others entitled, "High Current
`Low Pressure Quasi Stationary Discharge in
`the Magnetic Field: Experimental Research."
` Q. If it's okay with you, I will
`refer to Gillette 1002 as Mozgrin in my
`questions.
` Is that alright?
` A. Yes.
` Q. Does Mozgrin teach a high power
`quasi stationary low pressure discharge in
`the magnetic field?
` A. Yes.
` Q. What does quasi stationary mean
`to one of ordinary skill in the art?
` MR. MAIER: Object to form;
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` calls for a legal conclusion.
` A. From a technical viewpoint, first
`of all, one would want to read how that
`phrase is used in context. But it's a state
`between what one might colloquially called
`truly stationary, meaning unchanging, over at
`least some material period of time and one
`that is highly transient. So it's achieving
`something close to static character over some
`material timeframe.
` Q. Now, in your answer, you referred
`to achieving something close to static
`character over some material timeframe?
` A. Yes.
` Q. What particular quantity or
`quantities in Mozgrin were you referring to
`in your answer?
` MR. MAIER: Objection to form.
` A. Well, the nature of the
`discharge, if we look on page 402 of Mozgrin,
`the title for section 3 is "Quasi Stationary
`Discharge Regimes" and in that it includes,
`for instance, Figure 3 and the text in the
`right-hand column of page 402 in the second
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` J. BRAVMAN
`paragraph, approximately midway down, it uses
`the phrase, "and then both the discharge
`current and voltage attain their quasi
`stationary values (part 3)."
` So it is referring to the
`silograms in Figure 3, and the data there is
`clearly not absolutely fixed or static. It
`has some variation over the region labeled 3,
`and I think that's why he fairly called it
`quasi stationary and not a stationary or
`static region.
` Q. Now, you referred to regions in
`your response. How many different regions
`does Mozgrin disclose?
` MR. MAIER: Object to form.
` A. Well, in Figure 4, he -- and in
`the text, he describes four distinct regions.
`In the silograms of Figure 3, he marks three
`regions, one of which, region 2, is
`subdivided into two parts, 2(a) and 2(b). So
`depending on which data set you are looking
`at, it is three or four regions.
` Q. Now, Mozgrin also refers to
`regimes, R-E-G-I-M-E-S.
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` Do you see that?
` A. Yes.
` Q. Does Mozgrin use the term "region
`and regimes" interchangeably so that they
`mean the same thing?
` MR. MAIER: Objection to form.
` A. I haven't offered an opinion
`about that. I understand your question. In
`the first paragraph on the right-hand column
`of page 402, the last sentence is, "As a
`result, we found out that a variety of
`regimes differing in discharge voltage,
`current range and discharge space structure
`occurred."
` I mean, there he is using regime,
`it seems to me, in a somewhat broader
`fashion. So it's a collection of or a range
`of data. So I don't mentally trip on that
`use. I understand that there he is using
`regime to describe, more or less, a
`collection of data sets. There may be other
`places where he uses it more interchangeably.
`But I think at least there and, of course, we
`have to recall this is a translation that he
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`is using regime there with a slightly
`different flavor of meaning.
` Q. Does Mozgrin teach studies using
`two different discharge device
`configurations?
` A. Sorry, I am not following what
`your question is pointing to.
` MR. GONSALVES: Could you repeat
` the question for him.
` (Record read.)
` A. Yes, he teaches two physical
`configurations of magnetrons, that is
`correct.
` Q. Is one of the physical
`configurations called a planar magnetron?
` A. Yes.
` Q. Is the other configuration called
`a shaped electrode configuration?
` A. Yes.
` Q. Does Mozgrin teach that the
`planar magnetron includes a plain cathode
`that is 120 millimeters in diameter?
` A. It teaches a planar cathode, and
`let me just find the description of it. Yes,
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` J. BRAVMAN
`at the bottom of column 1, sorry, column 2 in
`the first page, he is in fact describing
`cathode 120 millimeters in diameter.
` Q. Does Mozgrin teach a
`ringed-shaped anode that is 160 millimeters
`in diameter?
` A. It does.
` Q. Mozgrin does not teach how far
`the cathode is separated from the anode in
`the planar magnetron structure, correct?
` MR. MAIER: Objection to form.
` A. It does not, in a text, call out
`in similar fashion a numeric value. It has
`illustration in Figure 1(a) that shows the
`gap to be less than the diameter by a
`significant degree which comports with a
`worker of skill's understanding of generally
`how these devices would be built.
` But, as I said, does not call out
`numerically, again.
` Q. In your answer, you referred to
`Figure 1(a); is that correct?
` A. Yes.
` Q. Is figure (a) drawn to scale?
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` A. It doesn't say whether it's a
`scale figure or not. It's not a blueprint,
`on the one hand. On the other hand, it is
`meant to describe for a reader of skill the
`device in question; and again, since it
`comports with the configuration that would be
`familiar to a worker of skill, I think it's a
`reasonably accurate rendition.
` Q. Does Mozgrin teach that the
`system with shaped electrodes has two hollow
`axisymmetrical electrodes that are
`120 millimeters in diameter?
` A. It does.
` Q. What does axisymmetrical mean to
`one of ordinary skill in the art?
` A. If one looks at Figure 1(b), one
`sees what would be a cross-section cut. A
`worker of skill would understand that one
`sees a cross-section cut down through the
`radial axial symmetric magnetrons or magnets.
`So the cross-hatched rectangles four in
`number are where the cut that produces the
`view in Figure 1(b) is made, and that is
`cutting through the annular rings that
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`comprise the upper and lower magnets in this
`shaped configuration.
` Q. So in your answer, you referred
`to 1(c). Did you mean to refer to 1(b)?
` A. I am sorry, 1(b), yes.
` Q. That's what I figured. Mozgrin
`does not teach that an amplitude and a rise
`time of the voltage pulse chosen to cause a
`sputtering yield to be nonlinearly related to
`the temperature of the sputtering target,
`right?
` MR. MAIER: Objection to form.
` A. Mozgrin does not teach
`specifically that there is a nonlinear
`dependence of sputtering yield with
`temperature of the target.
` Q. And Mozgrin does not mention any
`relation between sputtering yield and the
`temperature of the sputtering target, right?
` MR. MAIER: Object to form.
` A. I believe that's correct.
` Q. Dr. Bravman, I am going to hand
`you an exhibit that was previously marked as
`Gillette 1006.
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` A. Thank you.
` Q. Dr. Bravman, do you recognize
`this exhibit that was marked as Gillette
`1006?
` A. Yes.
` Q. And what is it?
` A. It's an article entitled,
`"Ionization Relaxation in a Plasma Produced
`By Pulsed Inner Gas Discharge" by Kudryavtsev
`and others.
` Q. If it is okay, I will referred to
`the exhibit marked Gillette 1006 by the first
`author's last name Kudryavtsev.
` Is that okay?
` A. Yes.
` Q. Now, you referred to, when you
`read the title of Kudryavtsev, you referred
`to "ionization relaxation"?
` A. Yes.
` Q. What is that term, "ionization
`relaxation," mean to one of ordinary skill in
`the art?
` A. It is a paper that develops a
`model or theoretical approach to both
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`ionization and relaxation. Ionization one
`understands is the ejection of electrons from
`atoms or from ions; and relaxation is a broad
`term that describes when you have atomic --
`when you have atoms in an excited or ionized
`state, what subsequently happens in time.
`Reflecting the fact that excited or ionized
`atoms are generally not the stable form of
`atomic matter.
` Q. Was Kudryavtsev mainly interested
`in analyzing the buildup of the electron
`density and the behavior of the spacial
`distribution of the electron to density
`during the relaxation process?
` MR. MAIER: Objection to form.
` A. He certainly very directly
`involves -- interested in the changes in
`electron to density. He also talks about the
`temporal and spacial components of those
`changes so I think the answer -- the fair
`answer to your question is yes.
` Q. Does Kudryavtsev also disclose
`performing experimental ionization relaxation
`and comparing the experimental results with
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`the model?
` A. Yes, although it is a theoretical
`or modeling paper, he does have an
`experimental section in which he describes
`one type of ionization. And then goes on to
`show how the data that he collected in those
`experiments comports with his theoretical or
`modeling work.
` Q. Could Kudryavtsev have used a
`device including electrodes and a cylindrical
`tube having a diameter of 2.5 centimeters to
`perform the experiments?
` A. That's the description in part
`that he gives of his test apparatus, yes.
` Q. The distance between the
`electrodes in Kudryavtsev's test apparatus
`was 52 centimeters; is that correct?
` A. Yes.
` Q. Now, the experimental results
`that were determined from Kudryavtsev's
`experiments with his device would be
`different than the results that would be
`obtained with, for example, Mozgrin as planar
`magnetic device; is that right?
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` MR. MAIER: Objection to form.
` A. They would be different in some
`regards that a worker of skill would know
`would be related to the particularities of
`the plasma generating system but in other
`ways, this is the principal contribution of
`the Kudryavtsev paper. They would comport
`with the modeling therein, and as the author
`of the paper himself states, even in the last
`sentence of the paper, and certainly the last
`paragraph, he has developed a general model
`for pulsed inert gas discharge -- discharges,
`and how this is important work for a variety
`of applications.
` Q. You mentioned in your answer that
`some of the results obtained from
`Kudryavtsev's device would differ than the
`results that would be obtained with Mozgrin's
`planar magnetron device.
` What results would b