PATENT
`Attorney Docket No.: ZON-002
`
`IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
`
`APPLICANT:
`
`SERIAL NO.:
`
`Roman Chistyakov
`
`10/065,629
`
`GROUP NO.:
`
`2821
`
`FILING DATE:
`
`November 04, 2002
`
`EXAMINER:
`
`Lee, Wilson
`
`TITLE:
`
`METHODS AND APPARATUS FOR GENERATING
`HIGH-DENSITY PLASMA
`
`Commissioner for Patents
`Alexandria, Virginia 22313-1450
`
`AMENDMENT AND RESPONSE
`
`Sir:
`
`The following amendments and remarks are responsive to the Office Action mailed on
`
`October 07, 2003 in the above-identified patent application. Entry and consideration of the
`
`following amendments and remarks, and allowance of the claims, as presented, are respectfully
`
`requested. A Petition for a two-month extension of time, up to and including Monday, March
`
`08, 2004 is submitted herewith. The Commissioner is hereby authorized to charge the extension
`
`fee, the additional claims fee, and any other proper fees to Attorney's Deposit Account No.
`
`501211.
`
`Please enter the following amendments and consider the remarks that follow.
`
`INTEL 1408
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 2 of 14
`
`Amendments to the Claims:
`
`Please amend claims 1, 3, 10, 12, 16, 22, 33, 43, and 44, cancel claims 21, 28, and 42
`
`without prejudice, and add claims 45 and 46 as follows.
`
`1.
`
`(currently amended): An apparatus for generating a strongly-ionized plasma in a
`
`chamber, the apparatus comprising:
`
`an ionization source that generates a weakly-ionized plasma from a volume of feed gas,
`
`the weakly-ionized plasma reducing the probability of developing an electrical
`
`breakdown condition in the chamber;
`
`a power supply that applies supplies power to the weakly-ionized plasma though an
`
`electrical pulse applied across the weakly-ionized plasma, the electrical pulse having a
`
`magnitude and a rise-time that is sufficient to increase the density ofthe weakly-ionized
`
`plasma to generate a strongly-ionized plasma; and
`
`a gas line that supplies feed gas to means for e~tehaagiag the strongly-ionized plasma. the
`
`feed gas diffusing the strongly-ionized plasma, thereby allowing additional power from
`
`the pulsed power supply to be absorbed by the \Vith a seeond volume of feed gas
`
`applying the eleetrieal pulse aeross the seeond volume of feed gas to generate an
`
`additional strongly-ionized plasma.
`
`2.
`
`(original): The apparatus of claim 1 wherein the power supply applies the electrical pulse
`
`across the weakly-ionized plasma to excite atoms in the weakly-ionized plasma and to
`
`generate secondary electrons, the secondary electrons ionizing the excited atoms, thereby
`
`creating the strongly-ionized plasma.
`
`3.
`
`(currently amended): The apparatus of claim 1 further eomprisiag a wherein the gas line
`
`supplies additional feed gas that gas eRehaage means for exchang§tng the weakly(cid:173)
`
`ionized plasma with a third volume of feed gas while applying the electrical pulse across
`
`the _third volume of feed gas.
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 3 of 14
`
`4.
`
`(original): The apparatus of claim 1 wherein the power supply generates a constant
`
`power.
`
`5.
`
`(original): The apparatus of claim 1 wherein the power supply generates a constant
`
`voltage.
`
`6.
`
`(original): The apparatus of claim 1 wherein the ionization source is chosen from the
`
`group comprising an electrode coupled to a DC power supply, an electrode coupled to an
`
`AC power supply, a UV source, an X-ray source, an electron beam source, an ion beam
`
`source, an inductively coupled plasma source, a capacitively coupled plasma source, and
`
`a microwave plasma source.
`
`7.
`
`(original): The apparatus of claim 1 further comprising a magnet that is positioned to
`
`generate a magnetic field proximate to the weakly-ionized plasma, the magnetic field
`
`trapping electrons in the weakly-ionized plasma.
`
`8.
`
`9.
`
`(original): The apparatus of claim 7 wherein the magnet comprises an electro-magnet.
`
`(original): The apparatus of claim 7 wherein the magnet is movable.
`
`10.
`
`(currently amended): A method for generating a strongly-ionized plasma in a chamber,
`
`the method comprising:
`
`ionizing a ·;elame effeed gas to form a weakly-ionized plasma that reduces the
`
`probability of developing an electrical breakdown condition in the chamber;
`
`supplying power to the weakly-ionized plasma by applying an electrical pulse across the
`
`weakly-ionized plasma te generate the, the electrical pulse having a magnitude and a
`
`rise-time that is sufficient to increase the density of the weakly-ionized plasma to
`
`generate a strongly-ionized plasma; and
`
`diffusing the strongly-ionized plasma with additional feed gas thereby allowing
`
`e~{ehaaging the strongly-ionized plasma to absorb additional energy from the power
`
`supply with a seeeae velame ef feee gas while applying the eleetrieal palse aeress the
`
`seeene velame ef feee gas te geaerate aft aeeitieaal streagly ionizes plasma.
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 4 of 14
`
`11.
`
`(original): The method of claim 10 wherein the applying the electrical pulse across the
`
`weakly-ionized plasma excites atoms in the weakly-ionized plasma and generates
`
`secondary electrons, the secondary electrons ionizing the excited atoms, thereby creating
`
`a strongly-ionized plasma.
`
`12.
`
`(currently amended): The method of claim 10 further comprising exchanging the weakly(cid:173)
`
`ionized plasma with additional feed gas exehaagiag the v;eaJdy ieai~ed plasma ·.vith a
`
`third ¥elume ef feed gas \vhile applyiag the eleetrieal pulse aeress the third ¥elume ef
`
`feed gas.
`
`13.
`
`(original): The method of claim 10 wherein the applying the electrical pulse comprises
`
`applying a quasi-static electric field across the weakly-ionized plasma.
`
`14.
`
`(original): The method of claim 10 further comprising selecting at least one of a pulse
`
`amplitude and a pulse width of the electrical pulse in order to increase an ionization rate
`
`of the strongly-ionized plasma.
`
`15.
`
`(original): The method of claim 10 further comprising selecting at least one of a pulse
`
`amplitude and a pulse width of the electrical pulse in order to cause the strongly-ionized
`
`plasma to be substantially uniform.
`
`16.
`
`(currently amended): The method of claim 10 wherein the electrical pulse comprises a
`
`rise time that is less than about lOOV/!-!sec. aetweea aaeut 0.1 miereseeead aad 10
`
`seeeads.
`
`17.
`
`18.
`
`(original): The method of claim 10 wherein the peak plasma density of the weakly(cid:173)
`ionized plasma is less than about 1012 cm·3
`
`•
`
`(original): The method of claim 10 wherein the peak plasma density of the strongly(cid:173)
`ionized plasma is greater than about 1012 cm·3
`
`•
`
`19.
`
`(original): The method of claim 10 wherein the ionizing the feed gas comprises exposing
`
`the feed gas to one of a static electric field, an pulsed electric field, UV radiation, X-ray
`
`radiation, electron beam radiation, and an ion beam.
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 5 of 14
`
`20.
`
`(original): The method of claim 10 further comprising generating a magnetic field
`
`proximate to the weakly-ionized plasma, the magnetic field trapping electrons in the
`
`weakly-ionized plasma.
`
`21.
`
`(canceled).
`
`22.
`
`(currently amended): An apparatus for generating a strongly-ionized plasma, the
`
`apparatus comprising:
`
`an anode;
`
`a cathode that is positioned adjacent to the anode and forming a gap there between;
`
`an ionization source that generates a weakly-ionized plasma proximate to the cathode, the
`
`weakly-ionized plasma reducing the probability of developing an electrical breakdown
`
`condition between the anode and the cathode; and
`
`a power supply that produces an electric field across the gap, the electric field generating
`
`excited atoms in the weakly-ionized plasma and generating secondary electrons from the
`
`cathode, the secondary electrons ionizing the excited atoms, thereby creating the
`
`strongly-ionized plasma.
`
`23.
`
`(original): The apparatus of claim 22 wherein the power supply generates a constant
`
`power.
`
`24.
`
`(original): The apparatus of claim 22 wherein the power supply generates a constant
`
`voltage.
`
`25.
`
`(original): The apparatus of claim 22 wherein the electric field comprises a quasi-static
`
`electric field.
`
`26.
`
`(original): The apparatus of claim 22 wherein the electric field comprises a pulsed
`
`electric field.
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 6 of 14
`
`27.
`
`(original): The apparatus of claim 22 wherein a rise time of the electric field is chosen to
`
`increase an ionization rate of the excited atoms in the weakly-ionized plasma.
`
`28.
`
`(canceled).
`
`29.
`
`(original): The apparatus of claim 22 wherein the strongly-ionized plasma is substantially
`
`uniform proximate to the cathode.
`
`30.
`
`(original): The apparatus of claim 22 wherein a dimension ofthe gap between the anode
`and the cathode is chosen to increase an ionization rate of the excited atoms in the
`weakly-ionized plasma.
`
`31.
`
`(original): The apparatus of claim 22 wherein the ionization source is chosen from the
`
`group comprising an electrode coupled to a DC power supply, an electrode coupled to an
`
`AC power supply, a UV source, an X-ray source, an electron beam source, an ion beam
`source, an inductively coupled plasma source, a capacitively coupled plasma source, and
`a microwave plasma source.
`
`32.
`
`(original): The apparatus of claim 22 further comprising a magnet that is positioned to
`generate a magnetic field proximate to the weakly-ionized plasma, the magnetic field
`
`trapping electrons in the weakly-ionized plasma proximate to the cathode.
`
`33.
`
`(currently amended): A method for generating a strongly-ionized plasma, the method
`comprising:
`
`ionizing a feed gas to generate a weakly-ionized plasma proximate to a cathode, the
`weakly-ionized plasma reducing the probability of developing an electrical breakdown
`
`condition proximate to the cathode; and
`
`applying an electric field across the weakly-ionized plasma in order to excite atoms in the
`weakly-ionized plasma and to generate secondary electrons from the cathode, the
`secondary electrons ionizing the excited atoms, thereby creating the strongly-ionized
`plasma.
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 7 of 14
`
`34.
`
`(original): The method of claim 33 wherein the applying the electric field comprises
`
`applying a quasi-static electric field.
`
`35.
`
`(original): The method of claim 33 wherein the applying an electric field comprises
`
`applying the electric field at a constant power.
`
`36.
`
`(original): The method of claim 33 wherein the applying an electric field comprises
`
`applying the electric field at a constant voltage.
`
`3 7.
`
`(original): The method of claim 33 wherein the applying the electric field comprises
`
`applying an electrical pulse across the weakly-ionized plasma.
`
`38.
`
`(original): The method of claim 37 further comprising selecting at least one of a pulse
`
`amplitude and a pulse width of the electrical pulse in order to increase an ionization rate
`
`of the strongly-ionized plasma.
`
`39.
`
`(original): The method of claim 37 further comprising selecting at least one of a pulse
`
`amplitude and a pulse width of the electrical pulse in order to cause the strongly-ionized
`
`plasma to be substantially uniform in an area adjacent to a surface of the cathode.
`
`40.
`
`(original): The method of claim 33 wherein the strongly-ionized plasma is substantially
`
`uniform proximate to the cathode.
`
`41.
`
`(original): The method of claim 33 further comprising generating a magnetic field
`
`proximate to the weakly-ionized plasma, the magnetic field trapping electrons in the
`
`weakly-ionized plasma.
`
`42.
`
`(canceled).
`
`43.
`
`(currently amended): An apparatus for generating a strongly-ionized plasma in a
`
`chamber, the apparatus comprising:
`
`means for ionizing a veh:tme ef feed gas to form a weakly-ionized plasma that reduces
`
`the probability of developing an electrical breakdown condition in the chamber;
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 8 of 14
`
`means for supplying power to the weakly-ionized plasma by applying an electrical pulse
`
`across the weakly-ionized plasma to generate the, the electrical pulse having a magnitude
`and a rise-time that is sufficient to increase the density of the weakly-ionized plasma to
`generate a strongly-ionized plasma; and
`
`means for diffusing the strongly-ionized plasma with additional feed gas to allow
`
`additional power to be absorbed by eRehanging the strongly-ionized plasma with-a
`
`seeond volume of feed gas while a)3)3lying the eleetrieal J3Ulse aeross the seeond volume
`of feed gas to generate an additional strongly ionized J3lasma.
`
`44.
`
`(currently amended): An apparatus for generating a strongly-ionized plasma, the
`
`apparatus comprising:
`
`means for ionizing a feed gas to generate a weakly-ionized plasma proximate to a
`cathode, the weakly-ionized plasma reducing the probability of developing an electrical
`
`breakdown condition proximate to the cathode; and
`
`means for applying an electric field across the weakly-ionized plasma in order to excite
`
`atoms in the weakly-ionized plasma and to generate secondary electrons from the
`
`cathode, the secondary electrons ionizing the excited atoms, thereby creating the
`
`strongly-ionized plasma.
`
`45.
`
`(new): The apparatus of claim 1 wherein the power supply comprises the ionization
`
`source.
`
`46.
`
`(new): The apparatus of claim 22 wherein the power supply comprises the ionization
`
`source.
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 9 of 14
`
`Pending Claims:
`
`REMARKS
`
`Claims 1-20, 22-27, 29-41, and 43-46 are currently pending in the present application.
`
`Claims 1, 3, 10, 12, 16, 22, 33, 43, and 44 are amended by the present Amendment. Claims 21,
`
`28, and 42 are canceled without prejudice to Applicant's right to pursue these claims in this or a
`
`subsequent patent application. Claims 45 and 46 are added. No new matter is added by these
`
`amendments. Upon entry of the present Amendment, reconsideration of claims 1-20, 22-27, 29-
`
`41, 43, and 44 and consideration of new claims 45 and 46 is respectfully requested.
`
`New Claims
`
`New dependent claims 45 and 46 recite that the power supply comprises the ionization
`
`source. The Applicant submits that new claims 45 and 46 are supported by the originally filed
`
`specification and that no new matter is added by these claims. See, for example, paragraph 35,
`
`which states that in one embodiment, the pulsed power supply 202 is a component in an
`
`ionization source that generates a weakly-ionized plasma 232.
`
`Allowable Subject Matter
`
`The Applicant acknowledges with appreciation the Examiner's statement made in page
`
`10 of the Office Action dated October 07, 2003 that claims 25, 27-30, 34, 38-40, and 42 would
`
`be allowable if rewritten in independent form including all of the limitations of the base claim
`
`and any intervening claims. The Applicant has amended independent claim 22 to include the
`
`limitation of dependent claim 28, which the Examiner has indicated is allowable. In addition, the
`
`Applicant has amended independent claim 33 to include the limitation of dependent claim 42,
`
`which the Examiner has also indicated is allowable. Therefore, the Applicant submits that
`
`independent claims 22 and 33 are now allowable as currently amended. In addition, the
`
`Applicant submits that dependent claims 25, 27, 29, 30, 34, and 38-40 are now allowable as
`
`depending from allowable base claims.
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 10 of 14
`
`Drawing Objections:
`
`The drawings are objected to under 37 C.P.R. §1.83(a). Claims 1, 3, 10, 12, and 43
`
`have been amended to remove references to features not explicitly illustrated in the drawings.
`
`Therefore, the Applicant submits that the objections to the drawings are now moot.
`
`Rejections under 35 U.S.C. §112:
`
`Claims 1-21, and 43 are rejected under 35 U.S.C. §112, first paragraph, as failing to
`
`comply with the enablement requirement. The Office Action states that these claims contain
`
`subject matter which was not described in the specification in such a way as to enable one skilled
`
`in the art to make and/or use the invention. The Applicant has amended independent claims 1
`
`and 43 and dependent claims 3, 10, and 12 to remove limitations not explicitly disclosed in the
`
`specification. Therefore, the Applicant submits that claims 1-21 and 43 as currently amended
`
`overcome the rejections under 35 U.S.C. § 112.
`
`Rejections under 35 U.S.C. §102(b) as Being Anticipated by Koloc:
`
`Claims 1, 2, 4-11, 19, 20, 22-24, 26, 31-33, 35-37, 41, 43, and 44 are rejected under 35
`
`U.S.C. §102(b) as being anticipated by U.S. Patent No. 5,041,760 issued to Koloc (hereinafter
`
`"Koloc"). Independent claims 1, 10, 22, 33, 43, and 44 are herein amended to more clearly
`
`recite the invention. No new matter is added by these amendments.
`
`To anticipate a claim under 35 U.S.C. §102, a single reference must teach every aspect of
`
`the claimed invention either explicitly or impliedly. Any feature not directly taught by the
`
`reference must be inherently present in the reference. Thus, a claim is anticipated by a reference
`
`only if each and every element of the claim is described, either expressly or inherently, in a
`
`single prior art reference.
`
`Independent Claim 1 and Dependent Claims 2, 4-9, and 45
`
`The Applicant respectfully submits that Koloc does not describe each and every element
`
`of independent claim 1 as currently amended. Independent claim 1 has been amended to recite
`
`an ionization source that generates a weakly-ionized plasma from a feed gas where the weakly-
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 11 of 14
`
`ionized plasma reduces the probability of developing an electrical breakdown condition in the
`
`chamber. This amendment to claim 1 is supported by the originally-filed specification. See, for
`
`example, paragraph 43 of the originally-filed specification, which states that "[f]orming the
`
`weakly-ionized or pre-ionized plasma 232 substantially eliminates the probability of establishing
`
`a breakdown condition in the chamber ... "
`
`The Applicant believes that there is no description in Koloc of a weakly-ionized plasma
`
`that reduces the probability of developing an electrical breakdown condition in the chamber.
`
`Instead, the Applicant believes that Koloc describes a source of ionizing energy that is oriented
`
`to project or focus ionizing energy into a particular region, such as a helical path. Koloc
`
`describes applying a high voltage potential between two electrodes in order to create a discharge
`
`current. The discharge current causes a buildup of magnetic energy that induces energetic image
`
`currents that explosively displaces conductive matter or ionized gas in the region. The force
`
`resulting from the explosive displacement creates an evacuated region surrounding the helical
`
`discharge current. See, for example, Col. 5, lines 5-35. The Applicant believes that the source
`
`of ionizing energy in Koloc is intended to provide a helical discharge path for the high-voltage
`
`discharge.
`
`In view of the above remarks, the Applicant respectfully submits that Koloc does not
`
`describe each and every element of independent claim 1 as currently amended, either
`
`expressly or inherently. Therefore, the Applicant submits that Koloc does not anticipate
`
`independent claim 1 as currently amended under 35 U.S.C. §102(b). Thus, the Applicant
`
`submits that independent claim 1 as currently amended is allowable. The Applicant also
`
`submits that dependent claims 2, 4-9, and new claim 45 are allowable as depending from an
`
`allowable base claim.
`
`Independent Claim 10 and Dependent Claims 11 and 13-20
`
`The applicant respectfully submits that Koloc does not describe each and every
`
`element of independent claim 10 as currently amended. Independent claim 10 is herein
`
`amended to recite the step of ionizing a feed gas to form a weakly-ionized plasma. The
`
`weakly-ionized plasma reduces the probability of developing an electrical breakdown
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 12 of 14
`
`condition in the chamber. This amendment is supported by the originally-filed specification
`
`of the present application. See, for example, paragraph 43 of the present specification.
`
`As previously discussed with reference to independent claim 1, there is no description in
`
`Koloc of a weakly-ionized plasma that reduces the probability of developing an electrical
`
`breakdown condition in the chamber. Instead, the Applicant believes that Koloc describes a
`
`source of ionizing energy that is oriented to project or focus ionizing energy into a particular
`
`region.
`
`In view of the above remarks, the Applicant respectfully submits that Koloc does not
`
`describe each and every element of independent claim 10 as currently amended, either expressly
`
`or inherently. Therefore, Applicant submits that Koloc does not anticipate independent claim 10
`
`as currently amended under 35 U.S.C. §102(b). Thus, the Applicant submits that independent
`
`claim 10 as currently amended is allowable. The Applicant also submits that dependent claims
`
`11 and 13-20 are allowable as depending from an allowable base claim.
`
`Independent Claim 22 and Dependent Claims 23-27, 29-32 and 46
`
`Independent claim 22 has been amended to include the limitations in objected-to claim
`
`28. The Applicant respectfully submits that in view ofthis amendment, Koloc does not
`
`anticipate independent claim 22 as currently amended under 35 U.S.C. §102(b). Thus, the
`
`Applicant submits that independent claim 22 as currently amended is-allowable. The Applicant
`
`also submits that dependent claims 23-24, 26, 31-32, and new claim 46 are allowable as
`
`depending from an allowable base claim. In addition, the Applicant submits that objected-to
`
`claims 25, 27, 29, and 30 are allowable as depending from allowable base claim 22.
`
`Independent Claim 33 and Dependent Claims 34-41
`
`Independent claim 33 has been amended to include the limitations of objected-to claim
`
`42. Applicant respectfully submits that in view of this amendment, Koloc does not anticipate
`
`independent claim 33 as currently amended under 35 U.S.C. § 102(b). Thus, the Applicant
`
`submits that independent claim 33 as currently amended is allowable. The Applicant also
`
`submits that dependent claims 35-37 and 41 are allowable as depending from an allowable base
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 13 of 14
`
`claim. In addition, the Applicant submits that objected-to claims 34 and 38-40 are allowable as
`
`depending from allowable base claim 33.
`
`Independent Claim 43
`
`Applicant respectfully submits that Koloc does not describe each and every element
`
`of independent claim 43 as currently amended. Independent claim 43 is herein amended to
`
`recite a means for ionizing a feed gas to form a weakly-ionized plasma where the weakly(cid:173)
`
`ionized plasma reduces the probability of developing an electrical breakdown condition in
`
`the chamber. This amendment is supported by the originally-filed specification of the
`
`present application.
`
`As previously discussed with reference to independent claim 1, there is no description in
`
`Koloc of a weakly-ionized plasma that reduces the probability of developing an electrical
`
`breakdown condition in the chamber. Instead, the Applicant believes that Koloc describes a
`
`source of ionizing energy that is oriented to project or focus ionizing energy into a particular
`
`region.
`
`In view of the above remarks, the Applicant respectfully submits that Koloc does not
`
`describe each and every element of independent claim 10 as currently amended, either expressly
`
`or inherently. Therefore, Applicant submits that Koloc does not anticipate independent claim 10
`
`as currently amended under 35 U.S.C. §102(b). Thus, the Applicant submits that independent
`
`claim 43 as currently amended is allowable.
`
`Independent Claim 44
`
`Independent claim 44 has been amended to include the limitations in the objected-to
`
`claim 42. Applicant respectfully submits that in view of this amendment, Koloc does not
`
`anticipate independent claim 44 as currently amended under 35 U.S.C. §102(b). Thus, the
`
`Applicant submits that independent claim 44 as currently amended is allowable.
`
`

`

`Amendment and Response
`Applicant: Chistyakov
`Serial No.: 10/065,629
`Page 14ofl4
`
`Rejections under 35 U.S.~~
`
`'
`
`C'J
`
`Claim 16 is rejected under 35 U.S.C. § 103(a) as being unpatentable over Koloc.
`
`Dependent claim 16 has been amended to more clearly recite the invention and depends from
`
`independent claim 10. Independent claim 10 has been amended herein to recite the step of
`
`ionizing a feed gas to form a weakly-ionized plasma that reduces the probability of developing
`
`an electrical breakdown condition in the chamber. The Applicant believes that this step is
`
`neither taught nor suggested by Koloc. Therefore, the Applicant respectfully submits that
`
`dependent claim 16 is not obvious over Koloc. Thus, the Applicant believes that dependent
`
`claim 16 is allowable.
`
`I·
`
`CONCLUSION
`
`Claims 1-20, 22-27, 29-41, and 43-46 are currently pending in the present application.
`
`Claims 1, 3, 10, 12, 16, 22, 33, 43, and 44 are amended by the present Amendment. Claims
`
`21, 28, and 42 are canceled without prejudice. Claims 45 and 46 are added. In view of the
`
`foregoing amendments and remarks, reconsideration and allowance of all pending claims
`
`(i.e., claims 1-20,22-27, 29-41, and 43-46) is respectfully requested.
`
`The Commissioner is hereby authorized to charge the extension fee, the additional claims
`
`fee, and any other proper fees to Attorney's Deposit Account No. 501211.
`
`If, in the Examiner's opinion, a telephonic interview would expedite prosecution of
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`the present application, the undersigned attorney would welcome the opportunity to discuss
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`any outstanding issues, and to work with the Examiner toward placing the application in
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`condition for allowance.
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`Date: March 8, 2004
`Reg. No. 40,137
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`Tel. No.: (781) 271-1503
`Fax No.: (781) 271-1527
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`Respectfully submitted,
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`Kurt Rauschenbach, Ph.D.
`Attorney for Applicant
`Rauschenbach Patent Law Group, LLC
`Post Office Box 387
`Bedford, MA 01 730
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