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`KOUZN ETSOV, et al., A Novel Pulsed Magnetron Sputter Technique Utilizing Very High Target Power Densities,
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`Surface and Coatings Technology, 1999, Pgs. 290—293, Vol. 122, Elsevier
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`STEINBRUCHEL, A Simple Formula For Low-Energy Sputtering Yields, Applied Physics A., 1985, Pgs. 37—42, Vol.
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`DAUGHERTY, et al., Attachment-Dominated Electron-Beam—lonized Discharges, Applied Physics Letters, May 15,
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`1976, Pgs. 581-583, Vol. 28, No. 10, American Institute of Physics.
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` FAJANS, et al., Bifurcations In Elliptical, Asymmetric Non-Neutral Plasmas, Physics of Plasmas, October 2000, Pgs.
`
`3929-3933, Vol. 7, No. 10, American Institute of Physics,
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` DEKOVEN, et al., Carbon Thin Film Deposition Using High Power Pulsed Magnetron Sputtering, 46th Annual
`
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`Technical Conference Proceedings, 2003, Pgs. 158-165, Society of Vacuum Coaters.
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` CHOUEIRI, Characterization Of Oscilla '
`n
`
`
`
`STARK, et al., Electron Heating In Atmospheric Pressure Glow Discharges, Journal of Applied Physics, April 2001,
`Pg. 3568, Vol. 89, No. 7, American Institute of Physics.
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`GUDMUNDSSON, et aI., Evolution Of The Electron Energy Distribution And Plasma Parameters In A Pulsed
`Magnetron Discharge, Applied Physics Letters, May 28,2001, Pgs. 3427-3429, American Institute of Physics.
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`MOZGRIN, et al., High—Current Low-Pressure Quasi —Stationary Discharge In A Magnetic Field: Experimental
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`GARRIGUES, et al., Hybrid And Particle-In—Cell Models OfA Stationary Plasma Thruster, Plasma Sources Sci.
`Technol.. 2000, Pgs. 219—226, Vol. 9, IOP Publishing Ltd.. UK.
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`KUDRYAVTSEV, et al., Ionization Relaxation In A Plasma Produced By A Pulsed Inert-Gas Discharge, Sov. Phys.
`Tech. Phys., January 1983, Pgs. 30—35, Vol. 28, No. 1, American Institute of Physcis.
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`Gaseous Electronics Conference-2003, October 24. 2003, Pgs. 1-14.
`
`EFS Web 1.0
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`MATOSSIAN, et al., Operating Characteristics OfA100kV, 100kW Plasma Ion Implantation Facility, Surface Coatings
`& Technology, 1996, Pgs. 92-97, Vol. 85.
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`J.T. GUDMUNDSSON, et al., Spatial And Temporal Behavior Of The Plasma Parameters In A Pulsed Magnetron
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`BIBERMAN, et al., Chapter Eight: Transient Nonequilibrium Plasmas, Kinetics Of Nonequilibrium Low Temperature
`Plasmas, 1987, Pgs. 321, 360-372, Plenum Publishing Corporation, New York, USA.
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`GUDMUNDSSON, et al., Observation Of Solitons In A Pulsed Magnetron Sputtering Discharge [online].
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`[retrieved on
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`The State Of The Art In Pulsed High Power [online]. [retrieved on July 15, 2002]. Retrieved from W.
`physiqueindustrie.com/Jiulsemeerhtml.
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`Encyclopedia Of Low Temperature Plasma, Editor V.E. Fortov. 2000, Volume 3, Pg. 123.
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`Encyclopedia Of Low Temperature Plasma, Editor V.E. Fortov. 2000, Volume 3, Pg. 119.
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`
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`LUTSENKO, E.I., Instability Mechanisms In A High-Current Straight Discharge At A Low Gas Pressure, Sov. J.
`Plasma Phys, Jan—Feb. 1984, Pgs. 87-95, Vol. 10, No. 1.
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