PATENT
`Customer No. 27683
`
`IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
`
`In re Ex Parte Reexamination of: Joseph NEEV
`
`Control No. 90/009,625
`
`U.S. Patent No. 6,482,199
`
`Issue Date: November 19,2002
`
`Group Art Unit: 3993
`
`Examiner: Beverly M. FLANAGAN
`
`For:
`
`METHOD AND APPARATUS FOR HIGH
`PRECISION VARIABLE RATE MATERIAL
`REMOVAL AND MODIFICATION
`
`Attorney Docket No. 45976.3
`
`VIAEFS-WEB
`Commissioner for Patents
`P. 0. Box 1450
`Alexandria, VA 22313-1450
`
`San Jose, California
`June 14, 2010
`
`PATENT OWNER'S RESPONSE TO
`OFFICE ACTION OF MARCH 12, 2010
`
`Joseph Neev, ("Patentee"), the owner ofU.S. Patent No. 6,482,199 ("the' 199 patent"), in response to the
`
`Office Action mailed March 12, 2010, the period for response to which has been extended through June 14,2010 (June
`
`12 being a Saturday) by the Petition for Extension of Time granted on May 5, 2010, provides the following
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`amendments and remarks.
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`Amendments to the Claims are reflected in the listing of claims which begins on page 2 of this paper.
`
`Remarks begin on page 22 of this paper.
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 1
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`AMENDMENTS TO THE CLAIMS:
`
`Pursuant to 37 C.F.R. § 1.530(d)(2), please amend claims 1-4, and 14, and please add claims 17-86, as shown
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`below.
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`1.
`
`(Currently Amended) A method for a controlled, variable rate material modification by a pulsed
`
`electromagnetic radiation beam irradiated on a target region of a target material, [the interaction] interactions between
`
`the pulsed electromagnetic radiation beam and the material providing a modification threshold volumetric power
`
`density, the method comprising:
`
`a) providing a source capable of generating an output beam comprised of a sequence of electromagnetic
`
`pulses, each [electronic] electromagnetic pulse having a pulse duration in [the] f! range of
`
`approximately 1 femtosecond to approximately 100 millisecond;
`
`b) preparing the target region of the target material by spatially or temporally varying at least one of an
`
`absorption characteristic of the material or a scattering characteristic of the material at the target
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`[b)]£} operating the [pulse] source and manipulating [the] beam parameters so that [the] f! deposited
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`volumetric power density of the beam within [the targeted] f! volume of the target region is
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`greater than the threshold volumetric power density [for material modification], [so that]
`
`wherein control of the deposited volumetric power density is achieved by varying [either one or
`
`more] at least one of the following beam parameters:
`
`[the] f! beam spot size at the [targeted location] target region, [the] f! duration of the
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`electromagnetic [pulsed emissions] pulses, [the] an energy of the electromagnetic
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`[pulsed emissions] pulses, or [the] f! wavelength of the electromagnetic [pulsed
`
`emissions] pulses[, or by spatially and temporally varying the absorption and/or
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`scattering characteristics of the material at the targeted region];
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`[c)] Q) allowing interaction energy transients caused by the electromagnetic [radiation pulse] pulses to
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`substantially decay so that material modification is effected permitting the controlled. variable
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`-2-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 2
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`rate material modification, the material modification [include] including [one or more] at least
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`one of the following [alterations] material modifications:
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`chemical changes of the material, physical changes of the material, changes to viscoelastic
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`properties of the material, changes to optical properties of the material, thermal
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`properties of the material, chemical and physical breakdown of the material,
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`disintegration of the material, ablation of the material. melting of the material. and
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`vaporization of the material;
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`[d)]~ operating the [pulse] source at a pulse repetition rate greater than 0.1 pulses per second until a
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`[desired] target volume of the material in the target region has been modified.
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`2.
`
`(Currently Amended) The method of claim 1, wherein the target material is substantially transparent to linear
`
`beam propagation and threshold volumetric power density is achieved at a desired target location below [the]
`
`a surface ofthe material [surface] and within a volume of the material [volume].
`
`3.
`
`(Currently Amended) The method of claim 2, wherein preparing the target region of the target material
`
`comprises adding scattering and/or absorption centers, defects, or highly absorbing components[, are added
`
`to the target material] with spatial and/or temporal selectivity to specific, predetermined locations within the
`
`target material.
`
`4.
`
`(Currently Amended) The method of claim 3, wherein the [pulsed] beam exhibits a material modification
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`rate in the range of from approximately 0.01 3 cubic micrometers per pulse to approximately 100,0003 cubic
`
`micrometers per pulse, the modification rate being substantially constant depending substantially on the
`
`volumetric power density threshold [characteristics] of the material and on the [target-beam] beam
`
`characteristics.
`
`5.
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`(Original) A method for a high precision, highly controllable, variable rate, material removal by a
`
`continuously emitting, continuous wave (CW) beam of electromagnetic radiation, the interaction between the
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`electromagnetic radiation, and the material being such that a material removal depth within is approximately
`
`equal to an energy deposition depth within the target material, the method comprising the steps of:
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`- 3-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 3
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`a) providing a source capable of generating an output beam comprised of continuously emitted
`
`electromagnetic radiation;
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`b) redistributing the beam in time and space to form at least one modified beam comprising a plurality of
`
`pulses;
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`c) directing said modified beam(s) so that their energy distribution at any given location on the target
`
`material forms a sequence of electromagnetic pulses, each electromagnetic pulse having a pulse
`
`duration between approximately 1 femtosecond and approximately 10 millisecond;
`
`d) operating said source and manipulating parameters of the beam so that the electromagnetic pulse's
`
`power densities within the region targeted for modification are between approximately 104
`
`W/cm3 approximately 1018 W/cm3 and are larger than a power density threshold for material
`
`ablation;
`
`e) allowing the electromagnetic energy absorbed by the material to complete the material ablation, so
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`that substantially most of the deposited electromagnetic energy is removed from the target
`
`material with an ejected portion of the material;
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`f) repeating said electromagnetic energy absorption, ablation, and energy removal steps at a pulse
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`repetition rage greater than 0.1 pulses per second so that substantially most of the cumulative
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`residual thermal energy left in the material by a pulse train is removed by the commutative
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`ablation, and at a pulse repetition rate less than approximately 100,000 pulses per second until a
`
`sufficient depth of material has been removed while mitigating transfer of thermal or
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`mechanical energy into the remaining material and thus mitigating collateral damage thereto.
`
`6.
`
`(Original) The method of claim 5 wherein the step of redistributing the beam comprises deflecting sequential
`
`portions of the beam and re-directing them to separate locations so that the net effect at each location is that of
`
`a sequence of pulses of a desired duration and a desired pulse repetition rate.
`
`7.
`
`(Original) The method of claim 5 wherein the step of redistributing the beam comprises directing the beam to
`
`a device selected from the group consisting of:
`
`a) a rapidly rotating mirror:
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`-4-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 4
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`b) a Kerr cell;
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`c) a Pockels cell;
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`d) acousto-optic modulator; and
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`e) electro-optic modulator.
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`8.
`
`(Original) The method of claim 6 wherein the switching device sequentially redirects the original beam
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`energy into an optical guiding device selected from the group consisting of;
`
`a) at least one optical fiber; and
`
`b) at least one hollow waveguide light conductor; and
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`c) at least one optical guiding device such as an articulated arm or an open beam guidance apparatus.
`
`9.
`
`(Original) The method of claim 8 further comprising the step of focusing the output of the optical guiding
`
`device to a spot size so that power density within the volume targeted for material removal is greater than a
`
`threshold power density for material ablation.
`
`10.
`
`(Original) The method of claim 5 wherein the step of redistributing the beam comprises redirecting the beam
`
`into at lest one focusing device and allowing the beam to propagate to separate locations on the target
`
`material.
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`11.
`
`(Original) The method of claim 6, wherein said pulsed electromagnetic radiation source produces an output
`
`beam having a wavelength in the range of from 10 nanometers to 50 micrometers.
`
`12.
`
`(Original) The method of claim 7, wherein each pulse of said continuously emitting beam source has an
`
`average power in the range of from approximately 0.0001 Watt to approximately 500 KWatts, and said
`
`output beam having a diameter at the target material such that said target material experiences a power per
`
`unit area in the range of approximately 1 Watt per square centimeter to approximately 1014 Watts per square
`
`centimeter.
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`- 5-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 5
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`

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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`13.
`
`(Original) The method of claim 5, wherein said beam is configured to provide a material removal rate in the
`
`range of approximately 0.01 micrometers to approximately 10,000 micrometers per pulse, said material
`
`removal rate being substantially constant.
`
`14.
`
`(Currently Amended) The method of claim 6, wherein each ofthe redistributed beams comprise of a
`
`sequence of electromagnetic pulses each having a pulse duration in the range of from approximately 1
`
`femtosecond to approximately 100 millisecond and a pulse repetition rate between approximately [ d0.1] 0.1
`
`pulses per second and [less than] approximately 100,000 pulses per second.
`
`15.
`
`(Original) The method of claim 6 wherein each of the redistributed beams comprise a sequence of
`
`electromagnetic pulses and is directed to a target location adjacent one another such that the beams cooperate
`
`so as to remove at least some thermal energy generated by preceding pulses in these adjacent beams.
`
`16.
`
`(Original) The method of claim 6 wherein the step of redistributing the beam further comprises changing the
`
`beam wavelength.
`
`17.
`
`(New) The method of claim l, further comprising:
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`determining at least one material characteristic of the material to be modified; and
`
`manipulating the beam parameters such that a ratio of a quantity of the material temporarily modified to
`
`a quantity of the material permanently modified is increased.
`
`18.
`
`(New) The method of claim 17, wherein the at least one material characteristic comprises at least one of a
`
`thermal conductivity of the material, an effective electromagnetic energy penetration depth of the material, a
`
`material energy gap between a valence band and a conduction band, a density of the material, or a strength of
`
`the material.
`
`19.
`
`(New) The method of claim 1. further comprising:
`
`determining at least one material characteristic of the material to be modified; and
`
`manipulating a pulse repetition rate of the beam such that a ratio of a quantity of the material temporarily
`
`modified to a quantity of the material permanently modified is increased.
`
`-6-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 6
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`

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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`20.
`
`(New) The method of claim 1, wherein material modification comprises ablation of the material. the method
`
`further comprising:
`
`determining at least one material characteristic of the material; and
`
`manipulating parameters of the electromagnetic beam such that a depth of the material removed during
`
`ablation is approximately equal to an electromagnetic energy deposition depth of the beam into
`
`the material.
`
`21.
`
`<New) The method of claim 1. further comprising:
`
`manipulating parameters of the electromagnetic beam such that applying the electromagnetic beam to
`
`the material creates a plasma.
`
`22.
`
`(New) The method of claim 21, wherein the material modification comprises ablation of the material, and
`
`wherein the plasma is generated by either multiphoton ionization of the material or thermal ionization of the
`
`material, and the plasma affects an electromagnetic deposition depth of the beam into the material such that
`
`an electromagnetic energy deposition depth is approximately equal to a depth of the material being removed
`
`by the ablation of the material.
`
`23.
`
`(New) The method of claim 1, wherein the beam parameters are manipulated such that a substantial portion
`
`of electromagnetic energy deposited in the material by the beam is removed from the material as portions of
`
`the material are ejected by the beam.
`
`24.
`
`(New) The method of claim 1, wherein the pulse repetition rate is between about 0.1 pulses per second and
`
`about 500,000 pulses per second such that a substantial portion of electromagnetic energy deposited in the
`
`material by the beam is removed from the material as portions of the material are removed by the beam.
`
`25.
`
`(New) The method of claim 1, wherein the target region is below a surface of the material, the method further
`
`comprising:
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`focusing the beam at the target region;
`
`manipulating the beam parameters such that a plasma is formed only at the target region; and
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`modifYing the material at the target region to form cavities in the material.
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`- 7-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 7
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`26.
`
`(New) The method of claim l, wherein spatially or temporally varying at least one of an absorption
`
`characteristic or a scattering characteristic of the target material at the target region comprises:
`
`doping the material at the target region with a spatially or temporally controlled doping agent, the doping
`
`agent allowing for material modification at the doped target region and substantially no
`
`modification at locations adjacent to the doped target region.
`
`27.
`
`(New) The method of claim l, further comprising:
`
`deflecting sequential portions of the beam: and
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`redirecting the deflected portions of the beam to separate locations on the material.
`
`28.
`
`(New) The method of claim 27, wherein the beam is deflected using a switching device, and the switching
`
`device comprises at least one of a rapidly rotating mirror, a Kerr cell, a Pockels cell, an acousto-optic
`
`modulator, or an electro-optic modulator.
`
`29.
`
`(New) The method of claim l, wherein the material modification comprises ablation of the material and the
`
`material is removed at a rate ofless than about 1 micron of material removed per pulse, and wherein the pulse
`
`repetition rate is above about 1 000 pulses per second.
`
`30.
`
`(New) The method of claim l, wherein the material modification comprises material removal at a rate of
`
`greater than about 1 micron of material removed per pulse, and wherein the pulse repetition rate is above
`
`about 10,000 pulses per second.
`
`31.
`
`(New) The method of claim 1 wherein pulse repetition rate is about 1000-10,000 pulses per second, and
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`wherein manipulating the beam parameters comprises manipulating the beam parameters such that a
`
`penetration depth of the electromagnetic energy corresponds approximately to a depth of material removed
`
`by each pulse.
`
`32.
`
`(New) The method of claim l, further comprising adding a doping agent to the target region.
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`- 8-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 8
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`33.
`
`(New) The method of claim 1 whereili the pulse repetition rate is from about 10,000 pulses per second to
`
`about 100,000 pulses per second, and a residual thermal energy from each pulse is below the modification
`
`threshold volumetric power density.
`
`34.
`
`(New) The method of claim 1 wherein:
`
`modification of the material comprises ablation of the material;
`
`the pulse repetition rate is from about 10,000 pulses per second to about 100,000 pulses per second; and
`
`an electromagnetic deposition depth of the beam into the material is approximately equal to a depth of
`
`the material being removed by the ablation of the materiaL
`
`35.
`
`(New) The method of claim 1. wherein the control of the deposited volumetric power density is achieved by
`
`vatying a targeted volume spot size at the target region, and the targeted volume spot size at the target region
`
`is varied by adding an energy-absorption enhancing substance to the target material at the target region.
`
`36.
`
`(New) The method of claim 35, wherein the targeted volume spot size at the target region is reduced such
`
`that the deposited volumetric power density of the beam within the volume of the targeted region is sufficient
`
`to permit the modification of about 1 OOnm of the target material at the target region.
`
`37.
`
`(New) The method of claim 35, wherein the energy-absorption enhancing substance creates multiphoton
`
`ionization or thermal ionization in the target material at the target region.
`
`38.
`
`(New) The method of claim 1. wherein spatially or temporally vatying at least one of an absorption
`
`characteristic of the material or a scattering characteristic of the material at the target region comprises
`
`adding an energy-absorption enhancing substance to the target material at the target region.
`
`39.
`
`(New) The method of claim 38, wherein the energy-absorption enhancing substance is added to the target
`
`material at the target region synchronously with the irradiation of the target region by the pulsed beam.
`
`40.
`
`(New) The method of claim 1. further comprising:
`
`temporally compressing the electromagnetic pulses as the electromagnetic pulses propagate towards the
`
`target region.
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`- 9-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 9
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`41.
`
`(New) The method of claim 40, wherein temporally compressing the electromagnetic pulses comprises
`
`manipulating spectral or frequency components of the electromagnetic pulses.
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`42.
`
`(New) The method of claim 40, wherein the beam exhibits a material modification rate in the range of :from
`
`approximately 0.01 3 cubic micrometers per pulse to approximately 100,0003 cubic micrometers per pulse.
`
`43.
`
`(New) The method of claim 40, wherein compressing the electromagnetic pulses allows an above-threshold
`
`volumetric power density to be created in the target region.
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`44.
`
`(New) The method of claim l, further comprising moving the target region three-dimensionally within the
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`target material.
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`45.
`
`(New) The method of claim 44, wherein moving the target region includes at least one of moving the pulsed
`
`beam, moving the target material or moving the pulsed beam and the target material.
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`46.
`
`(New) The method of claim 44, further comprising:
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`monitoring at least one of the material modification and the movement ofthe target volume ofthe target
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`region using a feedback device.
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`4 7.
`
`(New) The method of claim 46, wherein the feedback device comprises at least one of an optical coherence
`
`tomography (OCT) device, an imaging device, a fluorescence emission device, a luminescence emission
`
`device, or a spectroscopy device.
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`48.
`
`(New) The method of claim 46, further comprising automatically controlling the material modification on
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`the basis of the monitoring.
`
`49.
`
`(New) The method of claim 46, further comprising:
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`differentiating between different tissue types at the target region using the feedback device; and
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`selectively modifying the target material at the target region based on the differentiating, the selective
`
`modifying creating a texturization of the target material at the target region.
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`- 10-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 10
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`50.
`
`(New) The method of claim 1, further comprising:
`
`monitoring material modification; and
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`automatically controlling the material modification based on the monitoring.
`
`51.
`
`(New) The method of claim l, wherein:
`
`operating the source comprises varying the pulse repetition rate to control the volume of material in the
`
`target region that is modified: and
`
`the pulse repetition rate is between about 30.000 pulses per second and 100.000 pulses per second.
`
`52.
`
`(New) The method of claim 51, wherein the volume of material modified is about 1 !lm to about 100 nm.
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`53.
`
`(New) The method of claim l, further comprising:
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`creating an external opening in the target material at the target region for accessing debris from the
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`material modification. and for venting gas generated by the material modification.
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`54.
`
`(New) The method of claim 53, wherein the external opening is created using the pulsed electromagnetic
`
`radiation beam.
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`55.
`
`(New) The method of claim l, wherein operating the source further comprises operating the source such that
`
`a :frrst portion of the deposited volumetric power density of the beam within the volume of the targeted region
`
`is greater than the threshold volumetric power density, and a second portion of the deposited volumetric
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`power density of the beam within the volume of the targeted region is below the threshold volumetric power
`
`density.
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`56.
`
`(New) The method of claim 55, wherein a cross-section of the volume of the modified material is between
`
`about 100 nm and 1 gm.
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`57.
`
`(New) The method of claim 1, wherein preparing the target region of the target material by spatially or
`
`temporally varying at least one of an absorption characteristic ofthe material or a scattering characteristic of
`
`the material at the target region comprises creating compression zones with the target region.
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`- 11 -
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 11
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`

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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`58.
`
`(New) The method of claim 1. wherein preparing the target region of the target material by spatially or
`
`temporally varying at least one of an absorption characteristic ofthe material or a scattering characteristic of
`
`the material at the target region comprises changing a density of the target material at the target region.
`
`59.
`
`(New) The method of claim l, wherein preparing the target region of the target material by spatially or
`
`temporally varying at least one of an absorption characteristic of the material or a scattering characteristic of
`
`the material at the target region comprises temporally and spatially preparing the target volume in the target
`
`60.
`
`(New) The method of claim l, wherein preparing the target region of the target material by spatially or
`
`temporally varying at least one of an absorption characteristic of the material or a scattering characteristic of
`
`the material at the target region comprises enhancing the scattering or absorption characteristics of the
`
`material at the target region.
`
`61.
`
`(New) The method of claim I, wherein the pulsed electromagnetic beam comprises a plurality of beamlets
`
`focused on the target region.
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`62.
`
`(New) The method of claim 61 wherein:
`
`the target region is on or below a surface of the target material; and
`
`spatially or temporally varying the absorption or scattering characteristics of the target material reduces
`
`damage to the target material surrounding the target region.
`
`63.
`
`(New) The method of claim 61 wherein:
`
`the target region is on or below a surface of the target material;
`
`spatially or temporally varying the absorption or scattering characteristics of the target material removes
`
`heat from the target region.
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`64.
`
`(New) The method of claim 61, wherein the beamlets have a diameter of about 100 blm or less and a
`
`separation between adjacent beamlets is about I 00 blm.
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`- 12-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 12
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`65.
`
`(New) The method of claim 64, wherein the beamlets are scanned across the target region in a pattern that
`
`enhances heat removal.
`
`66.
`
`(New) The method of claim 65, wherein the beamlets have apeakpowerperunit area greater than or equal to
`
`67.
`
`(New) The method of claim 61 wherein the beamlets form a spiraling pattern across the target region.
`
`68.
`
`(New) The method of claim 61, wherein the material modification effected does not include ablation or
`
`material removal.
`
`69.
`
`(New) The method of claim 61, wherein the beamlets form a sequence of rows in the target region such that
`
`the target material is modified only on the rows.
`
`70.
`
`(New) The method of claim 69, wherein rows are separated by about 100 ym or less.
`
`71.
`
`(New) The method of claim 61, wherein the beamlets create spots at the target region, wherein a thermal
`
`energy deposited at the spots dissipates faster than a thermal energy deposited by the electromagnetic beam at
`
`an equivalent continuous area of the target region.
`
`72.
`
`(New) The method of claim 1, wherein manipulating the beam parameters comprises manipulating the beam
`
`to form spots at the target region, the spots having a predetermined separation therebetween, and wherein the
`
`target material is only modified where the spots are formed.
`
`73.
`
`(New) The method of claim 72, wherein the spots have a diameter of about 100 !Jill or less.
`
`7 4.
`
`(New) The method of claim 1, wherein manipulating the beam parameters comprises manipulating the beam
`
`to form a pattern of lines at the target region, the lines having a predetermined separation therebetween, and
`
`wherein the target material is only modified where the lines are formed.
`
`75.
`
`(New) The method of claim 74, wherein the lines have a width of about 100 mm or less.
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`- 13-
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`Alcon Research, Ltd.
`Exhibit 1008 - Page 13
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`Control No. 90/009,625
`Attorney Docket No. 45976.3
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`76.
`
`(New) The method of claim 1, wherein manipulating the beam parameters comprises modifying the
`
`wavelength of the beam.
`
`77.
`
`(New) The method of claim l, further comprising:
`
`delivering the electromagnetic beam to the target region through one or more optical elements, through
`
`an optical fiber, through a hollow waveguide, through an articulated arm, or through a
`
`combination of thereof.
`
`78.
`
`(New) The method of claim 77, wherein delivering the electromagnetic beam further comprises delivering
`
`the electromagnetic beam through delivery fibers at a distal end of the one or more optical elements, the
`
`optical fiber, the hollow waveguide, the articulated arm, or the combination of thereof.
`
`79.
`
`(New) A method for a controlled, variable rate material modification by a pulsed electromagnetic radiation
`
`beam irradiated on a target region of a target material, interactions between the pulsed electromagnetic radiation beam
`
`and the material providing a modification threshold volumetric power density, the method comprising:
`
`providing a source capable of generating an output beam comprised of a sequence of electromagnetic
`
`pulses, each electromagnetic pulse having a pulse duration in a range of approximately 1
`
`femtosecond to approximately 100 millisecond;
`
`operating the source and manipulating beam parameters so that a deposited volumetric power density of
`
`the beam within a volume of the target region is greater than the threshold volumetric power
`
`density, wherein control of the deposited volumetric power density is achieved by varying at
`
`least one of the following beam parameters:
`
`a beam spot size at the target region, a duration oftheelectromagnetic pulses, an energy of the
`
`electromagnetic pulses, or a wavelength of the electromagnetic pulses, or by spatially
`
`or temporally varying at least one of an absorption characteristic of the target material
`
`at the target region or a scattering characteristic of the target material at the target
`
`compressing the electromagnetic pulses temporally as they propagate towards the target;
`
`- 14-
`
`Alcon Research, Ltd.
`Exhibit 1008 - Page 14
`
`

`

`Control No. 90/009,625
`Attorney Docket No. 45976.3
`
`allowing interaction energy transients caused by the electromagnetic pulses to substantially decay so that
`
`material modification is effected permitting the controlled, variable rate material modification,
`
`the material modification including at least one of the following material modifications:
`
`chemical changes of the material. physical changes of the material. changes to viscoelastic
`
`properties of the material, changes to optical properties of the material, thermal
`
`properties of the material. chemical and physical breakdown of the material,
`
`disintegration of the material. ablation of the material, melting of the material, and
`
`vaporization of the material;
`
`operating the source at a pulse repetition rate greater than 0.1 pulses per second until a target volume of
`
`the target material in the target region has been modified.
`
`80.
`
`(New) A method for a controlled, variable rate material modification by a pulsed electromagnetic radiation
`
`beam irradiated on a target region of a target material, interactions between the pulsed electromagnetic radiation beam
`
`and the material providing a modification threshold volumetric power density. the method comprising:
`
`providing a source capable of generating an output beam comprised of a sequence of electromagnetic
`
`pulses, each electromagnetic pulse having a pulse duration in a range of approximately 1
`
`femtosecond to approximately 1 00 millisecond;
`
`determining at least one characteristic of the target material;
`
`operating the source and manipulating beam parameters based on the determined characteristic of the
`
`target material such that a plasma is created at the target region. the created plasma providing
`
`shielding to the target region so that the material is not modified outside a volume of the target
`
`region. and such that a deposited volumetric power density of the beam within a volume of the
`
`target region is greater than the threshold volumetric power density. wherein control of the
`
`deposited volumetric power density is achieved by varying at least one of the following beam
`
`parameters:
`
`a beam spot size at the target region, a duration of the electromagnetic pulses, an energy of the
`
`electromagnetic pulses. or a wavelength of the electromagnetic pulses, or by spatially
`
`or temporally varying at least one of an absorption characteristic of the target material
`
`- 15-
`
`Alcon Research, Ltd.
`Exhibit 1008 - Page 15
`
`

`

`Control No. 90/009,625
`Attorney Docket No. 45976.3
`
`at the target region or a scattering characteristic of the target material at the target
`
`allowing interaction energy transients caused by the electromagnetic pulses to substantially decay so that
`
`material modification is effected permitting the controlled, variable rate material modification,
`
`the material modification including at least one of the following material modifications:
`
`chemical changes of the material, physical changes of the material, changes to viscoelastic
`
`properties of the material, changes to optical properties of the material, thermal
`
`properties of the material, chemical and physical breakdown of the material.
`
`disintegration of the material, ablation of the material, melting of the material. and
`
`vaporization of the material;
`
`operating the source at a pulse repetition rate greater than 0.1 pulses per second until a target volume of
`
`the target material in the target region has been modified.
`
`81.
`
`(New) A method for a controlled, variable rate material modification by a pulsed electromagnetic radiation
`
`beam irradiated on a target region of a target material, interactions between the pulsed electromagnetic radiation beam
`
`and the material providing a modification threshold volumetric power density. the method comprising:
`
`providing a source capable of generating an output beam comprised of a sequence of electromagnetic
`
`pulses. each electromagnetic pulse having a pulse duration in a range of approximately 1
`
`femtosecond to approximately 100 millisecond;
`
`operating the source and manipulating beam parameters so that a deposited volumetric power density of
`
`the beam within a volume of the target region is greater than the threshold volumetric power
`
`density, wherein control of the deposited