`IPR2013-00363
`
`
`
`ZEISS 1101 U.S. Patent No. 7,348,575 (“the Omura Patent”)
`
`ZEISS 1102 U.S. Patent No. 7,309,870 (“the Omura ’870 Patent”)
`
`ZEISS 1103
`
`ZEISS 1104
`
`ZEISS 1105
`
`ZEISS 1106
`
`Judgment, Paper No. 49, Interference No. 105, 678 (“the ’678
`Judgment”)
`Judgment, Paper No. 157, Interference No. 105, 749 (“the ’749
`Judgment”)
`Judgment, Paper No. 41, Interference No. 105, 753 (“the ’753
`Judgment”)
`Judgment, Paper No. 291, Interference No. 105, 834 (“the ’834
`Judgment”)
`ZEISS 1107 Certified English Translation of Japanese Unexamined Patent
`Publication No. JP 2003-128154
`ZEISS 1108 Certified English Translation of Japanese Unexamined Patent
`Publication JP 2003-350647
`ZEISS 1109 Certified English Translation of Japanese Unexamined Patent
`Publication JP 2003-364596
`ZEISS 1110 US Patent Application Publication No.US 2005/0036213
`(“Mann”)
`JP Patent Application Publication No. JP 2003-114387
`
`ZEISS 1111
`
`ZEISS 1112 Certified English Translation of JP Patent Application Publication
`No. JP 2003-114387 (“Omura ‘387”)
`ZEISS 1113 PCT Patent Publication WO 02/035273 (“Takahashi PCT”)
`
`ZEISS 1114 European Patent Application Publication No. EP 1 336 887 A1
`(“Takahashi”)
`ZEISS 1115 Satori Asai et al., “Resolution Limit for Optical Lithography
`Using Polarized Light Illumination,” Jpn. J. Appl. Phys. Vol. 32,
`pp. 5863-5866 (1993) (“Asai”)
`
`
`
`ZEISS 1116 Expert Declaration of Richard C. Juergens
`
`ZEISS 1117 Wikipedia, “Optical Power,”
`https://en.wikipedia.org/wiki/Optical_power (downloaded May
`20, 2013)
`ZEISS 1118 Willi Ulrich et al., “The Development of Dioptric Projection
`Lenses for DUV Lithography,” Proc. SPIE Vol. 4832, pp. 158-
`169 (2002) (“Ulrich”)
`ZEISS 1119 Eugene Hecht, Optics (4th ed.), Addison Wesley (2002), pp. 171-
`173.
`ZEISS 1120 Wikipedia, “Optical Axis,”
`https://en.wikipedia.org/wiki/Optical_axis (downloaded May 20,
`2013)
`ZEISS 1121 New World Dictionary of the American Language, Second
`College Edition, p. 1552, Simon and Schuster (1980)
`ZEISS 1122 File History Excerpts from U.S. Serial No. 11/266,288 (“Omura
`Application”)
`ZEISS 1123 US Patent No. 5,825,043 (“Suwa”)
`
`ZEISS 1124 Wikipedia, “Refractive Index,”
`http://en.wikipedia.org/wiki/Refractive_index (downloaded May
`20, 2013)
`ZEISS 1125 U.S. Patent No. 4,346,164 (“Tabarelli”)
`
`ZEISS 1127
`
`ZEISS 1126 File History Excerpts from U.S. Serial No. 11/513,160 (“Omura
`Continuation Application”)
`J.R. Sheats and B.W. Smith, Microlithography: Science and
`Technology, Marcel Dekker, Inc. (1998), Chapter 1, pp. 1-43.
`ZEISS 1128 Omura Reply 1, Paper No. 200, Interference No. 105,834
`
`ZEISS 1129 Curriculum Vitae of Richard C. Juergens
`
`ZEISS 1130 CODE V Sequence Data
`
`ZEISS 1131 CODE V Sub-routines
`
`ZEISS 1132 OPTI 517 Lens Design Fall 2013
`
`
`
`ZEISS 1133 OPTI 517 Image Quality
`
`ZEISS 1134 U.S. Application No. 10/639,780 Mann Application
`
`ZEISS 1135 Deposition of Richard Juergen in IPR2013-00363 Zeiss v. Nikon
`
`ZEISS 1136
`
`Transcript of May 8, 2014 Deposition of Jose Sasian, Ph.D.
`
`ZEISS 1137 U.S. Application No. 12/379,415 as filed
`
`ZEISS 1138 Office Action issued in U.S. Application No. 12/379,415 on
`January 7, 2011
`ZEISS 1139 Amendment under 37 CFR 1.111 filed on U.S. Application No.
`12/379,415 on July 7, 2011
`ZEISS 1140 U.S. Patent No. 3,887,273 (“Griffiths”)
`
`ZEISS 1141 U.S. Patent No. 4,867,551 (“Perera”)
`
`ZEISS 1142 U.S. Patent No. 5,552,922 (“Margarill”)
`
`ZEISS 1143 U.S. Patent No. 7,631,975 (“Takaura”)
`
`ZEISS 1144 U.S. Patent No. 8,279,527 (“Lin”)
`
`ZEISS 1145 GE Lighting Solutions, LLC v. Agilight, Inc., No. 2013-1267,
`Slip. Op. 5 (Fed. Cir. May 1, 2014)
`
`
`
`
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