VERIFICATION
`
`The undersigned, of the below address, hereby certifies
`
`that he/she well knows both the English and Japanese languages,
`
`and that the attached is an accurate English translation of the
`
`Japanese Patent application filed on October 24, 2003 under No.
`
`P2003-364596.
`
`The undersigned declares further that all statements made
`
`herein of his/her
`
`own
`
`knowledge are
`
`true and
`
`that all
`
`statements made on information and belief are believed to be
`
`true; and further that these statements were made with the
`
`knowledge that willful false statements and the like so made
`
`are punishable by fine or imprisonment, or both, under Section
`
`1001 of Title 18 of the United States Code and that such
`
`willful false statements may
`
`jeopardize the' validity of the
`
`application or any patent issuing thereon.
`
`Signed this
`
`20th
`
`day of ____ F_e_b __ r_u_a_r_y~ _____ , 2008.
`
`Signature:
`
`.~~.
`
`Name: Shiro TERASAKI
`
`Address:
`
`c/o Soei Patent & Law Firm Ginza First Bldg.,
`
`10-6, Ginza 1-chome, Chuo-ku, Tokyo 104-0061
`
`Japan
`
`1
`
`
`
`The undersigned, of the below address, hereby certifies
`
`that he/she well knows both the English and Japanese languages,
`
`and that the attached is an accurate English translation of the
`
`Japanese Patent application filed on October 24, 2003 under No.
`
`P2003-364596.
`
`The undersigned declares further that all statements made
`
`herein of his/her
`
`own
`
`knowledge are
`
`true and
`
`that all
`
`statements made on information and belief are believed to be
`
`true; and further that these statements were made with the
`
`knowledge that willful false statements and the like so made
`
`are punishable by fine or imprisonment, or both, under Section
`
`1001 of Title 18 of the United States Code and that such
`
`willful false statements may
`
`jeopardize the' validity of the
`
`application or any patent issuing thereon.
`
`Signed this
`
`20th
`
`day of ____ F_e_b __ r_u_a_r_y~ _____ , 2008.
`
`Signature:
`
`.~~.
`
`Name: Shiro TERASAKI
`
`Address:
`
`c/o Soei Patent & Law Firm Ginza First Bldg.,
`
`10-6, Ginza 1-chome, Chuo-ku, Tokyo 104-0061
`
`Japan
`
`1
`
`
`
`PATENT OFFICE
`
`JAPANESE GOVERNMENT
`
`This is to certify that the annexed is a true copy of the following
`
`application as filed with this Office.
`
`Date of Application:
`
`October 24, 2003
`
`Application Number:
`
`Japanese Patent Application
`
`N02003-364596
`
`Applicant(s): NIKON CORPORATION
`
`Commissioner,
`
`Patent Office
`
`(Seal)
`
`2
`
`
`
`JP2003-364596
`
`(Document Name)
`
`Patent Application
`
`(Reference Number)
`
`03-0681NK
`
`(presentation Date)
`
`October 24, 2003
`
`(Directly)
`
`(IPC)
`
`(Inventor)
`
`Commissioner of the Patent Office
`
`H01L 211027
`
`(Residence or Address)
`
`c/o NIKON CORPORATION,
`
`2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo
`
`(Name)
`
`Yasuhiro OMURA
`
`(Applicant)
`
`(Identification Number) 000004112
`
`(Name)
`
`NIKON CORPORATION
`
`(Attorney)
`
`(Identification Number) 100112427
`
`(patent Attorney)
`
`(Name)
`
`Yoshihiro FUJIMOTO
`
`(Official Fee)
`
`(pre-Paid Master Note Number) 168687
`
`(Amount to be paid) 21,000 yen
`
`(Lists of the Article to be presented)
`
`(Name of Article) Claims 1
`
`(Name of Article)
`
`Specification 1
`
`(Name of Article) Drawing 1
`
`(Name of Article) Abstract 1
`
`(General
`
`Power
`
`of Attorney Number)
`
`0016868
`
`3
`
`
`
`JP2003-364596
`
`[Document Name] Claims
`
`[Claim 1] A catadioptric projection optical system for forming an image
`
`of a first surface on a second surface, the projection optical system
`
`comprising:
`
`5
`
`a first imaging optical system comprising at least six mirrors, for
`
`forming a first intermediate image and a second intermediate image of
`
`the first surface; and
`
`a second
`
`imaging optical system for relaying the second
`
`intermediate image onto the second surface.
`
`10
`
`[Claim 2] The catadioptric projection optical system according to Claim
`
`1,
`
`wherein the first intermediate image is formed between a mirror
`
`that light emerging from the first surface enters second and a mirror that
`
`the light emerging from the first surface enters fourth, out of said at least
`
`15
`
`six mirrors in the first imaging optical system.
`
`[Claim 3] The catadioptric projection optical system according to Claim
`
`1 or 2,
`
`wherein the first imaging optical system comprises a field lens
`
`unit comprised of a transmitting optical element and having a positive
`
`20
`
`refracting power, and
`
`wherein said at least six mirrors are arranged so as to continuously
`
`reflect light transmitted by the field lens unit.
`
`[Claim 4] The projection optical system according to Claim 1 or 2,
`
`wherein the first imaging optical system comprises a field lens
`
`25
`
`unit comprised of a transmitting optical element and having a positive
`
`refracting power, and
`
`1
`
`4
`
`
`
`IP2003-364596
`
`wherein the first imaging optical system comprises at least one
`
`negative lens between a mirror that light emerging from the fIrst surface
`
`enters first and a mirror that the light emerging from the fIrst surface
`
`enters sixth, out of said at least six mirrors.
`
`5
`
`[Claim 5] The catadioptric projection optical system according to any
`
`one of Claims 1 to 4,
`
`wherein every optical element constituting the second imaging
`
`optical system is a transmitting optical element to form a reduced image
`
`of the first surface on the second· surface.
`
`10
`
`[Claim 6] 39. The catadioptric projection optical system according to
`
`anyone of Claims 1 to 5,
`
`wherein the second Imagmg optical system comprises the
`
`following components in order of passage of light emerging from the
`
`first imaging optical system: a first lens unit having a positive refracting
`
`15
`
`power; a second lens unit having a negative refracting power; a third lens
`
`unit having a positive refracting power; an aperture stop; and a fourth
`
`lens unit having a positive refracting power.
`
`[Claim 7] The catadioptric projection optical system according to Claim
`
`6,
`
`20
`
`wherein a mirror disposed at a position where light emerging from
`
`the first surface is most distant from the optical axis of the catadioptric
`
`projection optical system, out of the at least six mirrors is a mirror of a
`
`concaveshape,and
`
`wherein the aperture stop is disposed between the mirror of the
`
`25
`
`concave shape and the second surface,
`
`the catadioptric projection optical system according to Claim 6
`
`2
`
`5
`
`
`
`jP2003-364596
`
`satisfying the following condition:
`
`0.2 < MbIL < 0.7,
`
`where Mb is a distance on an optical axis between the mirror of
`
`the concave shape and the second surface and L a distance between the
`
`5
`
`first surface and the second surface.
`
`[Claim 8] The catadioptric projection optical system according to Claim
`
`6 or 7,
`
`wherein the second lens unit and the fourth lens unit have at least
`
`one asphericallens.
`
`10
`
`[Claim 9] The catadioptric projection optical system according to any
`
`one of Claims 1 8 ,
`
`wherein a lens surface on the first surface side of a lens located
`
`nearest to the second surface out of lenses in the catadioptric projection
`
`optical system has a positive refracting power, and
`
`15
`
`wherein, where a refractive index of an atmosphere in the
`
`catadioptric projection optical system is 1, a intermediate having a
`
`refractive index larger than 1.1 is interposed in an optical path between
`
`the lens nearest to the second surface, and the second surface.
`
`[Claim 10] The catadioptric projection optical system according to any
`
`20
`
`one of Claims 1 to 9, which is the catadioptric projection optical system
`
`according to anyone of Claims 1 to 9,
`
`wherein an optical axis of every optical element with a
`
`predetermined refracting power in the catadioptric projection optical
`
`system is arranged substantially on a single straight line, and
`
`25
`
`wherein a region of an image formed on the second surface by the
`
`catadioptric projection optical system is an off-axis region not including
`
`3
`
`6
`
`
`
`lP2003-364596
`
`the optical axis.
`
`[Claim 11] The catadioptric projection optical system according to any
`
`one of Claims 1 to 10,
`
`the catadioptric projection optical system being a thrice-imaging
`
`5
`
`optical system for forming the frrst intermediate image being an
`
`intermediate image of the frrst surface, and the second intermediate
`
`image being an image of the first intermediate image, in an optical path
`
`between the first surface and the second surface.
`
`10
`
`[Claim 12] A catadioptric exposure apparatus for effecting an exposure
`
`of a pattern formed on a mask, onto a photosensitive substrate, the_
`
`exposure apparatus comprising:
`
`an illumination system for illuminating the mask set on the first
`
`surface; and
`
`15
`
`the projection optical system as set forth in anyone of Claims 1 to
`
`11, for forming an image of the pattern formed on the mask, on the
`
`photosensitive substrate set on the second surface.
`
`[Claim 13] A catadioptric exposure method of effecting an exposure of
`
`a pattern formed on a mask, onto a photosensitive substrate, the exposure
`
`20
`
`method comprising:
`
`an illumination step of illuminating the mask on which the
`
`predetermined pattern is formed; and
`
`an exposure step of performing an exposure of the pattern of the
`
`mask set on the first surface, onto the photosensitive substrate set on the
`
`25
`
`second surface, using the projection optical system as set forth in any
`
`one of Claims 1 to 11.
`
`4
`
`7
`
`
`
`lP2003-364596
`
`[Document Name] Specification
`
`[Title of the Invention]
`
`Catadioptric projection optical system, exposure apparatus and exposure
`
`method
`
`5
`
`[Detailed Description of the Invention]
`
`[0001]
`
`[Technical Field to which the Invention Pertains]
`
`[0002] In case a semiconductor device etc. is manufactured, the exposure
`
`apparatus which carries out projection exposure is used on the wafers (or
`
`10
`
`glass plate etc.) with which the image of the pattern of the reticle as a
`
`mask was applied to the resist as a photosensitive substrate through(cid:173)
`
`projection optical systems.
`
`[0003]
`
`In recent years, in manufacture of a semiconductor device, or
`
`15
`
`manufacture of a semiconductor chip mounting substrate, detailed(cid:173)
`
`ization is progressing increasingly, and the exposure apparatsu which
`
`can be moved in a pattern has required projection optical systems with
`
`more high resolution. In order to satisfy this demand of high resolving,
`
`exposure light must be short-wavelength-ized and numerical aperture of
`
`20
`
`projection optical systems must be enlarged. However, if the wavelength
`
`of exposure light becomes short, since it is the absorption of light, the
`
`class of optical glass which can be equal to practical use will be
`
`restricted. For example, if wavelength is set to 180nm or less, the glass
`
`material which can be used practically will serve as only fluorite.
`
`25
`
`[0004]
`
`Moreover, ifit is going to satisfy Petzval's condition when it is going to
`
`5
`
`8
`
`
`
`JP2003-364596
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`con~titute the projection optical systems which has big numerical
`
`aperture only from dioptrics members (a lens, plane-parallel plate, etc.),
`
`enlargement of the dioptrics member which constitutes projection optical
`
`systems, i.e., enlargement of projection optical systems, is nonavoidable.
`
`5
`
`Then, the projection optical systems which is only reflected light faculty
`
`material or is constituted combining a dioptrics member and reflected
`
`light faculty material is proposed (for example, patent reference 1
`
`reference).
`
`[0005]
`
`10
`
`Moreover, from being limited the glass material which has the
`
`penneability which can secure sufficient quantity of light for exposure,
`
`securing the desired imaging engine performance with short-wavelength
`
`of exposure light Between the inferior surface of tongue of projection
`
`optical systems and wafer front faces is filled with liquids, such as water
`
`15
`
`or an organic solvent. The exposure apparatus of the immersion type
`
`which raises resolution using the wavelength of the exposure light in the
`
`inside of a liquid increasing lin time in air (n being usually 1.2 to about
`
`1.6 at the refractive index of a liquid) is proposed (for example, see
`
`patent reference 2).
`
`20
`
`[patent reference 1] JP,2002-277742,A
`
`[Patent reference 2] JP,10-303114,A
`
`[Summary of the Invention]
`
`[problem to be Solved by the Invention]
`
`[0006]
`
`25
`
`In the case where the projection optical system is composed of only
`
`reflecting optical members and in the case where the projection optical
`
`6
`
`9
`
`
`
`JP2003.:.364596
`
`system is composed of a combination of refracting optical members with
`
`reflecting optical members, with increase in the numerical aperture, it
`
`becomes more difficult to implement optical path separation between a
`
`beam entering a reflecting optical member and a beam reflected by the
`
`5
`
`reflecting optical member and it is infeasible to avoid an increase in the
`
`scale of the reflecting optical member, i.e., an increase in the scale of the
`
`projection optical system.
`
`[0007]
`
`In order to achieve simplification of production and simplification of
`
`10
`
`mutual adjustment of optical members, it is desirable to construct a
`
`catadioptric projection optical system of a single optical axis; in this
`
`case, with increase in the numerical aperture, it also becomes more
`
`difficult to achieve the optical path separation between the beam entering
`
`the reflecting optical member and the beam reflected by the reflecting
`
`15
`
`optical member, and the projection optical system increases its scale.
`
`[0008]
`
`The problem of the present invention is to provide a catadioptric
`
`projection optical system using a liquid immersion method having a
`
`large numerical aperture, without increase in the scale of optical
`
`20
`
`members forming a catadioptric projection optical system and an
`
`exposure apparatus and a method using the catadioptric projection
`
`. optical system.
`
`[Means for Solving the Problem]
`
`[0009]
`
`25
`
`A catadioptric projection optical system according to claim 1 is
`
`characterized by having the 1 st imaging optical system which forms said
`
`7
`
`10
`
`
`
`lP2003-364596
`
`1 st intermediate image of the 1 st plane, and the 2nd intermediate image,
`
`and the 2nd imaging optical system which relays said 2nd intermediate
`
`image on said 2nd plane including at least six mirrors in the catadioptric
`
`projection optical system which forms the image of the 1 st plane on the
`
`5
`
`2nd plane.
`
`[0010]
`
`According to this catadioptric projection optical system according to
`
`claim 1, without lengthening the overall length of a catadioptric
`
`projection optical system, when numerical aperture by the side of the
`
`10
`
`body of a catadioptric projection optical system and an image is enlarged,
`
`in order to make resolution high since at least six mirrors are contained,
`
`the 1 st intermediate image and the 2nd intermediate image can be
`
`formed, and the good imaging engine performance can be obtained
`
`throughout the inside of an exposure field.
`
`15
`
`[0011]
`
`Moreover, a catadioptric projection optical system according to claim 2
`
`is characterized by forming said 1 st intermediate image between the
`
`mirror in which the light injected from said 1 st plane of said at least six
`
`mirrors contained in said 1 st imaging optical system carries out
`
`20
`
`incidence to the 2nd, and the mirror in which the light injected from said
`
`1 st
`
`plane
`
`carnes
`
`out
`
`incidence
`
`to
`
`the
`
`4th.
`
`[0012]
`
`The 1 st intermediate image is formed between the mirror to which the
`
`light injected from the 1 st plane carries out incidence of this catadioptric
`
`25
`
`projection optical system according to claim 2 to the 2nd, and the mirror
`
`in which the light injected from the 1 st plane carries out incidence to the
`
`8
`
`11
`
`
`
`JP2003-364596
`
`4th. Therefore, in order to make resolution high, when numerical
`
`aperture by the side of the body of a catadioptric projection optical
`
`system and an image is enlarged, optical-path separation with the flux of
`
`light which goes to the 1 st plane side, and the flux of light which goes to
`
`5
`
`the 2nd plane side can be ensured and easily, and the good imaging
`
`engine performance can be obtained throughout the inside of an
`
`exposure field.
`
`[0013]
`
`Moreover, a catadioptric projection optical system according to claim 3
`
`lO i s equipped with the field lens group which has the forward refractive.
`
`power by which said 1 st imaging optical system is constituted from a
`
`transparency mold optical element, and said at least six mirrors are
`
`characterized by being arranged so that the light which passed said field
`
`lens
`
`group
`
`may
`
`be
`
`reflected
`
`continuously.
`
`15
`
`[0014]
`
`Since the 1 st imaging optical system is equipped with the field lens
`
`group which has the forward refractive power which consists of
`
`transparency mold optical elements according to this catadioptric
`
`projection optical system according to claim 3, this field lens group can
`
`20
`
`amend distortion etc., and the 1 st plane side can be used as a tele cent
`
`rucksack. Moreover, since a lens is not arranged in the optical path
`
`between at least six mirrors, the field for holding each mirror can be
`
`secured, and each mirror can be held easily. Moreover,· since light is
`
`continuously reflected by each mirror, PETfSU bar conditions can be
`
`25
`
`easily satisfied by adjusting each mirror.
`
`[0015]
`
`9
`
`12
`
`
`
`JP2003-364596
`
`Moreover, a catadioptric projection optical system according to claim 4 .
`
`The mirror in which the light which said 1 st imaging optical system is
`
`equipped with the field lens group which has the forward refractive
`
`power which consists of transparency mold optical elements, and is
`
`5
`
`injected from said 1 st plane of said at least six mirrors carries out
`
`incidence to the 1 st, Light injected from said 1 st plane is characterized
`
`by having at least one negative lens between the mirrors which carry out
`
`incidence to the 6th.
`
`[0016]
`
`10
`
`Since the 1 st imaging optical system is equipped with the field lens
`
`group which has the forward refractive power which consists of
`
`transparency mold optical elements according to this catadioptric
`
`projection optical system according to claim 4, the 1st plane side can be
`
`used as a tele cent rucksack. Moreover, it can adjust easily so that
`
`15
`
`chromatic aberration can be amended easily and it may be satisfied with
`
`it of PETTSU bar conditions by adjusting this negative lens, since it has
`
`at least one negative lens between the mirror in which the light injected
`
`from the 1 st plane carries out incidence to the 1 st, and the mirror which
`
`carries out incidence to the 6th.
`
`20
`
`[0017]
`
`Moreover, all the optical elements from which a catadioptric projection
`
`optical system according to claim 5 constitutes said 2nd imaging optical
`
`system are transparency mold optical elements, and it is characterized by
`
`forming said cutback image of the 1 st plane on said 2nd plane.
`
`25
`
`[0018]
`
`According to this catadioptric projection optical system according to
`
`10
`
`13
`
`
`
`JP2003-364596
`
`claim 5, it is not accompanied by the load of optical-path separation from
`
`all the optical elements that constitute the 2nd imaging optical system
`
`being transparency mold optical elements. Therefore, numerical aperture
`
`by the side of the image of a catadioptric projection optical system can
`
`5
`
`be enlarged, and the cutback image of a high cutback scale factor can be
`
`formed on the 2nd plane. Moreover, amendment of comatic aberration or
`
`spherical aberration can be performed easily.
`
`[0019]
`
`Moreover, a catadioptric projection optical system according to claim 6
`
`10
`
`is characterized by said 2nd imaging optical system equipping the order
`
`which the light injected from the 1st imaging optical system passes with.
`
`the 1 st lens group which has forward refractive power, the 2nd lens
`
`group which has negative refractive power, the 3rd lens group which has
`
`forward refractive power, an aperture diaphragm, and the 4th lens group
`
`15
`
`which
`
`[0020]
`
`has
`
`forward
`
`refractive
`
`power.
`
`According to this catadioptric projection optical system according to
`
`claim 6, the 1 st lens group which has the forward refractive power which
`
`constitutes the 2nd imaging optical system, the 2nd lens group which has
`
`20
`
`negative refractive power, the 3rd lens group which has forward
`
`refractive power, an aperture diaphragm, and the 4th lens group which
`
`has forward refractive power function advantageously, in order to satisfy
`
`PETfSU bar conditions. Moreover, enlargement of the overall length of
`
`a
`
`catadioptric
`
`projection
`
`optical
`
`system
`
`IS
`
`avoidable.
`
`25
`
`[0021]
`Moreover, a catadioptric projection optical system according to claim 7
`
`11
`
`14
`
`
`
`JP2003-364596
`
`The mirror arranged in the location where the light injected from said 1 st
`
`plane in said at least six mi~ors separated from the optical axis of this
`
`catadioptric projection optical system most is a mirror of a concave
`
`surface configuration. When said aperture diaphragm is arranged
`
`5
`
`between the mirror of said concave surface configuration, and said 2nd
`
`plane and M and said distance of the 1 st plane and said 2nd plane are set
`
`to L for the optical-axis top distance of the mirror of said concave
`
`surface configuration, and said 2nd plane,
`
`0.2 < MIL < 0.7
`
`10
`
`It is characterized by satisfying the above condition.
`
`[0022]
`
`According to this catadioptric projection optical system according to
`
`claim 7, since MIL is larger than 0.2, mechanical interference with the
`
`mirror of the concave surface configuration arranged in the location most
`
`15
`
`distant from the optical axis of a catadioptric projection optical system,
`
`and the 1 st lens group, the 2nd lens group and the 3rd lens group is
`
`avoidable. Moreover, since MIL is smaller than 0.7, expanding-izing and
`
`enlargement of the overall length of a catadioptric projection optical
`
`system
`
`[0023]
`
`20
`
`are
`
`avoidable.
`
`Moreover, a catadioptric projection optical system according to claim 8
`
`is characterized by said 2nd lens group and said 4th lens group having at
`
`least one aspheric lens.
`
`[0024]
`
`25
`
`Since at least one of the optical elements which constitute the 2nd lens
`
`group and the 4th lens group has an aspheric surface-like lens according
`
`12
`
`15
`
`
`
`1P2003-364596
`
`to this catadioptric projection optical system according to claim 8,
`
`aberration amendment can be performed easily and enlargement of the
`
`overall length of a catadioptric projection optical system can be avoided.
`
`Therefore, when numerical aperture by the side of a body and an image
`
`5
`
`is enlarged, the good imaging engme performance can be obtained
`
`throughout
`
`the
`
`inside
`
`of
`
`an
`
`exposure
`
`field.
`
`[0025]
`
`Moreover, a catadioptric projection optical system according to claim 9
`
`The lens side by the side of said 1 st plane of the lens most located in said
`
`10
`
`2nd plane side among the lenses contained in said catadioptric projection
`
`optical system has forward refractive power. It is characterized by
`
`making a intermediate with a bigger refractive index than 1.1 intervene
`
`in the optical path between the lens located in the 2nd plane side of this
`
`account of the foremost, and said 2nd plane, when setting the refractive
`
`15
`
`index of the ambient atmosphere in said catadioptric projection optical
`
`system to 1.
`
`[0026]
`
`Since according to this catadioptric projection optical system according
`
`to claim 9 the intermediate which has a bigger refractive index than 1.1
`
`20
`
`is made to intervene in the optical path between the lens of a catadioptric
`
`projection optical system most located in the 2nd plane side, and the 2nd
`
`plane and the wavelength of the exposure light in the inside of a
`
`intermediate increases lin time in air when it sets the refractive index of
`
`a
`
`intermediate
`
`to
`
`n,
`
`resolution
`
`can
`
`be
`
`raised.
`
`25
`
`[0027]
`
`Moreover, the optical axis of all the optical elements that a catadioptric
`
`13
`
`16
`
`
`
`JP2003-364596
`
`projection optical system according to claim lOis included in said
`
`catadioptric projection optical system, and have predetermined refractive
`
`power is substantially arranged on a single straight line, and the field of
`
`the image formed on said 2nd plane of said catadioptric projection
`
`5
`
`optical system is characterized by being the field outside a shaft which
`
`does
`
`[0028]
`
`not
`
`include
`
`said
`
`optical
`
`axIS.
`
`Since the optical axis of all the optical elements contained in a
`
`catadioptric projection optical system is substantially arranged on the
`
`10
`
`single straight line according to this catadioptric projection optical
`
`system according to claim 10, in case a catadioptric projection optical·
`
`system is manufactured, manufacture difficulty can be mitigated, and
`
`relative adjustment of each optical member can be performed easily.
`
`[0029]
`
`15
`
`Moreover, a catadioptric projection optical system according to claim 11
`
`is characterized by being the 3 times imaging optical system which
`
`forms said 1 st intermediate image said whose catadioptric projection
`
`optical system is said intermediate image of the 1 st plane, and said 2nd
`
`intermediate image which is an image of said 1 st intermediate image into
`
`20
`
`the optical path between said 1st plane and said 2nd plane.
`
`[0030]
`
`According to this catadioptric projection optical system according to
`
`claim 11, the image with which the inverted image of the 1 st plane and
`
`the 2nd intermediate image are formed in the erect image of the 1 st plane
`
`25
`
`and the 2nd plane for the 1 st intermediate image since it is 3 times
`
`imaging optical system turns into an inverted image. Therefore, when a
`
`14
`
`17
`
`
`
`JP2003-364596
`
`catadioptric projection optical system is carried in an exposure apparatus
`
`and it exposes by scanning the 1 st plane and the 2nd plane, the scanning
`
`direction of the 1 st plane and the scanning direction of the 2nd plane can
`
`be made into hard flow, and it can adjust easily so that change of the
`
`5
`
`center of gravity of the whole exposure apparatus may become small.
`
`Moreover, the oscillation of the catadioptric projection optical system
`
`produced when the center of gravity of the whole exposure apparatus
`
`changes can be mitigated, and the good imaging engine performance can
`
`be obtained throughout the inside of an exposure field.
`
`10
`
`[0031]
`
`Moreover, an exposure apparatus according to claim 12 is equipped with
`
`a catadioptric projection optical system given in any 1 term of claim 1
`
`thruIor claim 11, and the illumination-light study system for illuminating
`
`the mask arranged at said 1 st plane, and is characterized by exposing the
`
`15
`
`pattern formed on said mask through said catadioptric projection optical
`
`system to the photosensitive substrate arranged at said 2nd plane.
`
`[0032]
`
`According to this exposure apparatus according to claim 12, since it has
`
`the catadioptric projection optical system with large compact and
`
`20
`
`numerical aperture, a detailed pattern can be exposed good on a
`
`photosensitive substrate.
`
`[0033]
`
`Moreover, the exposure approach according to claim 13 is characterized
`
`by including the exposure process which exposes the pattern of said
`
`25
`
`mask arranged at said 1 st plane to the photosensitive substrate arranged
`
`at said 2nd plane using a catadioptric projection optical system given in
`
`15
`
`18
`
`
`
`JP2003-364596
`
`the lighting process which illuminates the mask with which the
`
`predetermined pattern was formed, and anyone of claims 1 to 11.
`
`[0034]
`
`Since it exposes with an exposure apparatus including a catadioptric
`
`5
`
`projection optical system with large compact and numerical aperture
`
`according to this exposure approach according to claim 13, a detailed
`
`pattern can be exposed good.
`
`[Effects of the Invention]
`
`[0035]
`
`10
`
`The projection optical system according to the present invention
`
`comprises at least six mirrors, and thus the fIrst intermediate image and
`
`the second intermediate image can be formed without increase in the
`
`total length of the catadioptric projection optical system, even in the case
`
`where the object-side and image-side numerical apertures of the
`
`15
`
`catadioptric projection optical system are increased in order to enhance
`
`the resolution. Therefore, it is feasible to readily and securely achieve
`
`the optical path separation between the beam toward the fIrst surface and
`
`the beam toward the second surface. Since the projection optical system
`
`is provided with at least six mirrors and the second lens unit having the
`
`20
`
`negative refracting power, the Petzval's condition can be readily met and
`
`correction for aberration can be readily made, through the adjustment of
`
`each mirror or each lens forming the second lens unit, or the like.
`
`[0036] The projection optical system according to the present invention
`
`is the thrice-imaging optical system, whereby the fIrst intermediate
`
`25
`
`image is an inverted image of the fIrst surface, the second intermediate
`
`image an erect image of the fIrst surface, and the image formed on the
`
`16
`
`19
`
`
`
`JP2003-364596
`
`second surface an inverted image. Therefore, in the case where the
`
`catadioptric projection optical system of the present invention is
`
`mounted on the exposure apparatus and where the exposure is carried out
`
`with scanning of the first surface and the second surface, the scanning
`
`5
`
`direction of the first surface can be made opposite to that of the second
`
`surface and it is feasible to readily achieve such adjustment as to
`
`decrease the change in the center of gravity of the entire exposure
`
`apparatus. By reducing the change in the center of gravity of the entire
`
`exposure apparatus, it is feasible to reduce the vibration of the
`
`10
`
`catadioptric projection optical system and to achieve good imaging
`
`performance throughout the entire region in the exposure area.
`
`[0037] Moreover, according to the exposure apparatus of this invention,
`
`since it has a catadioptric projection optical system with large compact
`
`and numerical aperture, a detailed pattern can be exposed good on a
`
`15
`
`photosensitive substrate.
`
`[0038]
`
`Moreover, according to the exposure method of the present invention,
`
`since it exposes with an exposure apparatus having a catadioptric
`
`projection optical system with large compact and numerical aperture
`
`20
`
`according to the exposure approach of this invention, a detailed pattern
`
`can be exposed good.
`
`[Best Mode for Carrying Out the Invention]
`
`[0039]
`
`The fifth example of the present invention will be described below with
`
`25
`
`reference to the drawing. Fig. 1 is an illustration showing a lens
`
`configuration of the catadioptric projection optical system according to
`
`17
`
`20
`
`
`
`JP2003-364596
`
`the first example of the present invention. The catadioptric projection
`
`optical system PL 1 of the fifth example is comprised of the following
`
`optical systems in order from the object side (i.e., the reticle Rl side): a
`
`first imaging optical system G 1 for forming a first intermediate image
`
`5
`
`and a second intermediate image of the reticle Rl located on the first
`
`surface; and a second imaging optical system G2 for relaying the second
`
`intermediate image of the reticle Rl onto a wafer (not shown) located on
`
`the second surface.
`
`[0040]
`
`10
`
`The first imaging optical system G 1 is composed of a lens unit with a
`
`positive refracting power (field lens unit) GIl, and after-described six
`
`reflecting mirrors MI-M6. The lens unit GIl functions to correct for
`
`distortion and others and to make the optical system telecentric on the
`
`reticle Rl side. The lens unit GIl functions to keep the size of the image
`
`15
`
`of the reticle Rl unchanged even if the reticle Rl is placed with
`
`deviation from the desired position in the direction of the optical axis
`
`AXl; therefore, the performance of the catadioptric projection optical
`
`system PL 1 can be maintained high.
`
`[0041]
`
`20
`
`The second imaging optical system G2 is entirely composed of
`
`transmitting optical elements and is composed of a lens unit with a
`
`positive refracting power (fITSt lens unit) G21, a lens unit with a negative
`
`refracting power (second lens unit) G22, a lens unit with a positive
`
`refracting power (third lens unit) G23, an aperture stop ASl, and a lens
`
`25
`
`unit with a positive refracting power (fourth lens unit) G24. Since the
`
`second imaging optical system G2
`
`is entirely composed of the
`
`18
`
`21
`
`
`
`JP2003-364596
`
`transmitting optical elements, it is free of the load of optical path
`
`separation;
`
`therefore,
`
`the
`
`image-side numerical aperture of the
`
`catadioptric projection optical system PL 1 can be set large and a reduced
`
`image can be fonned at a high reduction rate on the wafer located on the
`
`5
`
`second surface. The lens units G21-G24 advantageously function for
`
`satisfying the Petzval's condition. The configuration of the lens units
`
`G21-G24 is able to avoid an increase in the total length of the
`
`catadioptric projection optical system PLI. The lens units G21-G23 are
`
`effective to correction for various aberrations such as coma.
`
`10
`
`[0042]
`
`Here the lens unit Gil is composed of the following components in
`
`order of passage of rays from the object side (reticle Rl side): a plane(cid:173)
`
`parallel plate L 1; a positive meniscus lens L2 whose concave surface of
`
`aspherical shape is kept toward the object; a biconvex lens L3; and a
`
`15
`
`biconvex lens L4. The beam transmitted by the biconvex lens L4 is
`
`reflected by the concave reflecting mirror Ml whose concave surface of
`
`aspherical shape is kept toward the object, the convex reflecting mirror
`
`M2 whose convex surface of a
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