`571-272-7822
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`Paper 10
`Entered: December 16, 2013
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`UNITED STATES PATENT AND TRADEMARK OFFICE
`____________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`____________
`
`
`CARL ZEISS SMT GMBH
`Petitioner
`
`v.
`
`NIKON CORPORATION
`Patent Owner
`
`
`
`Case IPR2013-00362
`Patent 7,348,575 B2
`
`
`
`Before HOWARD B. BLANKENSHIP, SALLY C. MEDLEY, and
`MATTHEW R. CLEMENTS, Administrative Patent Judges.
`
`
`CLEMENTS, Administrative Patent Judge.
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`
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`
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`
`
`DECISION
`Institution of Inter Partes Review
`37 C.F.R. § 42.108
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`Case IPR2013-00362
`Patent 7,348,575 B2
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`I.
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`INTRODUCTION
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`Carl Zeiss SMT GmbH (“Carl Zeiss”) filed a petition requesting inter partes
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`review of claims 1–3, 8–12, 16–20, 23–26, and 29–33 of U.S. Patent No.
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`7,348,575 B2 (Ex. 1001, “the ’575 patent”). Paper 3 (“Pet.”). The patent owner,
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`Nikon Corporation (“Nikon”), did not file a preliminary response. We have
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`jurisdiction under 35 U.S.C. § 314.
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`The standard for instituting an inter partes review is set forth in 35 U.S.C.
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`§ 314(a), which provides as follows:
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`THRESHOLD.—The Director may not authorize an inter partes
`review to be instituted unless the Director determines that the
`information presented in the petition filed under section 311 and any
`response filed under section 313 shows that there is a reasonable
`likelihood that the petitioner would prevail with respect to at least 1 of
`the claims challenged in the petition.
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`Upon consideration of the petition, we determine that the information
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`presented by Carl Zeiss establishes that there is a reasonable likelihood that Carl
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`Zeiss would prevail in showing unpatentability of claims 1–3, 8–12, 16–20, 23–26,
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`and 29–33 of the ’575 patent. Accordingly, pursuant to 35 U.S.C. § 314, we
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`institute an inter partes review for claims 1–3, 8–12, 16–20, 23–26, and 29–33 of
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`the ’575 patent.
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`A. Related Proceedings
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`Seven applications claim benefit under 35 U.S.C. § 120 to the application
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`that issued as the ’575 patent: 11/513,160 (pending); 11/583,934 (issued as U.S.
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`Patent No. 7,309,870 ); 11/583,916 (issued as U.S. Patent No. 7,312,463 );
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`11/882,208 (abandoned); 12/379,415 (pending); 12/884,332 (abandoned); and
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`13/275,760 (pending). Pet. 1-2. United States Patent No. 7,309,870 has been the
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`subject of four interference proceedings. Id. Carl Zeiss also has filed another
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`petition for inter partes review of claims 55–67 of the ’575 patent: IPR2013-
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`00363. In addition to these identified related proceedings, Nikon indicates that
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`U.S. Patent Application No. 13/889,780 may affect, or may be affected by, a
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`decision in this inter partes review. Paper 8.
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`B. The ’575 Patent
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`The subject matter of the ’575 patent relates to a catadioptric projection
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`optical system, exposure apparatus, and exposure method and, more particularly, to
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`a high-resolution catadioptric projection optical system suitable for use in
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`production of semiconductor devices and liquid-crystal display devices by
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`photolithography. Ex. 1001, col. 1, ll. 18-23. In the production of semiconductor
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`devices, photolithography uses a projection exposure apparatus to project “an
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`image of a mask (or reticle) through a projection optical system onto a wafer (or a
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`glass plate or the like) coated with a photoresist or the like.” Ex. 1001, col. 1,
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`ll. 27–32. As the dimensions of semiconductor devices shrink, the projection
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`optical system of the projection exposure apparatus requires greater resolving
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`power (resolution). Ex. 1001, col. 1, ll. 32–36. In order to satisfy the requirements
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`for the resolving power of the projection optical system, it is necessary to shorten
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`the wavelength of illumination light (exposure light) and to increase the image-side
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`numerical aperture of the projection optical system. Ex. 1001, col. 1, ll. 37–41. It
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`was known to increase the numerical aperture by putting a medium with a high
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`refractive index, like a liquid, in the optical path between the projection optical
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`system and the image plane. Ex. 1001, col. 1, ll. 55–58. However, there were
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`known disadvantages to this approach. Ex. 1001, col. 1, ll. 59–67.
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`The ’575 patent discloses systems and methods to provide a relatively
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`compact projection optical system that is “corrected for various aberrations, such
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`as chromatic aberration and curvature of field, and is capable of securing a large
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`effective image-side numerical aperture while suppressing the reflection loss on
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`optical surfaces.” Ex. 1001, col. 2, ll. 3–9. A medium having a refractive index
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`larger than 1.1, such as deionized water, is interposed in the optical path between
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`the boundary lens and the image plane, thereby increasing the image-side
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`numerical aperture. Ex. 1001, col. 5, ll. 9–21. The projection optical system is
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`catadioptric, comprising at least two reflecting mirrors, in which every transmitting
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`member and every reflecting member with a refracting power are arranged along a
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`single optical axis and in which the projection optical system has an effective
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`imaging area that does not include the optical axis. Ex. 1001, col. 5, ll. 39–45. By
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`arranging the transmitting members and the reflecting members along a single axis,
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`the system is easier to produce than a system wherein the optical members are
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`arranged along multiple optical axes. Ex. 1001, col. 5, ll. 52–59.
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`C. Exemplary Claim
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`Claim 1 is representative and is reproduced below:
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`1. A catadiopt[ri]c projection optical system, which forms a reduced
`image of a first surface on a second surface, comprising:
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`at least two reflecting mirrors; and
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`a boundary lens whose surface on the first surface side has a
`positive refractive power,
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`wherein where a refractive index of an atmosphere in an optical
`path of the projection optical system is 1, an optical path between the
`boundary lens and the second surface is filled with a medium having a
`refractive index la[r]ger than 1.1,
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`wherein every transmitting member and every reflecting
`member with a refractive power constituting the projection optical
`system are arranged along a single optical axis; and
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`the projection optical system having an effective imaging area
`of a predetermined shape not including said optical axis.
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`D. Prior Art Relied Upon
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`Carl Zeiss relies on the following prior art references, as well as the
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`declaration of Richard C. Juergens (Ex. 1016):
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`Suwa
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`US 5,825,043
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`Oct. 20, 1998 Ex. 1009
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`Terasawa US 2002/0024741 A1
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`Feb. 28, 2002 Ex. 1008
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`Fukami1 WO 99/49504
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`Takahashi2 WO 02/035273
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`Sept. 30, 1999 Ex. 1012
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`May 2, 2002
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`Ex. 1007
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`Suenaga
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`EP 1 069 448 B1
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`Mar. 19, 2003 Ex. 1027
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`
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`1 Fukami is a Japanese language document. Ex. 1012. Unless indicated otherwise,
`all subsequent references to Fukami in this decision will refer to its certified
`English language translation. Ex. 1015.
`2 Takahashi is a Japanese language document. Ex. 1007. Unless indicated
`otherwise, all subsequent references to Takahashi in this decision will refer to its
`publication in English by the European Patent Office as EP 1 336 887 A1. Ex.
`1014. Patent Owner admitted that EP 1 336 887 A1 is the English publication of
`WO 02/035273. Ex. 1026 at 35-36 (material facts 130 and 131, Admitted).
`5
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`Asai
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`Satori Asai et al., “Resolution
`Limit for Optical Lithography
`Using Polarized Light
`Illumination,” 32 Jpn. J. Appl.
`Phys. 5863–5866 (1993)
`
`Switkes M. Switkes and M. Rothschild,
`“Resolution Enhancement of
`157 nm Lithography by Liquid
`Immersion,” 4691 Proc. SPIE
`pp. 460–465 (2002)
`
`Ulrich
`
`Willi Ulrich et al., “The
`Development of Dioptric
`Projection Lenses for DUV
`Lithography,” 4832 Proc. SPIE
`pp. 158–169 (2002)
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`Dec. 1993
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`Ex. 1013
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`2002
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`Ex. 1010
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`2002
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`Ex. 1011
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`Carl Zeiss refers to Suwa, Switkes, Ulrich, and Fukami collectively as the
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`“Immersion References.” Pet. 4.
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`E. The Alleged Grounds of Unpatentability
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`Carl Zeiss alleges that the challenged claims are unpatentable based upon the
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`following grounds:
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`Reference[s]
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`Takahashi and the
`Immersion References
`Terasawa and the
`Immersion References
`Takahashi, the
`Immersion References,
`and Suenaga
`
`Basis
`
`§ 103
`
`§ 103
`
`§ 103
`
`Claims challenged
`
`1–3, 10, 16–20, 24, 25, 29,
`31–33
`1–3, 8–12, 16–20, 23–26,
`29, 31–33
`26
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`6
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`Takahashi, the
`Immersion References,
`and Asai
`Terasawa, the Immersion
`References, and Asai
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`§ 103
`
`§ 103
`
`30
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`30
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`F. Effective Filing Date
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`The ’575 patent is a continuation-in-part of application No.
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`PCT/JP2004/006417, which was filed on May 6, 2004. Ex. 1001, cover page. All
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`of the patents and publications that Carl Zeiss relies upon are dated more than one
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`year before May 6, 2004. Thus, based on the record before us, all of the patents
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`and publications that Petitioner relies upon are prior art.
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`II. ANALYSIS
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`A. Claim Construction
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`In an inter partes review, claim terms in an unexpired patent are interpreted
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`according to their broadest reasonable construction in light of the specification of
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`the patent in which they appear. 37 C.F.R. § 42.100(b); Office Patent Trial
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`Practice Guide, 77 Fed. Reg. 48756, 48766 (Aug. 14, 2012). Also, claim terms are
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`given their ordinary and customary meaning, as would be understood by one of
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`ordinary skill in the art in the context of the entire disclosure. In re Translogic
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`Tech., Inc., 504 F.3d 1249, 1257 (Fed. Cir. 2007).
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`Carl Zeiss contends that the words in the challenged claims generally should
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`have their plain meaning. Pet. 13. However, Carl Zeiss provides its own
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`interpretations of five terms—“boundary lens,” “a refractive index . . . is 1,”
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`“effective imaging area,” “every effective imaging area,” and “the second imaging
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`optical system.” Pet. 13–15. For this decision, we construe each of these claim
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`terms in turn.
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`1. “boundary lens” (claim 1)
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`Carl Zeiss contends that “when an immersion liquid is introduced between
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`the last lens element of the projection optical system and the wafer (as in limitation
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`[1d]), the last lens element becomes a ‘boundary lens.’” Pet. 14. This is consistent
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`with the use of the term “boundary lens” in the ’575 patent. See, e.g., Ex. 1001,
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`col. 20, ll. 45-49 (“FIG. 3 is an illustration schematically showing a configuration
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`between the boundary lens and the wafer in the first example of the present
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`embodiment.”), Figs. 3, 4, 5, 7 (each depicting boundary lens Lb as the last lens
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`element). On this record, we determine that the broadest reasonable interpretation
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`for “boundary lens” is “the last lens element of the projection optical system.”
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`2. “a refractive index . . . is 1” (claim 1)
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`Carl Zeiss contends that “a refractive index . . . is 1” should be interpreted as
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`“equal to 1 to within at least the first decimal place.” Pet. 14. We understand
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`“equal to 1 within at least the first decimal place” to mean that the refractive index
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`may be any number ranging between 1.0 and 1.01. Carl Zeiss’s proposal is
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`consistent with the ’575 patent’s use of the first decimal place later in claim 1
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`(“having a refractive index la[r]ger than 1.1”). Specifically, the use of the first
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`decimal place—i.e., “1.1”—elsewhere in the claim implies that the recited “1”
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`means “1.0;” otherwise the first decimal place—i.e., the first digit to the right of
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`the decimal—would have been specified there as well. Carl Zeiss’s proposal is
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`also consistent with the examples in the specification of the atmosphere in the
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`projection optical system being an inert gas, such as helium or nitrogen, which has
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`a refractive index close to, but not exactly, equal to 1. Ex. 1001, col. 20, ll. 24-44;
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`see also Ex. 1016 ¶¶ 86-92. On this record, we determine that “a refractive index
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`. . . is 1” means “a refractive index . . . equal to 1 within at least the first decimal
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`place, e.g., any number ranging between 1.0 and 1.01”
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`3. “effective imaging area” (claim 1)
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`Carl Zeiss contends that “effective imaging area” should be interpreted to
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`mean the same thing as “effective exposure area” and “effective exposure region
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`ER.” Pet. 15. The ’575 patent states that “FIG. 2 is an illustration showing a
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`positional relation between the optical axis and an effective exposure area of
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`arcuate shape,” and that “an effective exposure region (effective imaging area) ER
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`is set in an arcuate shape . . . .” Ex. 1001, col. 19, l. 65 to col. 20, l. 9. Thus, based
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`on our review of the specification of the ’575 Patent, we agree that these terms are
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`used interchangeably.
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`4. “every effective imaging area” (claim 18)
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`Carl Zeiss contends that “every effective imaging area” should be
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`interpreted to mean “the effective imaging area formed on the second surface as
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`the final image, as well as effective imaging areas corresponding to any
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`intermediate images.” Pet. 15. The term “every effective imaging area” is not
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`used in the ’575 patent outside of claim 18. As support for its position, Carl Zeiss
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`cites only to the Declaration of Richard C. Juergens. Id., citing Ex. 1016 ¶ 93. The
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`’575 patent describes an “effective imaging area” and describes “intermediate
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`images,” but does not describe “effective imaging areas corresponding to any
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`intermediate images.” Specifically, the “effective imaging area” is the arcuate
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`shape formed on a wafer, as depicted in Figure 2.
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`Ex. 1001, Fig. 2, col. 19, l. 65 to col. 20, l. 23. In contrast, “intermediate images”
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`are images of the reticle formed on various components of the first imaging optical
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`system and second imaging optical system. See e.g. Ex. 1001, col. 21, ll. 56-67.
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`Because the ’575 patent refers only to an area on a wafer as the “effective imaging
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`area,” and never once refers to an intermediate image as having a corresponding
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`effective imaging area, Carl Zeiss has not presented sufficient and credible
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`evidence that patentee intended “every effective imaging area” to encompass
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`“effective imaging areas corresponding to any intermediate images.” Based on our
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`review of the Specification, “every effective imaging area” refers to all of the
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`effective imaging areas of the claimed projection optical system, of which there is
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`only one: the “effective imaging area” recited in claim 1. We, therefore, construe
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`“every effective imaging area” as commensurate in scope with the “effective
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`imaging area” recited in claim 1.
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`5. “the second imaging optical system” (claim 25)
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`Carl Zeiss contends that “the second imaging optical system” should be
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`interpreted to mean the “second lens unit” recited in claim 10. Pet. 15–16. We
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`disagree. Claim 25 recites “wherein the second imaging optical system is a
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`dioptric system consisting of only a plurality of transmitting members.” Claim 25
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`depends from claims 1 and 10. However, neither claim 1 nor claim 10 recites a
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`“second imaging optical system.” The Specification of the ’575 patent is
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`ambiguous. The ’575 patent does not describe only a “second imaging optical
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`system” or only a “second lens unit” as “consisting of only a plurality of
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`transmitting members.” All described embodiments of the “second lens unit”
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`described in the ’575 patent “consist[] only of a plurality of transmitting
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`members.” Ex. 1001, Figs. 5, 7, 9, 14, 15, 16. Some, but not all, embodiments of
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`the “second imaging optical unit” are “dioptric systems consisting of only of a
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`plurality of transmitting members.” See, e.g., Ex. 1001, Fig. 5 (second imaging
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`optical system G2 consisting only of lenses), Fig. 7 (second imaging optical system
`
`G2 consisting only of lenses), Fig. 14 (second imaging optical system G2
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`consisting only of lenses), Fig. 15 (second imaging optical system G4 consisting
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`only of lenses), Fig. 16 (second imaging optical system G6 consisting only of
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`lenses). At least one embodiment of the “second imaging optical system” is not.
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`Ex. 1001, Fig. 9 (second imaging optical system G2 including two reflecting
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`mirrors M3 and M4).
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`Claims 20, 21, 22, 23, 24, and 26 all depend, directly or indirectly, on claim
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`19. Claim 19 recites a “first imaging optical system” and a “second imaging
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`optical system.” Claim 20 depends from claim 19 and defines further limitations
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`11
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`on the “first imaging optical system” recited in claim 19. In this context, claim
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`25’s recitation of “[t]he projection optical system according to claim 10” appears
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`to be a typographical error in which “10” should be “19” or “20.” On this record,
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`we construe “the second imaging optical system” to mean the “second imaging
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`optical system” recited in claim 19.
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`B. Claims 1-3, 8-12, 16-20, 23-26, 29, and 31-33 – Obvious over Terasawa and
`the Immersion References
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`Carl Zeiss alleges that claims 1-3, 8-12, 16-20, 23-26, 29, and 31-33 are
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`unpatentable under 35 U.S.C. § 103(a) over Terasawa and the Immersion
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`References. Pet. 31–50, 55–56. In light of the arguments and evidence, Carl Zeiss
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`has established a reasonable likelihood that 1–3, 8–12, 16–20, 23–26, 29, and 31–
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`33 are unpatentable as obvious over Terasawa and the Immersion References.
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`Terasawa describes a projection optical system and a projection exposure
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`apparatus for projecting a pattern of a mask onto a substrate through the projection
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`optical system. Ex. 1008 ¶ 0001. Figure 1 of Terasawa, reproduced below, depicts
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`a catadioptric projection optical system including a first imaging system G1 and a
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`second imaging system G2 for projecting an image of reticle 101 illuminated with
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`illumination system (not shown) onto wafer 102:
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` Figure 1 of Terasawa depicts a catadioptric projection optical system. Ex. 1008 ¶¶
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`55, 102, 103. “The first imaging optical system G1 comprises, in order from the
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`object side, at least a first mirror M1, having a refracting element L1, [and] a
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`second mirror M2.” Ex. 1008 ¶ 103. Light from reticle 101 is imaged by first
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`imaging optical system G1, whereby intermediate image Io is formed. Id.
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`Intermediate image Io, as imaged by first imaging optical system G1, is then
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`imaged on wafer 102 by second imaging optical system G2, comprising a
`
`refracting element, at a predetermined magnification. Id. In the structure
`
`described above, the optical system of the first embodiment has one optical axis
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`103, and produces a multiple-number imaging optical system wherein abaxial
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`light, without light interception of a pupil, is imaged. Id. With the structure
`
`described above, light can be directed to the second imaging optical system
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`without a void in a pupil and without bend of the optical axis. Ex. 1008 ¶ 105.
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`The region of the object plane from which the light reaches the image plane, and
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`which is attributable to the imaging, is a semi-arcuate zone. Ex. 1008, FIG. 3 ¶
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`117.
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`Carl Zeiss acknowledges that Terasawa does not disclose expressly “an
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`optical path between the boundary lens and the second surface is filled with a
`
`medium having a refracting index larger than 1.1,” as recited in claim 1. Pet. 34,
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`55. For that limitation, Carl Zeiss cites to the Immersion References (Suwa,
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`Switkes, Ulrich, and Fukami). Pet. 36, 44–50, 55–56.
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`Suwa describes “a means for improving the resolution without largely
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`increasing the numerical aperture of the projection optical system,” in which “an
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`immersion projection method may be used in which the space between the wafer
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`and the projection optical system is filled with a liquid.” Ex. 1009, col. 3, ll. 18–
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`23. Specifically:
`
`In this immersion projection method, the air space between the wafer
`and the optical element constituting the projection optical system on
`the projection end side (image plane side) is filled with a liquid having
`a refractive index close to the refractive index of the photoresist layer,
`to increase the effective numerical aperture of the projection optical
`system seen from the wafer side, i.e. improving the resolution. This
`immersion projection method is expected to attain good imaging
`performance by selecting the liquid used.
`
`Ex. 1009, col. 3, ll. 24–33. Figure 9 of Suwa is reproduced below:
`
`Figure 9 of Suwa depicts a projection optical system (PL) with an immersion fluid
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`(LQ). Ex. 1009, col. 23, ll. 59-65. Suwa discloses that the last lens element, LE1,
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`is a “positive lens element [] having a flat lower surface Pe and a convex upper
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`surface,” and “is fixed on the end of the projection lens system PL inside the lens
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`barrel.” Ex. 1009, 23:9–11. Suwa also discloses that the projection optical system
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`can be catadioptric. Ex. 1009, 20:13–21. Carl Zeiss acknowledges that Suwa does
`
`not disclose expressly that the liquid has a refractive index greater than 1.1, but
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`contends that:
`
`[A person of ordinary skill in the art] would know that “a refractive
`index close to the refractive index of the photoresist” would be a
`refractive index greater than 1.1. For example, U.S. Patent No.
`4,346,164 (“Tabarelli”), to which the passage from Suwa cited above
`expressly refers, identifies the refractive index of the photoresist as
`1.6, and goes on to list nine immersion liquids with refractive indices
`between 1.5 and 1.66. (ZEISS 1016; ¶¶ 199-201; ZEISS 1025, 3:57-
`60, 5:36-50.)
`
`Pet. 45. We are persuaded by Carl Ziess’s reasoning.
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`Switkes teaches that immersion lithography can be used to enhance
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`resolution by increasing numerical aperture and also can be used to increase depth
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`of focus. Ex. 1010, p.459 (“Immersion lithography is a technique which can
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`enhance the resolution of projection lithography by permitting exposures with
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`numerical aperture (NA) greater than one, the theoretical maximum for
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`conventional ‘dry’ systems. . . . Liquid immersion also increases the wafer depth of
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`focus, i.e. the tolerable error in the vertical position of the wafer, by the index of
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`the immersion liquid compared to a dry system with the same numerical
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`aperture.”) (footnotes omitted). Switkes describes several immersion liquids for
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`use at 157nm and 193nm whose refractive indexes are greater than 1.2. Ex. 1010,
`
`p.461. Switkes describes how immersion can be used with “much of conventional
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`designs.” Ex. 1010, p.461.
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`Ulrich describes the application of immersion lithography to prior art “dry”
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`designs to achieve increased numerical aperture. Ex. 1011, p.166–167. Ulrich
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`expressly teaches that “immersion designs can be applied to other design concepts
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`such as catadioptric designs with similar results.” Ex. 1011, p.167. Thus, Carl
`
`Zeiss contends that “Ulrich demonstrates that the level of ordinary skill in this art
`
`is high and how, at the time of the alleged invention, there was not only express
`
`teaching to modify prior art ‘dry’ catadioptric projection optical system to include
`
`the immersion limitation to thereby increase NA, but also the skill necessary to do
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`so.” Pet. 48, citing Ex. 1016 ¶¶ 22–24, 77–81, 223–224.
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`Fukami describes the use of liquid immersion to improve the resolution of
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`conventional projection exposure apparatuses. Ex. 1015, 3, ll. 13-28.3 Fukami
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`expressly describes the applicability of immersion techniques to a catadioptric
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`optical projection system having two mirrors and a single optical axis. Ex. 1015,
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`21, ll. 13–16 (“Furthermore, the projection optical system PL can be a dioptric,
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`catoptric, or catadioptric system, for example an optical system which has a
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`plurality of dioptric elements and two catoptric elements (at least one of which is a
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`concave mirror) disposed on an optical axis extending straight without being bent .
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`. . .”).
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`We are persuaded by Carl Ziess’s reasoning that the Immersion References
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`(Suwa, Switkes, Ulrich, and Fukami) collectively teach “an optical path between
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`the boundary lens and the second surface is filled with a medium having a
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`refracting index larger than 1.1,” as recited in claim 1.
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`3 Pages numbers refer to the bottom number on the page.
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`Finally, we are persuaded by Carl Zeiss’s reasoning that a person of ordinary
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`skill in the art would have been motivated to modify Terasawa to include the
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`immersion limitation in view of the Immersion References in order to “minimize
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`field curvature, avoid a pupil obscuration, and produce simple single barrel
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`structures.” Pet. 55; see also Pet. 51-54.
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`For the foregoing reasons, Carl Zeiss has established a reasonable likelihood
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`that it would prevail in showing that claims 1, 29, 32, and 33 are unpatentable as
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`obvious over Terasawa and the Immersion References. We also are persuaded by
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`Carl Zeiss’s arguments and evidence for the dependent claims proposed as
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`unpatentable as obvious over Terasawa and the Immersion References.
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`C. Claim 30 – Obvious over Terasawa, the Immersion References, and Asai
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`Carl Zeiss alleges that claim 30 is unpatentable under 35 U.S.C. § 103(a)
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`over Terasawa, the Immersion References, and Asai. Pet. 59–60. In light of the
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`arguments and evidence, Carl Zeiss has established a reasonable likelihood that
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`claim 30 is unpatentable as obvious over Terasawa, the Immersion References, and
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`Asai.
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`Claim 30 depends from claim 29. Claim 29 is directed to “[a]n exposure
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`apparatus” comprising “the projection optical system according to claim 1.” As
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`discussed above, Carl Zeiss has established a reasonable likelihood that Terasawa
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`and the Immersion References render obvious the subject matter of claim 29.
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`Carl Zeiss acknowledges that Terasawa does not disclose expressly
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`“illumination light which is s-polarized with respect to the second surface,” as
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`recited in claim 30. Pet. 58. Asai describes the use of S-polarized light in a high-
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`numerical-aperture optical stepper system. Ex. 1013, Abstract. Specifically, Asai
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`describes how “[l]ight polarized parallel to the plane of incidence, or P
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`polarization, gives lower contrast images than light polarized perpendicular to the
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`plane of incidence, or S polarization, because destructive interference between
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`diffracted waves does not occur when the electric-field vectors are perpendicular.”
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`Ex. 1013, p.5863 (footnotes omitted). Petitioner contends that:
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`[I]t would have been obvious for a POSITA at the time of the alleged
`invention to provide s-polarized illumination at the wafer in the projection
`exposure apparatus of Terasawa to improve the contrast of the image at the
`wafer for the same reasons as those set forth supra in section IX with respect
`to Takahashi because Asai teaches the benefits of using such s-polarized
`illumination. (ZEISS 1016, ¶¶ 22-24, 77-81, 250-254, 256; ZEISS 1013, p.
`5863, abstract and intro.)
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`Pet. 59–60. We are persuaded by Carl Ziess’s reasoning.
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`For the foregoing reasons, Carl Zeiss has established a reasonable likelihood
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`that it would prevail in showing that claim 30 is unpatentable as obvious over
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`Terasawa, the Immersion References, and Asai.
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`D. Other Grounds
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`Carl Zeiss also asserts the following grounds of unpatentability:
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`1. Claims 1–3, 10, 16–20, 24, 25, 29, and 31–33 are unpatentable under 35
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`U.S.C. § 103 as obvious over Takahashi and the Immersion References;
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`2. Claim 26 is unpatentable under 35 U.S.C. § 103 as obvious over Takahashi,
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`the Immersion References, and Suenaga; and
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`3. Claim 30 is unpatentable under 35 U.S.C. § 103 as obvious over Takahashi,
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`the Immersion References, and Asai.
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`Pet. 19–31, 50–54, and 56–59. Those asserted grounds are denied as redundant in
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`light of the determination that there is a reasonable likelihood that the challenged
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`claims are unpatentable based on the grounds of unpatentability on which we
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`institute an inter partes review. See 37 C.F.R. § 42.108(a).
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`III. CONCLUSION
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`For the foregoing reasons, we determine that the information presented in
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`the petition establishes that there is a reasonable likelihood that Carl Zeiss would
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`prevail in establishing unpatentability of claims 1-3, 8-12, 16-20, 23-26, and 29-33
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`of the ’575 patent.
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`The Board has not made a final determination on the patentability of any
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`challenged claim.
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`Accordingly, it is
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`IV. ORDER
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`ORDERED that pursuant to 35 U.S.C. § 314, an inter partes review is
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`hereby instituted as to claims 1-3, 8-12, 16-20, 23-26, and 29-33 of the ’575 patent
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`on the following grounds:
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`1. Claims 1-3, 8-12, 16-20, 23-26, 29, and 31-33 under 35 U.S.C. § 103 as
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`obvious over Terasawa and the Immersion References;
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`2. Claim 30 under 35 U.S.C. § 103 as obvious over Terasawa, the Immersion
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`References, and Asai;
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`FURTHER ORDERED that all other grounds raised in Carl Zeiss’s petition
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`are denied because they are redundant in light of the grounds on the basis of which
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`an inter partes review is being instituted;
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`FURTHER ORDERED that pursuant to 35 U.S.C. § 314(d) and 37 C.F.R.
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`§ 42.4, notice is hereby given of the institution of a trial on the grounds of
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`unpatentability authorized above; the trial commences on the entry date of this
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`decision; and
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`FURTHER ORDERED that an initial conference call with the Board is
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`scheduled for 1:30 PM Eastern Time on January 8, 2014; the parties are directed to
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`the Office Patent Trial Practice Guide4 for guidance in preparing for the conference
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`call, and should be prepared to discuss any proposed changes to the Scheduling
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`Order entered concurrently herewith and any motion the parties anticipate filing
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`during the trial.
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`4 Office Patent Trial Practice Guide, 77 Fed. Reg. 48756, 48765-66 (Aug. 14,
`2012).
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`For PETITIONER:
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`Marc M. Wefers, Esq.
`Chris C. Bowley, Esq.
`Fish & Richardson, P.C.
`wefers@fr.com
`bowley@fr.com
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`
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`For PATENT OWNER:
`
`John S. Kern, Esq.
`Robert C. Mattson, Esq.
`Oblon Spivak
`CPdocketKern@oblon.com
`CPdocketMattson@oblon.com
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