`571-272-7822
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`Paper 41
`Entered: November 4, 2014
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`UNITED STATES PATENT AND TRADEMARK OFFICE
`____________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`____________
`
`CARL ZEISS SMT GMBH,
`Petitioner,
`
`v.
`
`NIKON CORPORATION,
`Patent Owner.
`
`
`Case IPR2013-00362
`Patent 7,348,575 B2
`
`
`
`Before HOWARD B. BLANKENSHIP, SALLY C. MEDLEY, and
`MATTHEW R. CLEMENTS, Administrative Patent Judges.
`
`
`CLEMENTS, Administrative Patent Judge.
`
`
`
`
`
`FINAL WRITTEN DECISION
`35 U.S.C. § 318(a) and 37 C.F.R. § 42.73
`
`
`
`
`IPR2013-00362
`Patent 7,348,575 B2
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`
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`I.
`
`INTRODUCTION
`
`Carl Zeiss SMT GmbH (“Carl Zeiss”) filed a Petition requesting inter
`
`partes review of claims 1–3, 8–12, 16–20, 23–26, and 29–33 of U.S. Patent
`
`No. 7,348,575 B2 (Ex. 1001, “the ’575 patent”). Paper 3 (“Pet.”). The
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`Patent Owner, Nikon Corporation (“Nikon”), did not file a Preliminary
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`Response. On December 16, 2013, we granted an inter partes review for all
`
`challenged claims on certain grounds of unpatentability. Paper 10 (“Dec. to
`
`Inst.”).
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`After institution of trial, Nikon filed a Patent Owner Response (Paper
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`19, “PO Resp.”) to which Carl Zeiss filed a Reply (Paper 22, “Reply”).
`
`Additionally, Nikon filed a Motion to Exclude Evidence (Paper 32), to
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`which Carl Zeiss responded (Paper 36). Nikon then filed a Reply in Support
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`of its Motion to Exclude. Paper 39.
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`Carl Zeiss also filed a Motion to Exclude Evidence (Paper 33), to
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`which Nikon responded (Paper 37). Carl Zeiss then filed a Reply in Support
`
`of its Motion to Exclude. Paper 38.
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`Oral hearing was held on July 17, 2014.1
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`The Board has jurisdiction under 35 U.S.C. § 6(c). This Final Written
`
`Decision is issued pursuant to 35 U.S.C. § 318(a) and 37 C.F.R. § 42.73.
`
`Carl Zeiss has shown by a preponderance of the evidence that claims
`
`1–3, 8–12, 16–20, 23–26, and 29–33 of the ’575 patent are unpatentable.
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`
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`1 A transcript of the oral hearing is included in the record as Paper 40
`(“Tr.”).
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`2
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`IPR2013-00362
`Patent 7,348,575 B2
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`A. The ’575 Patent
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`The subject matter of the ’575 patent relates to a catadioptric
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`projection optical system, exposure apparatus, and exposure method and,
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`more particularly, to a high-resolution catadioptric projection optical system
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`suitable for use in production of semiconductor devices and liquid-crystal
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`display devices by photolithography. Ex. 1001, 1:18–23. In the production
`
`of semiconductor devices, photolithography uses a projection exposure
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`apparatus to project an “image of a mask (or a reticle) through a projection
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`optical system onto a wafer (or a glass plate or the like) coated with a
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`photoresist or the like.” Id. at 1:27–32. As the dimensions of semiconductor
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`devices shrink, the projection optical system of the projection exposure
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`apparatus requires greater resolving power (resolution). Id. at 1:32–36. In
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`order to satisfy the requirements for the resolving power of the projection
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`optical system, it is necessary to shorten the wavelength of illumination light
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`(exposure light) and to increase the image-side numerical aperture of the
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`projection optical system. Id. at 1:37–41. It was known to increase the
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`numerical aperture by putting a medium with a high refractive index, like a
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`liquid, in the optical path between the projection optical system and the
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`image plane. Id. at 1:55–58. However, there were known disadvantages to
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`this approach. Id. at 1:59–67.
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`The ’575 patent discloses systems and methods to provide a relatively
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`compact projection optical system that is “corrected for various aberrations,
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`such as chromatic aberration and curvature of field, and being capable of
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`securing a large effective image-side numerical aperture while well
`
`suppressing the reflection loss on optical surfaces.” Id. at 2:3–9. A medium
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`3
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`IPR2013-00362
`Patent 7,348,575 B2
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`having a refractive index larger than 1.1, such as deionized water, is
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`interposed in the optical path between the boundary lens and the image
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`plane, thereby increasing the image-side numerical aperture. Id. at 5:9–21.
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`The projection optical system is catadioptric, comprising at least two
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`reflecting mirrors, in which every transmitting member and every reflecting
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`member with a refracting power are arranged along a single optical axis and
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`in which the projection optical system has an effective imaging area that
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`does not include the optical axis. Id. at 5:39–45. By arranging the
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`transmitting members and the reflecting members along a single axis, the
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`system is easier to produce than a system wherein the optical members are
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`arranged along multiple optical axes. Id. at 5:52–59.
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`B. Illustrative Claim
`
`Claim 1 is illustrative and is reproduced below:
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`1. A catadiopt[ri]c projection optical system, which forms a
`reduced image of a first surface on a second surface,
`comprising:
`
`at least two reflecting mirrors; and
`
`a boundary lens whose surface on the first surface side
`has a positive refractive power,
`
`wherein where a refractive index of an atmosphere in an
`optical path of the projection optical system is 1, an optical path
`between the boundary lens and the second surface is filled with
`a medium having a refractive index la[r]ger than 1.1,
`
`wherein every transmitting member and every reflecting
`member with a refractive power constituting the projection
`optical system are arranged along a single optical axis; and
`
`the projection optical system having an effective imaging
`area of a predetermined shape not including said optical axis.
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`4
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`IPR2013-00362
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`C. Prior Art Supporting the Instituted Challenges
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`Carl Zeiss relies on the following prior art references, as well as the
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`Declaration of Richard C. Juergens (Ex. 1016):
`
`Terasawa
`
`US 2002/0024741 A1
`
`Feb. 28, 2002 Ex. 1008
`
`US 5,825,043
`
`Oct. 20, 1998 Ex. 1009
`
`Suwa
`
`Switkes
`
`Ulrich
`
`M. Switkes & M. Rothschild,
`Resolution Enhancement of
`157 nm Lithography by
`Liquid Immersion, 4691
`PROC. SPIE 459–465 (2002)
`
`Willi Ulrich et al., The
`Development of Dioptric
`Projection Lenses for DUV
`Lithography, 4832 PROC.
`SPIE 158–169 (2002)
`
`2002
`
`Ex. 1010
`
`2002
`
`Ex. 1011
`
`Sept. 30,
`1999
`
`Ex. 1012
`
`Dec. 1993
`
`Ex. 1013
`
`Fukami2
`
`WO 99/49504
`
`Asai
`
`Satoru Asai et al., Resolution
`Limit for Optical Lithography
`Using Polarized Light
`Illumination, 32 JAPAN J.
`APPL. PHYS. 5863–5866
`(1993)
`
`Carl Zeiss refers to Suwa, Switkes, Ulrich, and Fukami collectively as
`
`the “Immersion References.” Pet. 4.
`
`
`
`2 Fukami is a Japanese language document. Ex. 1012. Unless indicated
`otherwise, all subsequent references to Fukami in this decision will refer to
`its certified English language translation. Ex. 1015.
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`5
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`D. The Instituted Challenges of Unpatentability
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`We instituted trial based on the following grounds of unpatentability:
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`References
`
`Basis Claim[s] challenged
`
`Terasawa and the
`Immersion References
`Terasawa, the Immersion
`References, and Asai
`
`§ 103 1–3, 8–12, 16–20, 23–26, 29, and
`31–33
`§ 103 30
`
`II. ANALYSIS
`
`A. Claim Construction
`
`In an inter partes review, claim terms in an unexpired patent are
`
`interpreted according to their broadest reasonable construction in light of the
`
`specification of the patent in which they appear. 37 C.F.R. § 42.100(b);
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`Office Patent Trial Practice Guide, 77 Fed. Reg. 48,756, 48,766 (Aug. 14,
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`2012). Also, claim terms are given their ordinary and customary meaning,
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`as would be understood by one of ordinary skill in the art in the context of
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`the entire disclosure. In re Translogic Tech., Inc., 504 F.3d 1249, 1257
`
`(Fed. Cir. 2007).
`
`Carl Zeiss contends that the words in the challenged claims generally
`
`should have their plain meaning. Pet. 13. However, Carl Zeiss provides its
`
`own interpretations of five terms—“boundary lens,” “a refractive index . . .
`
`is 1,” “effective imaging area,” “every effective imaging area,” and “the
`
`second imaging optical system.” Pet. 13–15. Nikon provides an
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`interpretation only for “boundary lens.” PO Resp. 16–19. For this decision,
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`we construe each of these claim terms in turn.
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`IPR2013-00362
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`1. “boundary lens” (claim 1)
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`Claim 1 requires a “boundary lens.” Carl Zeiss contends that “when
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`an immersion liquid is introduced between the last lens element of the
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`projection optical system and the wafer (as in limitation [1d]), the last lens
`
`element becomes a ‘boundary lens.’” Pet. 14. This is consistent with the
`
`use of the term “boundary lens” in the ’575 patent. See, e.g., Ex. 1001,
`
`20:45–49 (“FIG. 3 is an illustration schematically showing a configuration
`
`between the boundary lens and the wafer in the first example of the present
`
`embodiment.”) (emphasis removed), Figs. 3, 4, 5, 7 (each depicting
`
`boundary lens Lb as the last lens element). Accordingly, in the Decision to
`
`Institute, we construed “boundary lens” as “the last lens element of the
`
`projection optical system.” Dec. to Inst. 8.
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`Nikon contends that a “boundary lens” is not merely any lens that is
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`placed in contact with an immersion liquid, but rather “a lens of the
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`projection optical system that has a convex object-side surface and a flat
`
`image-side surface to increase effective NA in the presence of the immersion
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`liquid by reducing reflection loss.” PO Resp. 16 (citing Ex. 1001, 5:22–31,
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`Tables 1–11; Ex. 2024 ¶ 66). Nikon points to Figure 3 as depicting a
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`boundary lens, and argues that a person of ordinary skill in the art would
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`have understood that “a boundary lens needed to be designed to not only
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`isolate an atmosphere of the projection optical system, but also stand a
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`higher fluence from the light source and enable higher resolution by
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`reducing reflection losses.” Id. at 17–18.
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`Carl Zeiss counters that nothing in the portions of the ’575 patent
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`cited by Nikon constitutes lexicography or disavowal of the plain and
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`7
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`ordinary meaning of “boundary lens.” Reply 1–3. Claim 1 does not require
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`that the image-side surface be “flat,” and the passage at column 5, lines 22 to
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`31, merely describes what is “feasible” and “can be” secured. Id. Carl Zeiss
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`also argues that Nikon’s proposed construction does not make technical
`
`sense because, as even Nikon’s expert conceded, it is the whole system, not
`
`just the boundary lens, that increases effective NA when an immersion
`
`liquid is used between the boundary lens and the image plane. Id.
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`We are not persuaded that “boundary lens” should be construed to
`
`require “a convex object-side surface.” Claim 1 already requires that the
`
`“surface on the first surface side [of the boundary lens] has a positive
`
`refracting power.” To construe the term “boundary lens” to include this
`
`limitation would render this language of the claim limitation superfluous.
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`We also are not persuaded that “boundary lens” should be construed
`
`to require “a flat image-side surface.” Although Figure 3 depicts boundary
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`lens Lb with a flat image side, Figure 3 does not amount to a definition of
`
`“boundary lens.” With respect to Figure 3, the ’575 patent states that, “the
`
`boundary lens Lb in the first example has a convex surface kept toward the
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`reticle (first surface). In other words, the reticle-side surface Sb of the
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`boundary lens Lb has a positive refracting power.” Ex. 1001, 20:48–51.
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`The description of Figure 3 is silent, however, with respect to whether the
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`image-side surface must be flat. Id. at 20:45–54. Moreover, Nikon’s
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`reliance on column 5, lines 22 to 31, is unavailing because it describes only
`
`a “first aspect of the embodiment.” And in describing that aspect, as in
`
`describing Figure 3, the ’575 is silent with respect to whether the image-side
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`surface must be flat. It says only that, “the optical surface on the object side
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`8
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`(first surface side) of the boundary lens is provided with the positive
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`refracting power, whereby the reflection loss is reduced on this optical
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`surface and, in turn, the large effective image-side numerical aperture can be
`
`secured.” Id. at 5:23–27. Thus, whereas Nikon’s proposed construction
`
`would require a convex object-side surface and a flat image-side surface,
`
`this passage of the ’575 patent suggests that a boundary lens needs only a
`
`positive refracting power—i.e., convex object-side surface—to reduce
`
`reflection loss and, in turn, increase effective NA in the presence of an
`
`immersion liquid.
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`Finally we are not persuaded that “boundary lens” should be
`
`construed to include a purpose—i.e., “to increase effective NA in the
`
`presence of the immersion liquid by reducing reflection loss.” Although this
`
`purpose is referenced in column 5 of the ’575 patent, we decline to import a
`
`description of a “first aspect of the embodiment” into the construction of a
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`claim term.
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`Accordingly, we maintain our construction of “boundary lens” as “the
`
`last lens element of the projection optical system.”
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`2. “a refractive index . . . is 1” (claim 1)
`
`Carl Zeiss contends that “a refractive index . . . is 1” should be
`
`interpreted as “equal to 1 to within at least the first decimal place.” Pet. 14.
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`Carl Zeiss’s proposal is consistent with the ’575 patent’s use of the first
`
`decimal place later in claim 1 (“having a refractive index la[r]ger than 1.1”).
`
`Specifically, the use of the first decimal place—i.e., “1.1”—elsewhere in the
`
`claim implies that the recited “1” means “1.0;” otherwise the first decimal
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`place—i.e., the first digit to the right of the decimal—would have been
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`specified there as well. Carl Zeiss’s proposal is also consistent with the
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`examples in the Specification of the atmosphere in the projection optical
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`system being an inert gas, such as helium or nitrogen, which has a refractive
`
`index close to, but not exactly, equal to 1. Ex. 1001, 20:24–44; see also
`
`Ex. 1016 ¶¶ 86–92. Accordingly, we construe “a refractive index . . . is 1”
`
`as “a refractive index . . . equal to 1 within at least the first decimal place.”
`
`3. “effective imaging area” (claim 1)
`
`Carl Zeiss contends that “effective imaging area” should be
`
`interpreted to mean the same thing as “effective exposure area” and
`
`“effective exposure region ER.” Pet. 15. The ’575 patent states that “FIG. 2
`
`is an illustration showing a positional relation between the optical axis and
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`an effective exposure area of arcuate shape,” and that “an effective exposure
`
`region (effective imaging area) ER is set in an arcuate shape.” Ex. 1001,
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`19:65–20:9 (emphasis removed). Based on our review of the Specification,
`
`we agree that these terms are used interchangeably.
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`4. “every effective imaging area” (claim 18)
`
`Carl Zeiss contends that “every effective imaging area” should be
`
`interpreted to mean “the effective imaging area formed on the second
`
`surface as the final image, as well as effective imaging areas corresponding
`
`to any intermediate images.” Pet. 15. The term “every effective imaging
`
`area” is not used in the ’575 patent outside of claim 18. As support for its
`
`position, Carl Zeiss cites only to the Declaration of Richard C. Juergens. Id.
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`(citing Ex. 1016 ¶ 93). The ’575 patent describes an “effective imaging
`
`area” and describes “intermediate images,” but does not describe “effective
`
`imaging areas corresponding to any intermediate images.” Specifically, the
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`10
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`“effective imaging area” is the arcuate shape formed on a wafer, as depicted
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`in Figure 2, reproduced below.
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`
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`Ex. 1001, Fig. 2, 19:65–20:23. Figure 2 depicts the “effective imaging area”
`
`as an arcuate shape formed on a wafer. In contrast, “intermediate images”
`
`are images of the reticle formed on various components of the first imaging
`
`optical system and second imaging optical system. See, e.g., Ex. 1001,
`
`21:56–67. Because the ’575 patent refers only to an area on a wafer as the
`
`“effective imaging area,” and never once refers to an intermediate image as
`
`having a corresponding effective imaging area, Carl Zeiss has not presented
`
`sufficient and credible evidence that patentee intended “every effective
`
`imaging area” to encompass “effective imaging areas corresponding to any
`
`intermediate images.” Based on our review of the Specification, “every
`
`effective imaging area” refers to all of the effective imaging areas of the
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`claimed projection optical system, of which there is only one: the “effective
`
`imaging area” recited in claim 1. Accordingly, we construe “every effective
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`imaging area” as commensurate in scope with the “effective imaging area”
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`recited in claim 1.
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`5. “the second imaging optical system” (claim 25)
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`Carl Zeiss contends that “the second imaging optical system” should
`
`be interpreted to mean the “second lens unit” recited in claim 10. Pet. 15–
`
`16. We disagree. Claim 25 recites “wherein the second imaging optical
`
`system is a dioptric system consisting of only a plurality of transmitting
`
`members.” Claim 25 depends from claims 1 and 10. However, neither
`
`claim 1 nor claim 10 recites a “second imaging optical system.” The
`
`Specification is ambiguous. The ’575 patent does not describe only a
`
`“second imaging optical system” or only a “second lens unit” as “consisting
`
`of only a plurality of transmitting members.” All described embodiments of
`
`the “second lens unit” described in the ’575 patent “consist[] only of a
`
`plurality of transmitting members.” Ex. 1001, Figs. 5, 7, 9, 14, 15, 16.
`
`Some, but not all, embodiments of the “second imaging optical unit” are
`
`“dioptric systems consisting of only of a plurality of transmitting members.”
`
`See, e.g., Ex. 1001, Fig. 5 (second imaging optical system G2 consisting
`
`only of lenses), Fig. 7 (second imaging optical system G2 consisting only of
`
`lenses), Fig. 14 (second imaging optical system G2 consisting only of
`
`lenses), Fig. 15 (second imaging optical system G4 consisting only of
`
`lenses), Fig. 16 (second imaging optical system G6 consisting only of
`
`lenses). At least one embodiment of the “second imaging optical system” is
`
`not. Ex. 1001, Fig. 9 (second imaging optical system G2 including two
`
`reflecting mirrors M3 and M4).
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`Claims 20, 21, 22, 23, 24, and 26 all depend, directly or indirectly,
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`from claim 19. Claim 19 recites a “first imaging optical system” and a
`
`“second imaging optical system.” Claim 20 depends from claim 19 and
`
`defines further limitations on the “first imaging optical system” recited in
`
`claim 19. In this context, claim 25’s recitation of “[t]he projection optical
`
`system according to claim 10” (emphasis removed) appears to be a
`
`typographical error in which “10” should be “19” or “20.” Accordingly, we
`
`construe “the second imaging optical system” to mean the “second imaging
`
`optical system” recited in claim 19.
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`B. Whether Mr. Juergens is an Expert
`
`Nikon contends that, “[b]ecause of the highly specialized nature of
`
`projection optical systems,” the level of ordinary skill in the art would have
`
`required at least two years of experience in the lithography optics industry
`
`and experience in the specification of projection optical systems. PO Resp.
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`15–16. Nikon further contends that Mr. Juergens is not an expert in the
`
`relevant field because he does not have the experience required to be a
`
`person of even ordinary skill in the art.3 Id. at 35–38.
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`Carl Zeiss counters that Nikon’s expert, Dr. Jose Sasian, invites Mr.
`
`Juergens to guest lecture Dr. Sasian’s class on lens design, and that Dr.
`
`Sasian conceded that Mr. Juergens is an expert on many aspects of optical
`
`design. Reply 13, n.2.
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`
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`3 Nikon also asserts that exclusion of Mr. Juergens’ testimony would be
`justified. PO Resp. 38. Nikon does not, however, move to exclude either
`the Declaration of Mr. Juergens submitted with the Petition (Ex. 1016) or the
`Declaration of Mr. Juergens submitted with the Reply (Ex. 1036). Paper 32.
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`13
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`Having considered the parties’ arguments and evidence, we are not
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`persuaded that the level of ordinary skill in the art required at least two years
`
`of experience in the lithography optics industry and experience in the
`
`specification of projection optical systems. The claims are not limited to the
`
`field of lithography. Rather, based on the art of record, we find that the
`
`relevant field is projection optical systems. Mr. Juergens holds an M.A. in
`
`Physics and has more than 40 years of experience in the field of optical
`
`system design, including catoptric, dioptric, and catadioptric systems. Ex.
`
`1016 ¶¶ 3–9. Accordingly, we are persuaded that Mr. Juergens is a person
`
`of at least ordinary skill in the art in the art of projection optical systems.
`
`C. Claims 1–3, 8–12, 16–20, 23–26, 29, and 31–33 –
`Obvious over Terasawa and the Immersion References
`
`Carl Zeiss alleges that claims 1–3, 8–12, 16–20, 23–26, 29, and 31–33
`
`are unpatentable under 35 U.S.C. § 103(a) over Terasawa and the Immersion
`
`References. Pet. 31–50, 55–56. Carl Zeiss cites Terasawa as teaching every
`
`limitation, but acknowledges that Terasawa does not disclose expressly “an
`
`optical path between the boundary lens and the second surface is filled with
`
`a medium having a refractive index larger than 1.1,” as recited in claim 1.
`
`Id. at 34, 55. For that limitation, Carl Zeiss cites to the Immersion
`
`References (Suwa, Switkes, Ulrich, and Fukami). Id. at 36, 44–50, 55–56.
`
`Nikon counters that (1) Terasawa and the Immersion References do
`
`not teach, suggest, or otherwise render obvious a “boundary lens,” as
`
`properly construed; (2) a person of ordinary skill in the art would not have
`
`had a reasonable expectation of success in combining the references; and
`
`(3) secondary considerations demonstrate nonobviousness. PO Resp. 38–47.
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`Upon consideration of the parties’ contentions and supporting
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`evidence, we determine that Carl Zeiss has demonstrated by a preponderance
`
`of the evidence that claims 1–3, 8–12, 16–20, 23–26, 29, and 31–33 are
`
`unpatentable as obvious over Terasawa and the Immersion References. Pet.
`
`31–50, 55–56. In our discussion below, we address Nikon’s arguments
`
`presented in the Patent Owner Response.
`
`Terasawa (Ex. 1008)
`
`Terasawa describes a projection optical system and a projection
`
`exposure apparatus for projecting a pattern of a mask onto a substrate
`
`through the projection optical system. Ex. 1008 ¶ 1. Figure 1 of Terasawa,
`
`reproduced below, depicts a catadioptric projection optical system including
`
`a first imaging system G1 and a second imaging system G2 for projecting an
`
`image of reticle 101 illuminated with illumination system (not shown) onto
`
`wafer 102:
`
`
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`Figure 1 of Terasawa depicts a catadioptric projection optical system. Id.
`
`¶¶ 55, 102, 103. “The first imaging optical system G1 comprises, in order
`
`from the object side, at least a first mirror M1, having a refracting element
`
`L1, [and] a second mirror M2.” Id. ¶ 103. Light from reticle 101 is imaged
`
`by first imaging optical system G1, whereby intermediate image Io is
`
`formed. Id. Intermediate image Io, as imaged by first imaging optical
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`system G1, is then imaged on wafer 102 by second imaging optical system
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`G2, comprising a refracting element, at a predetermined magnification. Id.
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`In the structure described above, the optical system of the first embodiment
`
`has one optical axis 103, and produces a multiple-number imaging optical
`
`system wherein abaxial light, without light interception of a pupil, is imaged.
`
`Id. With the structure described above, light can be directed to the second
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`imaging optical system without a void in a pupil and without bend of the
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`optical axis. Id. ¶ 105. The region of the object plane from which the light
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`reaches the image plane, and which is attributable to the imaging, is a semi-
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`arcuate zone. Id. at Fig. 3, ¶ 117.
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`Suwa (Ex. 1009)
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`Suwa describes “a means for improving the resolution without largely
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`increasing the numerical aperture of the projection optical system,” in which
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`“an immersion projection method may be used in which the space between
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`the wafer and the projection optical system is filled with a liquid.” Ex. 1009,
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`3:18–23. Specifically:
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`In this immersion projection method, the air space
`between the wafer and the optical element constituting the
`projection optical system on the projection end side (image
`plane side) is filled with a liquid having a refractive index close
`to the refractive index of the photoresist layer, to increase the
`effective numerical aperture of the projection optical system
`seen from the wafer side, i.e. improving the resolution. This
`immersion projection method is expected to attain good
`imaging performance by selecting the liquid used.
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`Id. at 3:24–33. Figure 9 of Suwa is reproduced below:
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`Figure 9 of Suwa depicts a projection optical system (PL) with an immersion
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`fluid (LQ). Id. at 23:59-65. Suwa discloses that the last lens element, LE1,
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`is a “positive lens element [] having a flat lower surface Pe and a convex
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`upper surface,” and “is fixed on the end of the projection lens system PL
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`inside the lens barrel.” Id. at 23:9–11. Suwa also discloses that the
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`projection optical system can be catadioptric. Id. at 20:13–21. Carl Zeiss
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`acknowledges that Suwa does not disclose expressly that the liquid has a
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`refractive index greater than 1.1, but contends that:
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`[A person of ordinary skill in the art] would know that “a
`refractive index close to the refractive index of the photoresist”
`would be a refractive index greater than 1.1. For example, U.S.
`Patent No. 4,346,164 (“Tabarelli”), to which the passage from
`Suwa cited above expressly refers, identifies the refractive
`index of the photoresist as 1.6, and goes on to list nine
`immersion liquids with refractive indices between 1.5 and 1.66.
`(ZEISS 1016; ¶¶ 199-201; ZEISS 1025, 3:57-60, 5:36-50.)
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`Pet. 45. We are persuaded by Carl Zeiss’s reasoning.
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`Switkes (Ex. 1010)
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`Switkes teaches that immersion lithography can be used to enhance
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`resolution by increasing numerical aperture and also can be used to increase
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`depth of focus. Ex. 1010, 459 (“Immersion lithography is a technique which
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`can enhance the resolution of projection lithography by permitting exposures
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`with numerical aperture (NA) greater than one, the theoretical maximum for
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`conventional ‘dry’ systems. . . . Liquid immersion also increases the wafer
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`depth of focus, i.e. the tolerable error in the vertical position of the wafer, by
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`the index of the immersion liquid compared to a dry system with the same
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`numerical aperture.”) (footnotes omitted). Switkes describes several
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`immersion liquids for use at 157 nm and 193 nm whose refractive indexes
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`are greater than 1.2. Id. at 461. Switkes describes how immersion can be
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`used with “much of conventional designs.” Id.
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`Ulrich (Ex. 1011)
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`Ulrich describes the application of immersion lithography to prior art
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`“dry” designs to achieve increased numerical aperture. Ex. 1011, 166–167.
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`Ulrich expressly teaches that “immersion designs can be applied to other
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`design concepts such as catadioptric designs with similar results.” Id. at
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`167.
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`Fukami (Ex. 1015)
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`Fukami describes the use of liquid immersion to improve the
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`resolution of conventional projection exposure apparatuses. Ex. 1015, 3:13–
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`28.4 Fukami expressly describes the applicability of immersion techniques
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`4 Page numbers refer to the bottom number on the page.
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`to a catadioptric optical projection system having two mirrors and a single
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`optical axis. Id. at 21:13–16 (“Furthermore, the projection optical system
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`PL can be a dioptric, catoptric, or catadioptric system, for example an optical
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`system which has a plurality of dioptric elements and two catoptric elements
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`(at least one of which is a concave mirror) disposed on an optical axis
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`extending straight without being bent . . . .”).
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`Boundary lens
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`Nikon contends that Terasawa’s last lens immediately prior to wafer
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`102 is not a “boundary lens” as construed by Nikon because it does not
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`increase numerical aperture by reducing reflection loss. PO Resp. 38–39.
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`We decline to adopt Nikon’s proposed construction of “boundary lens” for
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`the reasons discussed above. Based on our construction of boundary lens,
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`Terasawa’s last lens immediately prior to wafer 102 is a “boundary lens”
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`because it is the last lens element of the projection optical system. Pet. 36.
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`Reason to combine and reasonable expectation of success
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`Carl Zeiss contends that “Ulrich demonstrates that the level of
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`ordinary skill in this art is high and how, at the time of the alleged invention,
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`there was not only express teaching to modify prior art ‘dry’ catadioptric
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`projection optical system to include the immersion limitation to thereby
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`increase NA, but also the skill necessary to do so.” Pet. 48 (citing Ex. 1016
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`¶¶ 22–24, 77–81, 223–224).
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`Nikon contends that a person of ordinary skill in the art would not
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`have had a reasonable expectation of success in combining the references
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`because introducing an immersion liquid into a dry projection optical system
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`such as Terasawa’s would create technical problems that would render it
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`inoperative. Id. at 39 (citing Ex. 2024 ¶¶ 119, 120). Specifically, Nikon
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`argues that neither increasing NA nor increasing DOF would have led a
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`person of ordinary skill in the art to combine the references because
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`(1) adding an immersion liquid to Terasawa would cause technical problems
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`that would have required undue experimentation and design to solve; and
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`(2) a person of ordinary skill in the art would not have increased DOF at the
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`expense of NA. Id. at 40–43. Carl Zeiss counters that nothing in claim 1 or
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`the ’575 patent addresses the problems identified by Nikon, and that Nikon’s
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`expert, Dr. Sasian, conceded that a person of ordinary skill in the art could
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`have addressed those challenges at the time of the invention. Reply 6–7
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`(citing Ex. 1033).
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`Having reviewed the parties’ contentions and evidence, we are
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`persuaded that a person of ordinary skill in the art would have had a
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`reasonable expectation of success in combining the references. Nikon’s
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`argument assumes that a person of ordinary skill in the art would introduce
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`an immersion liquid into the dry projection optical system of Terasawa
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`without any further modification. In the Petition, however, Carl Zeiss
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`argued that “Ulrich also demonstrates that a POSITA at the time of the
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`alleged invention would have been able to modify the systems . . . to include
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`the immersion liquid to increase NA.” Pet. 52 (emphasis added). Ulrich
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`teaches, for example, that “the high-NA dry projection lenses were not taken
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`as a straight forward starting point but well-known and proven know-how of
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`design history was fallen back on,” and that routine optimizations (“scaling
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`of the two partial focus widths,” “splitting thick lenses,” and “adding
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`aspheres”) can be used to achieve the level of performance desired for
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`projection microlithography. Ex. 1011, 166; Reply 10 (citing Ex. 1016
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`¶¶ 220, 221). Thus, Nikon’s assumption is improper. In any event, the
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`technical problems identified by Dr. Sasian relate to the need to characterize
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`the optical properties of an immersion fluid, and Dr. Sasian concedes that
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`the experiments necessary to do so were “comparable” to the techniques
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`known and used to characterize materials such as silica glass. See, e.g.,
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`Ex. 1033, 80:13–87:13. Accordingly, we are persuaded that a person of
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`ordinary skill in the art at the time would have had a reasonable