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`2. Mechanism of the vacuum thin film coating system | ShinMaywa Industries, Ltd.
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`HOME > R&D > About Vacuum Thin Film Coating System > 2. Mechanism of the vacuum thin film coating system
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`About Vacuum Thin Film Coating System
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`2. Mechanism of the vacuum thin film coating system
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`-- How is a thin film with a high degree of purity and adhesiveness produced?
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`To form a thin film
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`Generally, there are two methods of forming a thin film in the vacuum thin—film coating technology: Physical
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`Vapor Deposition (PVD) that utilizes the physical movement of particles and Chemical Vapor Deposition
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`(CVD) that utilizes a chemical reaction. Here, we would like to give a brief explanation of the evaporation
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`method and the sputtering method included in PVD.
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`The evaporation method is the easiest way to form a thin film, where the material of the film is heated,
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`dissolved, and evaporated in a vacuum and adheres to the object, as shown in Chart A.
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`it can be compared
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`to the phenomenon where steam from a bath tab condenses into water drops on the ceiling.
`—-Vacuum chamber
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` Negative!
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`electrode
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`“Argon ion
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`.' Electron
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` Material of the film
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`Argon adoption valve
`Chart B: Sputtering method
`a Targetatom
`Chart A: Evaporation method
`On the other hand, the sputtering method applies a voltage of some hundred volts between the vacuum
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`chamber and an electrode (target) made of the film material, as shown in Chart B. If a small amount of inert
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`gas (e.g., argon) is added to the chamber, electricity is discharged. The particles of the gas assume a
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`positive charge by the energy of the electricity. The positively charged particles are pulled by the strong
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`power of the negative electrode and they collide with the electrode. The shock flicks a part of the material
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`and it becomes particles, which form a film on the target.
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`For example, the gas in an old fluorescent lamp runs into a filament (a part of an incandescent lamp that
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`emits heat and light) and particles from the filament adhere to the inner surface of the glass tube. This is
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`the cause of the black stain at the ends of a fluorescent lamp. This is thought to be a type of sputtering film
`coating.
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`To form a thin film of high quality
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`This simple method, however, cannot form a quality thin film with high degree of purity and adhesiveness.
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`

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`2. Mechanism of the vacuum thin film coating system | ShinMaywa Industries, Ltd.
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`For example, if you form a film in the atmosphere (a) or in a low vacuum (b), the particles of the film
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`material try to move toward the object on the ceiling of the chamber but are obstructed by vapor, oxygen,
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`nitrogen, and carbon dioxide in the air. Thus, they seldom reach the object and cannot form a film.
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`Furthermore, even if the particles reach the object, it causes a number of problems where the
`adhesiveness of the film is weak or the film material bonds with other substances in the air. The solution is
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`to maintain a high vacuum in the chamber (0) to reduce unwanted substances. This produces a quality thin
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`film of high degree of purity and adhesiveness.
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`Object
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`"an Vacuu m chamber
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`(fr-Molecules of remaining gas
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`Evaporated particles
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`(b) Low vacuum (c) High vacuum
`(3) Atmosphere
`Blue particles: vapor. oxygen, nitrogen and carbon dioxide in the air
`Red particles: laterials of the fill
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`""~— Evaporation source
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`To maintain a vacuum
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`Based on this principle, the vacuum thin-film coating system forms a thin film in a vacuum chamber. it
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`consists of a vacuum chamber, vacuum pumps, and valves as shown below. At the moment, we do not
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`have such a powerful pump that can exhaust air from the level of atmosphere to high vacuum at once, so
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`that two types of pumps are required as shown below: a roughing air displacement pump (atmospheric
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`pressure 105 Pa to several Pa) and a substantial air displacement pump (less than several Pa).
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`At the beginning, only the roughing valve is open, and one rough air displacement pump works to exhaust
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`air. Then, the rough valve is closed, and the remaining two valves are opened to activate both the roughing
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`and substantial air displacement pumps connected in series. By doing this, the pressure inside the chamber
`reaches the level where a film can be formed.
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`l.I'acuum chamber
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`Roughing valve
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`Main valve
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`Substantial air
`displacement pump "x‘ .
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`Roughing air
`displacement pump
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`This is the mechanism of the vacuum thin film coating system.
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`In the next issue, we will introduce the efforts and unique technologies of ShinMaywa in the vacuum thin-
`film coating business.
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`1. The vacuum thin film coating technology supporting our everyday life
`a
`3. ShinMaywa's vacuum thin film coating technology >
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