Case 5:20-cv-09341-EJD Document 174-2 Filed 08/11/22 Page 1 of 48
`
`Exhibit 2
`
`

`

`Case 5:20-cv-09341-EJD Document 174-2 Filed 08/11/22 Page 2 of 48
`I 1111111111111111 11111 1111111111 111111111111111 IIIII IIIII IIIIII IIII IIII IIII
`US0073 81657B2
`
`c12) United States Patent
`Zhang et al.
`
`(IO) Patent No.:
`(45) Date of Patent:
`
`US 7,381,657 B2
`Jun.3,2008
`
`(54) BIASED PULSE DC REACTIVE
`SPUTTERING OF OXIDE FILMS
`
`(75)
`
`Inventors: Hongmei Zhang, San Jose, CA (US);
`Mukundan Narasimhan, San Jose, CA
`(US); Ravi B. Mullapudi, San Jose,
`CA (US); Richard E. Demaray,
`Portola Valley, CA (US)
`
`(73) Assignee: SpringWorks, LLC, Minnetonka, MN
`(US)
`
`( *) Notice:
`
`Subject to any disclaimer, the term of this
`patent is extended or adjusted under 35
`U.S.C. 154(b) by O days.
`
`(21) Appl. No.: 10/954,182
`
`(22) Filed:
`
`Oct. 1, 2004
`
`(65)
`
`Prior Publication Data
`
`US 2005/0048802 Al Mar. 3, 2005
`
`Related U.S. Application Data
`
`(63)
`
`Continuation of application No. 10/101,863, filed on
`Mar. 16, 2002.
`
`(51)
`
`(52)
`
`(58)
`
`Int. Cl.
`(2006.01)
`HOJL 21131
`(2006.01)
`HOJL 211469
`U.S. Cl. ...................... 438/769; 438/770; 438/771;
`257/E21.091; 257/E21.169; 257/E21.2; 257/E21.462;
`257/E23.132
`Field of Classification Search ................ 438/769,
`438/770, 771, 787, 788; 257/E23.132, E21.091,
`257/E21.169, E21.2, E21.462
`See application file for complete search history.
`
`(56)
`
`References Cited
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`(Continued)
`
`Primary Examiner-Michelle Estrada
`(74) Attorney, Agent, or Firm-Finnegan, Henderson,
`Farabow, Garrett & Dunner, LLP
`
`(57)
`
`ABSTRACT
`
`A biased pulse DC reactor for sputtering of oxide films is
`presented. The biased pulse DC reactor couples pulsed DC
`at a particular frequency to the target through a filter which
`filters out the effects of a bias power applied to the substrate,
`protecting the pulsed DC power supply. Films deposited
`utilizing the reactor have controllable material properties
`such as the index of refraction. Optical components such as
`waveguide amplifiers and multiplexers can be fabricated
`using processes performed on a reactor according to the
`present inention.
`
`21 Claims, 27 Drawing Sheets
`
`c:::20
`12-i::================H FILTER H PDC POWER I
`c:::15
`r::14
`~, ~--~---~----~-,,
`t
`
`53
`
`d
`
`54
`
`i===============t--16
`l===============t---17
`
`'--10
`
`18
`
`

`

`Case 5:20-cv-09341-EJD Document 174-2 Filed 08/11/22 Page 3 of 48
`
`US 7,381,657 B2
`Page 2
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`
`

`

`Case 5:20-cv-09341-EJD Document 174-2 Filed 08/11/22 Page 4 of 48
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`US 7,381,657 B2
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`

`

`Case 5:20-cv-09341-EJD Document 174-2 Filed 08/11/22 Page 5 of 48
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`US 7,381,657 B2
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