Case 5:20-cv-09341-EJD Document 147-2 Filed 04/08/22 Page 1 of 46
`Case 5:20-cv-09341-EJD Document 147-2 Filed 04/08/22 Page 1 of 46
`
`EXHIBIT 37
`EXHIBIT 37
`
`

`

`Case 5:20-cv-09341-EJD Document 147-2 Filed 04/08/22 Page 2 of 46
`I 1111111111111111 11111 lllll 111111111111111 1111111111 111111111111111 IIII IIII
`US007 413 998B2
`
`c12) United States Patent
`Zhang et al.
`
`(IO) Patent No.:
`(45) Date of Patent:
`
`US 7,413,998 B2
`Aug. 19, 2008
`
`(54) BIASED PULSE DC REACTIVE SPUTTERING
`OF OXIDE FILMS
`
`(75)
`
`Inventors: Hongmei Zhang, San Jose, CA (US);
`Mukundan Narasimhan, San Jose, CA
`(US); Ravi B. Mullapudi, San Jose, CA
`(US); Richard E. Demaray, Portola
`Valley, CA (US)
`
`(73) Assignee: SpringWorks, LLC, Minnetonka, MN
`(US)
`
`( *) Notice:
`
`Subject to any disclaimer, the term ofthis
`patent is extended or adjusted under 35
`U.S.C. 154(b) by 5 days.
`
`(21) Appl. No.: 11/228, 717
`
`(22) Filed:
`
`Sep.16,2005
`
`(65)
`
`Prior Publication Data
`
`US 2006/0057283 Al
`
`Mar. 16, 2006
`
`Related U.S. Application Data
`
`(62) Division of application No. 10/101,863, filed on Mar.
`16, 2002.
`
`(51)
`
`Int. Cl.
`(2006.01)
`HOJL 21131
`(2006.01)
`HOJL 211469
`(52) U.S. Cl. .............. . 438/769; 438/771; 257/E21.273;
`257/E21.278; 257/E21.462
`(58) Field of Classification Search ................. 438/769,
`438/770, 771, 787, 788, 533; 257/E21.273,
`257/E21.278, E21.462; 204/192.12, 192.15
`See application file for complete search history.
`
`(56)
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`Primary Examiner-Michelle Estrada
`(74) Attorney, Agent, or Firm-Finnegan, Henderson,
`Farabow, Garrett & Dunner, L.L.P.
`
`(57)
`
`ABSTRACT
`
`A biased pulse DC reactor for sputtering of oxide films is
`presented. The biased pulse DC reactor couples pulsed DC at
`a particular frequency to the target through a filter which
`filters out the effects of a bias power applied to the substrate,
`protecting the pulsed DC power supply. Films deposited uti(cid:173)
`lizing the reactor have controllable material properties such
`as the index of refraction. Optical components such as
`waveguide amplifiers and multiplexers can be fabricated
`using processes performed on a reactor according to the
`present invention.
`
`13 Claims, 27 Drawing Sheets
`
`~----___._C_2_o_,.-(cid:141) ..... I
`12--,:::================~----11 r-lLTER H PDC POWER I
`
`.....
`1
`
`c:15
`
`c:14
`
`53
`
`54
`
`i::::::============(cid:157)
`~16
`~=============t--17
`
`'-----10
`
`18
`
`

`

`Case 5:20-cv-09341-EJD Document 147-2 Filed 04/08/22 Page 3 of 46
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`

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