`Case 5:20-cv-09341-EJD Document 145-5 Filed 04/01/22 Page 1of3
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`EXHIBIT D
`EXHIBIT D
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`Case 5:20-cv-09341-EJD Document 145-5 Filed 04/01/22 Page 2 of 3
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`IN THE UNITED STATES DISTRICT COURT
`FOR THE WESTERN DISTRICT OF TEXAS
`WACO DIVISION
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`W-20-CV-00634-ADA
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`W-20-CV-00636-ADA
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`DEMARAY LLC,
` Plaintiff
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`-v-
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`INTEL CORPORATION,
` Defendant
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`DEMARAY LLC,
` Plaintiff
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`-v-
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`SAMSUNG ELECTRONICS CO., LTD.
`(A KOREAN COMPANY), SAMSUNG
`ELECTRONICS AMERICA, INC.,
`SAMSUNG SEMICONDUCTOR, INC.,
`SAMSUNG AUSTIN
`SEMICONDUCTOR, LLC,
` Defendants
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`CLAIM CONSTRUCTION ORDER
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`The Court held a supplemental Markman hearing on February 28, 2022. During that
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`hearing, the Court provided its final constructions. The Court now enters those claim
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`constructions.
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`SIGNED this 28th day of February, 2022.
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`ALAN D ALBRIGHT
`UNITED STATES DISTRICT JUDGE
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`Case 5:20-cv-09341-EJD Document 145-5 Filed 04/01/22 Page 3 of 3
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`Term
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`“A method of depositing an
`insulating film on a substrate,
`comprising:”
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`U.S. Patent No. 7,381,657,
`Claim 2
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`“wherein an oxide material is
`deposited on the substrate, and
`the insulating film is formed
`by reactive sputtering in a
`mode between a metallic mode
`and a poison mode.”
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`U.S. Patent No. 7,381,657,
`Claim 2
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`Plaintiff’s Proposed
`Construction
`Preamble is not limiting,
`except for “insulating film on a
`substrate”
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`Defendants’ Proposed
`Construction
`Preamble is limiting
`(“depositing an insulating film
`on a substrate”)
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`Court’s Final
`Construction
`Preamble is not limiting,
`except for “insulating film on a
`substrate”
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`Plain and ordinary meaning
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`Plain-and-ordinary meaning
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`“wherein an oxide material is
`deposited on the substrate and
`the insulating film comprising
`the oxide material is formed by
`reactive sputtering between a
`metallic mode and a poison
`mode”
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