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`Exhibit 4
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`Case 5:20-cv-05676-EJD Document 39-5 Filed 11/23/20 Page 2 of 48
`Case 5120'CV'05576'EJD D°°umllllllllll|ll|||ll'llflllllllllfillllllllllllllllfllllllllll‘llll||||||||
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`USOO73 81657B2
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`United States Patent
`(12)
`US 7,381,657 B2
`(10) Patent No.:
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`(45) Date of Patent:
`Jun. 3, 2008
`Zhang et a].
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`(54) BIASED PULSE DC REACTIVE
`SPUTTERING OF OXIDE FILMS
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`(75)
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`Inventors; Hongmei Zhanga San Jose, CA (US);
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`Mukundan Narasimhan, San Jose, CA
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`(US); Ravi B. Mullapudi, San Jose,
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`CA (US), Richard E. Demaray,
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`P0110121 Valley, CA (US)
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`(73) Assignee: SpringWorks, LLC, Minnetonka, MN
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`(US)
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`( * ) Notice:
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`DE
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`Subject to any disclaimer, the term of this
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`pJatSerg ilsselxgngedoc: adjusted under 35
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`ays.
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`y
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`(21) Appl. No.: 10/954,182
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`Oct. 1, 2004
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`(22)
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`Filed:
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`(65)
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`Prior Publication Data
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`US 2005/0048802 A1
`Mar. 3, 2005
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`3,616,403 A
`3,850,604 A
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`4,082,569 A
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`4,111,523 A
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`4,437,966 A
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`4,587,225 A
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`4,619,680 A
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`RE32,449 E
`4,710,940 A
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`.............. 204/192
`10/1971 Collins et a1.
`11/1974 Klein ............................ 65/32
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`4/1978 Evans, Jr.
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`....... 350/9614
`9/1978 KaminOW et a1.
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`3/1984 Hope et a1.
`................. 204/298
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`5/1986 Tsukuma et a1.
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`10/1986 Nourshargh et a1.
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`6/1987 Claussen
`12/1987 S1pes, Jr.
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`......... 65/312
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`(Continued)
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`FOREIGN PATENT DOCUMENTS
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`37 38 738 C1
`1/1989
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`(Continued)
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`OTHER PUBLICATIONS
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`Li, Ning et a1., “Enhancement of aluminum oxide physical vapor
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`deposition with a secondary plasma”, Nov. 28, 2001, Scien Direct,
`>x<
`_
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`W 1 11'
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`(Continued)
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`Primary ExamineriMichelle Estrada
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`(74) Attorney, Agent, or FirmiFinnegan, Henderson,
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`Farabow, Garrett & Dunner, LLP
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`(57)
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`ABSTRACT
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`A biased pulse DC reactor for sputtering of oxide films is
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`resented The biased ulse DC reactor cou les ulsed DC
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`p
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`p
`p
`p
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`at a particular frequency to the target through a filter which
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`filters out the effects of a bias power applied to the substrate,
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`protecting the pulsed DC power supply. Films deposited
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`utilizing the reactor have controllable material properties
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`such as the index of refraction. Optical components such as
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`waveguide amplifiers and multiplexers can be fabricated
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`using processes performed on a reactor according to the
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`present inention.
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`Related US. Application Data
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`(63) Continuation of application No. 10/ 101,863, filed on
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`Mar. 16’ 2002‘
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`Int- Cl-
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`(2006.01)
`H01L 21/31
`2006.01
`H01L 21/469
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`(
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`...................... 438/769; 438/770; 438/771;
`(52) US. Cl.
`257/E21.09l; 257/E21.l69; 257/E21.2; 257/E21.462;
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`257/1323 132
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`'fi
`F'
`ld f Cl
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`1e 4;)8/7735871712'313 7:21.357/1323132 E21 091’
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`’257/i321 169 E21 2’ E21 462’
`’
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`1.
`’ h h ’
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`f
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`fil
`1
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`e or comp ete searc
`istory.
`ee app 1cation
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`References Cited
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`(
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` PDC POWER
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`Case 5:20-cv-05676-EJD Document 39-5 Filed 11/23/20 Page 3 of 48
`Case 5:20-cv-05676-EJD Document 39-5 Filed 11/23/20 Page 3 of 48
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`US 7,381,657 B2
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`Page 2
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`7/2002 Akkapeddi et a1.
`8/2002 Shin
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`9/2002 Touhsaent
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`................ 419/26
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`204/19212
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`..... 204/192.12
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`...... 204/29g13
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`Case 5:20-cv-05676-EJD Document 39-5 Filed 11/23/20 Page 4 of 48
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`US 7,381,657 B2
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`6,488,822
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`6,537,428
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`6,563,998
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`6,576,546
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`6,602,338
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`6,605,228
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`6,615,614
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`6,632,563
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`6,673,716
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`6,683,244
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`6,683,749
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`6,750,156
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`6,760,520
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`6,768,855
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`6,818,356
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`6,827,826
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`6,846,765
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`6,884,327
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`7,262,131
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`2001/0027159
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`2001/0031122
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`2001/0034106
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`2001/0041460
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`2002/0001746
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`2002/0014406
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`2002/0033330
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`2002/0076133
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`2002/0106297
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`2002/0115252
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`2002/0134671
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`2002/0140103
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`2002/0170821
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`2002/0191916
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`2003/0019326
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`2003/0022487
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`2003/0035906
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`2003/0042131
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`2003/0044118
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`2003/0063883
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`2003/0077914
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`2003/0079838
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`2003/0097858
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`2003/0127319
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`2003/0134054
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`2003/0141186
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`2003/0143853
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`2003/0173207
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`2003/0173208
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`2003/0174391
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`2003/0175142
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`2003/0178637
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`2003/0185266
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`2004/0043557
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`2004/0077161
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`2004/0105644
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`2004/0259305
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`2005/0000794
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`2005/0006768
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`2005/0175287
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`2005/0183946
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`2006/0054496
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`2006/0057283
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`2006/0057304
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`2006/0071592
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`2006/0134522
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`B1
`9/2002
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`B1
`12/2002
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`B2
`1/2003
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`B1
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`B2
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`B1
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`B1
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`B1
`9/2003
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`B1
`10/2003
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`B1
`1/2004
`*
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`B2
`1/2004
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`B2
`1/2004
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`B2
`6/2004
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`7/2004
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`11/2004
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`4/2005
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`8/2007
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`A1
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`A1
`* 10/2001
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`A1
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`A1
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`A1
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`A1
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`4/2003
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`A1
`5/2003
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`A1
`5/2003
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`A1
`7/2003
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`A1
`7/2003
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`A1
`7/2003
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`A1
`7/2003
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`A1
`9/2003
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`A1
`9/2003
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`A1
`9/2003
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`A1
`*
`9/2003
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`A1
`9/2003
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`A1
`10/2003
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`A1
`3/2004
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`A1
`*
`4/2004
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`A1
`6/2004
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`A1
`12/2004
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`A1
`1/2005
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`A1
`1/2005
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`A1
`8/2005
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`8/2005
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`Endo
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`Moslehi ................. 204/ 192.12
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`Demaray et al.
`Dawes et al.
`.............. 264/1.21
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`Demaray et al.
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`Xiong et al.
`........... 204/192.13
`Farah et al.
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`Gilbert et al.
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`Chen et al.
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`Kawaguchi et a1.
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`Makikawa et a1.
`........... 65/386
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`Krasnov et al.
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`D’Couto et a1.
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`Fujimori et a1.
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`
`Daby et al.
`Le et al.
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`Medin et al.
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`Bakke et al.
`
`
`Bates
`
`
`
`Demaray et al.
`Imamura et al.
`
`
`Pan et al.
`
`
`Narasimhan et al.
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`
`Kaneyoshi
`Lackritz et al.
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`Moise et al.
`................ 438/396
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`Wiggins
`Jenson
`
`Takashima
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`
`Demaray et al.
`Li et al.
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`Ueno et al.
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`Haukka et a1.
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`Demaray et al.
`Kloster et al.
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`Sandlin et al.
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`Frish et a1.
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`Han et a1. ..................... 45/245
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`Yoon et al.
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`Memarian et al.
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`Johnson ................. 204/192.12
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`Zhou et al.
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`Demaray et al.
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`Brcka .................... 156/345.48
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`Strohhofer et a1.
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`Demaray et al.
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`Demaray et al.
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`Wang et al.
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`Zhang et al.
`Pan et al.
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`Pan et al.
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`Milonopoulou et a1.
`Chen et al.
`
`
`Henrichs
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`Haukka et a1.
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`Chen et al.
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`
`Dawes
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`Demaray et al.
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`Demaray et al.
`Narasimhan et al.
`
`Pan et al.
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`Pan et al.
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`
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`Zhang et al.
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`Zhang et al.
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`Zhang et al.
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