Case 5:20-cv-05676-EJD Document 23-14 Filed 09/25/20 Page 1 of 6
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`Exhibit 12
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`Exhibit 12
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`Discovery Thin Film Deposition Solution - Denton Vacuum
`Case 5:20-cv-05676-EJD Document 23-14 Filed 09/25/20 Page 2 of 6
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`Page 1 of 5
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`Blog
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`Login
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`Order
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`Discovery Thin Film Deposition
`Solution
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`MAGNETRON SPUTTERING
`The Discovery Magnetron Sputtering system offers versatility and reliability while
`meeting high-volume production needs. This thin film deposition system can either
`accommodate a single cathode high uniformity configuration for high-volume
`manufacturing, or up to 4 confocal cathodes with triaxis adjustment of offset, target
`to substrate distance, and angle for uniform coating. Each cathode can be optimized
`for a different deposition method or target material.
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`The Discovery system is standardized with a fully automatic mode with one-push
`button automation to reduce system downtime. It is integrated with a customizable
`cluster configuration to meet specific process demands for high-volume
`manufacturing. Semi-manual mode and other front-end options are also available for
`less demanding throughput needs.
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`All Discovery systems ship with ProcessPro-HV for high-volume needs; this software
`uses a fully automated material scheduler to load the module with maximum
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`https://www.dentonvacuum.com/products-technologies/magnetron-sputtering/discovery/
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`9/25/2020
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`Discovery Thin Film Deposition Solution - Denton Vacuum
`Case 5:20-cv-05676-EJD Document 23-14 Filed 09/25/20 Page 3 of 6
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`Page 2 of 5
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`efficiency. The user interface is SEMI 395 compliant with secure, multi-level access
`controls and visual system configuration and status indication. ProcessPro HV also
`features comprehensive data logging and custom charting within the tool.
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`CONTACT SALES
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`VIEW DATA SHEET
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`APPLICATIONS
`• High-volume production
`• Advanced optical filters
`• Biocompatible coatings for medical implants
`• Thin film resistors & sensors
`• Wafer metal & dielectric films
`• Large area hybrid circuit fabrication
`• Metal contacts of compound semiconductors
`• Research & development
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`BENEFITS
`The production-proven Discovery platform can handle substrates up to 300mm. The
`cluster configuration makes it suitable for multi-layer, oxygen-sensitive applications
`and high throughput requirements. The platform accommodates DC, pulsed DC, and
`RF sputtering, which feature the single-cathode configuration for high uniformity, as
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`https://www.dentonvacuum.com/products-technologies/magnetron-sputtering/discovery/
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`9/25/2020
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`Discovery Thin Film Deposition Solution - Denton Vacuum
`Case 5:20-cv-05676-EJD Document 23-14 Filed 09/25/20 Page 4 of 6
`Case 5:20-cv-05676—EJD Document 23-14 Filed 09/25/20 Page 4 of 6
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`well as confocal co—sputtering capability. Denton's proprietary PEM technology
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`enables high rate reactive sputtering of metal oxides and nitrides.
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`Ion assisted deposition is also available. With independent electro-pneumatic source
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`shutters and chimney assemblies, you can prevent cross-contamination of your
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`source material. Multiple pump configurations, including cryogenic and turbo, as well
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`as pump placement options provide the design flexibility we need to meet your
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`process and productivity requirements.
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`FRONT-END OPTIONS
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`The Discovery can also be equipped with a front-end option to increase efficiency
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`and throughput. Front ends allow you to automatically load the module with wafers
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`or carriers, and each option offers a level of efficiency that can't be attained with
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`manual venting and loading. The different front-end options to choose from are:
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`- Single chamber, single wafer load lock: This is the simplest front—end option,
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`allowing one wafer or carrier at a time to be loaded into the system.
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`- Single chamber cassette load lock: A more sophisticated option, providing a
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`cassette of up to 25 wafers or carriers that a robotic arm loads into the process
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`module.
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`- Cluster tool: This is the most robust option. It provides multiple chambers for
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`coating and conditioning, as well as multiple load locks for loading wafers into the
`system. Learn more about the Versa Denton Vacuum's own cluster platform.
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`httpszllwww.dentonvacuum.com/products—technologies/magnetron—sputtering/discovery/
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`9/25/2020
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`Discovery Thin Film Deposition Solution - Denton Vacuum
`Case 5:20-cv-05676-EJD Document 23-14 Filed 09/25/20 Page 5 of 6
`Case 5:20-cv-05676-EJD Document 23-14 Filed 09/25/20 Page 5 of 6
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`Cassette load lock
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`Discovery 200 module with a cassette load lock
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`LEARN MORE
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`«9
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`COLLATERAL
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`Discovery Data Sheet
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`DOWNLOAD
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`TECHNICAL PAPER
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`Contributing Factors in Cathode Placement for Confocal Sputtering
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`DOWNLOAD
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`https://www.dentonvacuum.com/products-technologies/magnetron-sputten'ng/discovery/
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`9/25/2020
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`Discovery Thin Film Deposition Solution - Denton Vacuum
`Case 5:20-cv-05676-EJD Document 23-14 Filed 09/25/20 Page 6 of 6
`Case 5:20-cv-05676-EJD Document 23-14 Filed 09/25/20 Page 6 of 6
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`VIDEOS & WEBINARS
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`Sputtering System Target Change
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`WATCH
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`ALL RESOURCES
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`DENTDNVACUUM
`Enabling Innovation
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`fin-
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`You
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`PRIVACY POLICY I TERMS&CONDIT|ONS I SITEMAP I CONTACT
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`© 2020 Denton Vacuum. All Rights Reserved
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`https://www.dentonvacuum.com/products-technologies/magnetron—sputtering/discovery/
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`9/25/2020
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