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ADVANCED MICRO DEVICES, INC.

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JEREMY LANSFORD

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REDUCED VARIATION IN INTERCONNECT RESISTANCE USING RUN-TO-RUN CONTROL OF CHEMICAL-MECHANICAL POLISHING DURING SEMICONDUCTOR FABRICATION

09/401,914 | U.S. Patent Application

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Location FILE REPOSITORY (FRANCONIA)

Filed Sept. 23, 1999

Examiner DEVEN M COLLINS

Class 257

Art Group 2823

Patent No. 6,157,078

Case Type Utility - 257/734000

Status Patented Case

Last Updated: 1 year, 2 months ago

Date	#	Transaction
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REDUCED VARIATION IN INTERCONNECT RESISTANCE USING RUN-TO-RUN CONTROL OF CHEMICAL-MECHANICAL POLISHING DURING SEMICONDUCTOR FABRICATION

09/401,914 | U.S. Patent Application

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